JPS6489574A - Pattern formation of superconductor circuit - Google Patents
Pattern formation of superconductor circuitInfo
- Publication number
- JPS6489574A JPS6489574A JP62248362A JP24836287A JPS6489574A JP S6489574 A JPS6489574 A JP S6489574A JP 62248362 A JP62248362 A JP 62248362A JP 24836287 A JP24836287 A JP 24836287A JP S6489574 A JPS6489574 A JP S6489574A
- Authority
- JP
- Japan
- Prior art keywords
- ion
- implantation
- superconducting
- oxgen
- crystallinity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000002887 superconductor Substances 0.000 title abstract 4
- 230000007261 regionalization Effects 0.000 title 1
- 238000005468 ion implantation Methods 0.000 abstract 3
- 239000000919 ceramic Substances 0.000 abstract 2
- 238000002513 implantation Methods 0.000 abstract 2
- 150000002500 ions Chemical class 0.000 abstract 2
- 229910009203 Y-Ba-Cu-O Inorganic materials 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 abstract 1
- 239000013078 crystal Substances 0.000 abstract 1
- 229910052731 fluorine Inorganic materials 0.000 abstract 1
- 239000011737 fluorine Substances 0.000 abstract 1
- -1 fluorine ions Chemical class 0.000 abstract 1
- 238000001755 magnetron sputter deposition Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000001020 plasma etching Methods 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10N60/00—Superconducting devices
- H10N60/01—Manufacture or treatment
- H10N60/0268—Manufacture or treatment of devices comprising copper oxide
- H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
Abstract
PURPOSE:To simplify the formation of a circuit pattern, by a method wherein a local selective doping is performed on a high-temp. ceramic superconductor by ion (except oxgen and fluorine ions) implantation to destroy the crystallinity of the selected doping parts and turning those part to non-superconducting ones. CONSTITUTION:A Y-Ba-Cu-O or other ceramic superconductor is formed on a substrate 11 by magnetron sputtering and a resist mask 13 is formed on the thin superconductor film 12. Then, the crystallinity of implanted areas 14 is destroyed by ion (Ne<+>, etc.) implantation (a) to make the areas non- superconducting. The larger is ion implantation dose, the heavier is damage to the crystal and the lower is a critical temperature. This means an ion implan tation dose can control a critical temperature. Next, the resist mask 13 is re moved by oxgen plasma etching (b). As described above, a superconducting pattern is formed by ion implantation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62248362A JPS6489574A (en) | 1987-09-30 | 1987-09-30 | Pattern formation of superconductor circuit |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62248362A JPS6489574A (en) | 1987-09-30 | 1987-09-30 | Pattern formation of superconductor circuit |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6489574A true JPS6489574A (en) | 1989-04-04 |
Family
ID=17176972
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62248362A Pending JPS6489574A (en) | 1987-09-30 | 1987-09-30 | Pattern formation of superconductor circuit |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6489574A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2670201A1 (en) * | 1990-12-06 | 1992-06-12 | Dornier Gmbh | PROCESS FOR MICROSTRUCTURING SUPERCONDUCTING OXIDE CERAMICS. |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57132381A (en) * | 1981-02-10 | 1982-08-16 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of high melting point compound thin film |
JPS58157182A (en) * | 1982-02-23 | 1983-09-19 | サントル・ナシヨナル・ド・ラ・ルシユルシエ・シアンテイフイツク | Small circuit using josephson effect or the like and method of producing same |
JPS63258082A (en) * | 1987-04-15 | 1988-10-25 | Semiconductor Energy Lab Co Ltd | Superconductive material |
JPS63265473A (en) * | 1987-04-23 | 1988-11-01 | Agency Of Ind Science & Technol | Manufacture of superconducting electronic circuit |
-
1987
- 1987-09-30 JP JP62248362A patent/JPS6489574A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57132381A (en) * | 1981-02-10 | 1982-08-16 | Nippon Telegr & Teleph Corp <Ntt> | Manufacture of high melting point compound thin film |
JPS58157182A (en) * | 1982-02-23 | 1983-09-19 | サントル・ナシヨナル・ド・ラ・ルシユルシエ・シアンテイフイツク | Small circuit using josephson effect or the like and method of producing same |
JPS63258082A (en) * | 1987-04-15 | 1988-10-25 | Semiconductor Energy Lab Co Ltd | Superconductive material |
JPS63265473A (en) * | 1987-04-23 | 1988-11-01 | Agency Of Ind Science & Technol | Manufacture of superconducting electronic circuit |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2670201A1 (en) * | 1990-12-06 | 1992-06-12 | Dornier Gmbh | PROCESS FOR MICROSTRUCTURING SUPERCONDUCTING OXIDE CERAMICS. |
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