JPS6491026A - Optical lighting apparatus - Google Patents

Optical lighting apparatus

Info

Publication number
JPS6491026A
JPS6491026A JP62248523A JP24852387A JPS6491026A JP S6491026 A JPS6491026 A JP S6491026A JP 62248523 A JP62248523 A JP 62248523A JP 24852387 A JP24852387 A JP 24852387A JP S6491026 A JPS6491026 A JP S6491026A
Authority
JP
Japan
Prior art keywords
luminous flux
transmitting
optical path
amount
lighting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62248523A
Other languages
Japanese (ja)
Other versions
JPH07104203B2 (en
Inventor
Masahiro Nakagawa
Kazuaki Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62248523A priority Critical patent/JPH07104203B2/en
Publication of JPS6491026A publication Critical patent/JPS6491026A/en
Publication of JPH07104203B2 publication Critical patent/JPH07104203B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Abstract

PURPOSE:To ensure attenuation of the amount of lighting luminous flux, by combining first and second transmitting and reflecting members, which take out the lighting luminous flux from a main optical path and return the luminous flux, and constituting an attenuating part for measurement. CONSTITUTION:Luminous flux for exposure LB1 from a light source 2 is taken out of a main optical path to an external optical path with a first transmitting and reflecting member 21A. The amount of the taken-out luminous flux LB1a is attenuated and second attenuated luminous flux LB3 is returned with second transmitting and reflecting members 21B-21D. An attenuating part for measurement 3 is constituted with these parts. In a measuring mode, the transmitting and reflecting members 21A-21D in four stages are provided in the optical path. Thus the amount of light is attenuated to a large extent, and the lighting luminous flux for measurement LB3 can be obtained. The illuminace distribution and the amount of irradiation of the lighting of a wafer 11 can be measured highly accurately.
JP62248523A 1987-10-01 1987-10-01 Lighting optics Expired - Fee Related JPH07104203B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62248523A JPH07104203B2 (en) 1987-10-01 1987-10-01 Lighting optics

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62248523A JPH07104203B2 (en) 1987-10-01 1987-10-01 Lighting optics

Publications (2)

Publication Number Publication Date
JPS6491026A true JPS6491026A (en) 1989-04-10
JPH07104203B2 JPH07104203B2 (en) 1995-11-13

Family

ID=17179451

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62248523A Expired - Fee Related JPH07104203B2 (en) 1987-10-01 1987-10-01 Lighting optics

Country Status (1)

Country Link
JP (1) JPH07104203B2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008534936A (en) * 2005-04-01 2008-08-28 トルンプ・ヴェルクツォイクマシーネン・ゲーエム・ベーハー・ウント・コンパニ・カーゲー Optical element and method for recording beam parameters comprising a temperature sensor provided in the form of a pixel matrix
JP2012084919A (en) * 2006-10-17 2012-04-26 Asml Netherlands Bv Using of interferometer as high speed variable attenuator
JP2015064525A (en) * 2013-09-26 2015-04-09 株式会社Ｓｃｒｅｅｎホールディングス Drawing apparatus
WO2020246200A1 (en) * 2019-06-07 2020-12-10 インスペック株式会社 Calibration system and drawing device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3095279B1 (en) * 2019-04-18 2021-05-21 Commissariat Energie Atomique REFLECTOR DEVICE

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008534936A (en) * 2005-04-01 2008-08-28 トルンプ・ヴェルクツォイクマシーネン・ゲーエム・ベーハー・ウント・コンパニ・カーゲー Optical element and method for recording beam parameters comprising a temperature sensor provided in the form of a pixel matrix
JP2012084919A (en) * 2006-10-17 2012-04-26 Asml Netherlands Bv Using of interferometer as high speed variable attenuator
JP2015064525A (en) * 2013-09-26 2015-04-09 株式会社Ｓｃｒｅｅｎホールディングス Drawing apparatus
WO2020246200A1 (en) * 2019-06-07 2020-12-10 インスペック株式会社 Calibration system and drawing device
CN113906349A (en) * 2019-06-07 2022-01-07 英视股份有限公司 Calibration system and drawing device

Also Published As

Publication number Publication date
JPH07104203B2 (en) 1995-11-13

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees