JPS649618B2 - - Google Patents

Info

Publication number
JPS649618B2
JPS649618B2 JP7049583A JP7049583A JPS649618B2 JP S649618 B2 JPS649618 B2 JP S649618B2 JP 7049583 A JP7049583 A JP 7049583A JP 7049583 A JP7049583 A JP 7049583A JP S649618 B2 JPS649618 B2 JP S649618B2
Authority
JP
Japan
Prior art keywords
mask
cleaning
back surfaces
tank
cleaning tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP7049583A
Other languages
English (en)
Japanese (ja)
Other versions
JPS59195646A (ja
Inventor
Toshio Wada
Hiromi Yamashita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP58070495A priority Critical patent/JPS59195646A/ja
Priority to US06/602,519 priority patent/US4569695A/en
Publication of JPS59195646A publication Critical patent/JPS59195646A/ja
Publication of JPS649618B2 publication Critical patent/JPS649618B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P72/0416—
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B11/00—Cleaning flexible or delicate articles by methods or apparatus specially adapted thereto
    • H10P72/0412—
    • H10P72/0414—

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP58070495A 1983-04-21 1983-04-21 半導体素子製造用マスクの洗浄方法および洗浄装置 Granted JPS59195646A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58070495A JPS59195646A (ja) 1983-04-21 1983-04-21 半導体素子製造用マスクの洗浄方法および洗浄装置
US06/602,519 US4569695A (en) 1983-04-21 1984-04-20 Method of cleaning a photo-mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58070495A JPS59195646A (ja) 1983-04-21 1983-04-21 半導体素子製造用マスクの洗浄方法および洗浄装置

Publications (2)

Publication Number Publication Date
JPS59195646A JPS59195646A (ja) 1984-11-06
JPS649618B2 true JPS649618B2 (show.php) 1989-02-17

Family

ID=13433156

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58070495A Granted JPS59195646A (ja) 1983-04-21 1983-04-21 半導体素子製造用マスクの洗浄方法および洗浄装置

Country Status (1)

Country Link
JP (1) JPS59195646A (show.php)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61160932A (ja) * 1985-01-08 1986-07-21 Fuji Electric Co Ltd フオトマスクの洗浄方法
JPH0812850B2 (ja) * 1987-03-17 1996-02-07 株式会社ニコン 洗浄方法
JP2601828B2 (ja) * 1987-07-15 1997-04-16 株式会社日立製作所 ウエット処理装置
JP2601827B2 (ja) * 1987-07-15 1997-04-16 株式会社日立製作所 ウエット処理装置
CN118651658B (zh) * 2024-08-21 2024-11-15 磊菱半导体设备(江苏)有限公司 一种半导体掩模板制造用转运装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58115044A (ja) * 1981-12-28 1983-07-08 Watanabe Shoko:Kk ガラスの洗浄方法

Also Published As

Publication number Publication date
JPS59195646A (ja) 1984-11-06

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