JPS6489573A - Pattern formation of superconductor circuit - Google Patents

Pattern formation of superconductor circuit

Info

Publication number
JPS6489573A
JPS6489573A JP62248361A JP24836187A JPS6489573A JP S6489573 A JPS6489573 A JP S6489573A JP 62248361 A JP62248361 A JP 62248361A JP 24836187 A JP24836187 A JP 24836187A JP S6489573 A JPS6489573 A JP S6489573A
Authority
JP
Japan
Prior art keywords
ion beam
convergent
superconductor
ion
crystallinity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62248361A
Other languages
Japanese (ja)
Inventor
Shinji Matsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62248361A priority Critical patent/JPS6489573A/en
Publication of JPS6489573A publication Critical patent/JPS6489573A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0661—Processes performed after copper oxide formation, e.g. patterning
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0912—Manufacture or treatment of Josephson-effect devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)

Abstract

PURPOSE:To simplify the formation of a given circuit pattern, by a method wherein a local selective doping is performed on a high-temp. ceramic supercon ductor by a convergent ion beam using an ion (except oxgen and fluorine ions) to destroy the crystallinity of the selected doping parts and turning those parts to non-superconducting ones. CONSTITUTION:A Y-Ba-Cu-O or other ceramic superconductor is formed on a substrate 11 by magnetron sputtering. Then, a Si<++> or other convergent ion beam is used to destroy the crystallinity of implanted areas 13 to make them non-superconducting. The larger ion implantation dose, the heavier is damage to the crystal and the lower is a critical temperature. This means an ion implan tation dose can control a critical temp. and thus a superconductor circuit pattern can be easily formed by a convergent ion beam. Since the convergent ion beam is computer controlled, any superconductor circuit can be formed.
JP62248361A 1987-09-30 1987-09-30 Pattern formation of superconductor circuit Pending JPS6489573A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62248361A JPS6489573A (en) 1987-09-30 1987-09-30 Pattern formation of superconductor circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62248361A JPS6489573A (en) 1987-09-30 1987-09-30 Pattern formation of superconductor circuit

Publications (1)

Publication Number Publication Date
JPS6489573A true JPS6489573A (en) 1989-04-04

Family

ID=17176956

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62248361A Pending JPS6489573A (en) 1987-09-30 1987-09-30 Pattern formation of superconductor circuit

Country Status (1)

Country Link
JP (1) JPS6489573A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01114084A (en) * 1987-10-28 1989-05-02 Hitachi Ltd Method of forming superconductor pattern
WO1999017382A1 (en) * 1997-09-30 1999-04-08 Yoichi Okabe Method for manufacturing coplanar josephson device
CN111063788A (en) * 2019-11-27 2020-04-24 中国科学院上海微系统与信息技术研究所 Preparation method of superconducting transition edge detector

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57132381A (en) * 1981-02-10 1982-08-16 Nippon Telegr & Teleph Corp <Ntt> Manufacture of high melting point compound thin film
JPS58157182A (en) * 1982-02-23 1983-09-19 サントル・ナシヨナル・ド・ラ・ルシユルシエ・シアンテイフイツク Small circuit using josephson effect or the like and method of producing same
JPS63265473A (en) * 1987-04-23 1988-11-01 Agency Of Ind Science & Technol Manufacture of superconducting electronic circuit

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57132381A (en) * 1981-02-10 1982-08-16 Nippon Telegr & Teleph Corp <Ntt> Manufacture of high melting point compound thin film
JPS58157182A (en) * 1982-02-23 1983-09-19 サントル・ナシヨナル・ド・ラ・ルシユルシエ・シアンテイフイツク Small circuit using josephson effect or the like and method of producing same
JPS63265473A (en) * 1987-04-23 1988-11-01 Agency Of Ind Science & Technol Manufacture of superconducting electronic circuit

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01114084A (en) * 1987-10-28 1989-05-02 Hitachi Ltd Method of forming superconductor pattern
WO1999017382A1 (en) * 1997-09-30 1999-04-08 Yoichi Okabe Method for manufacturing coplanar josephson device
CN111063788A (en) * 2019-11-27 2020-04-24 中国科学院上海微系统与信息技术研究所 Preparation method of superconducting transition edge detector
CN111063788B (en) * 2019-11-27 2022-06-07 中国科学院上海微系统与信息技术研究所 Preparation method of superconducting transition edge detector

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