JPS6486518A - Reduction projection type position detection and device therefor - Google Patents

Reduction projection type position detection and device therefor

Info

Publication number
JPS6486518A
JPS6486518A JP63027501A JP2750188A JPS6486518A JP S6486518 A JPS6486518 A JP S6486518A JP 63027501 A JP63027501 A JP 63027501A JP 2750188 A JP2750188 A JP 2750188A JP S6486518 A JPS6486518 A JP S6486518A
Authority
JP
Japan
Prior art keywords
light
laser
polarized light
splitter
alignment mark
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63027501A
Other languages
English (en)
Inventor
Nobuyuki Akiyama
Yoshihiko Yamauchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63027501A priority Critical patent/JPS6486518A/ja
Priority to US07/200,911 priority patent/US4938598A/en
Publication of JPS6486518A publication Critical patent/JPS6486518A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7076—Mark details, e.g. phase grating mark, temporary mark

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP63027501A 1987-06-05 1988-02-10 Reduction projection type position detection and device therefor Pending JPS6486518A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP63027501A JPS6486518A (en) 1987-06-05 1988-02-10 Reduction projection type position detection and device therefor
US07/200,911 US4938598A (en) 1987-06-05 1988-06-01 Method and apparatus for position detection on reduction-projection system

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP13974087 1987-06-05
JP63027501A JPS6486518A (en) 1987-06-05 1988-02-10 Reduction projection type position detection and device therefor

Publications (1)

Publication Number Publication Date
JPS6486518A true JPS6486518A (en) 1989-03-31

Family

ID=26365427

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63027501A Pending JPS6486518A (en) 1987-06-05 1988-02-10 Reduction projection type position detection and device therefor

Country Status (2)

Country Link
US (1) US4938598A (ja)
JP (1) JPS6486518A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001042431A (ja) * 1999-07-30 2001-02-16 Nitto Kogaku Kk 光源装置およびプロジェクタ装置
JP2018529104A (ja) * 2015-09-18 2018-10-04 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置のためのアライメントセンサ

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5260771A (en) * 1988-03-07 1993-11-09 Hitachi, Ltd. Method of making semiconductor integrated circuit, pattern detecting method, and system for semiconductor alignment and reduced stepping exposure for use in same
JP2862311B2 (ja) * 1990-02-23 1999-03-03 キヤノン株式会社 面位置検出装置
JP2866243B2 (ja) * 1992-02-10 1999-03-08 三菱電機株式会社 投影露光装置及び半導体装置の製造方法
JP2802193B2 (ja) * 1992-04-09 1998-09-24 三菱電機株式会社 アライメントマーク検出方法及びアライメントマーク検出装置
KR950034479A (ko) * 1994-05-24 1995-12-28 오노 시게오 조명광학계
US5965307A (en) * 1995-05-11 1999-10-12 Sumitomo Heavy Industries, Ltd. Position detecting method with observation of position detecting marks
US5827629A (en) * 1995-05-11 1998-10-27 Sumitomo Heavy Industries, Ltd. Position detecting method with observation of position detecting marks
JP3359193B2 (ja) * 1995-07-21 2002-12-24 キヤノン株式会社 露光装置及びそれを用いたデバイスの製造方法
JPH1022213A (ja) * 1996-06-28 1998-01-23 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
JPH11241908A (ja) 1997-12-03 1999-09-07 Canon Inc 位置検出装置及びそれを用いたデバイスの製造方法
JPWO2008105460A1 (ja) * 2007-02-28 2010-06-03 株式会社ニコン 観察方法、検査装置および検査方法
DE102009025810A1 (de) 2009-05-15 2010-11-18 Kroll & Ziller Gmbh & Co. Kommanditgesellschaft Dichtelement
CN103777476B (zh) 2012-10-19 2016-01-27 上海微电子装备有限公司 一种离轴对准系统及对准方法
CN103383247B (zh) * 2013-07-30 2016-08-10 中国计量科学研究院 一种光学检测系统及装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4355892A (en) * 1980-12-18 1982-10-26 Censor Patent- Und Versuchs-Anstalt Method for the projection printing
JPS61236116A (ja) * 1985-04-12 1986-10-21 Hitachi Ltd 縮小投影式アライメント方法
JPH0669014B2 (ja) * 1986-02-24 1994-08-31 株式会社ニコン 露光装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001042431A (ja) * 1999-07-30 2001-02-16 Nitto Kogaku Kk 光源装置およびプロジェクタ装置
JP2018529104A (ja) * 2015-09-18 2018-10-04 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置のためのアライメントセンサ
US10466601B2 (en) 2015-09-18 2019-11-05 Asml Netherlands B.V. Alignment sensor for lithographic apparatus

Also Published As

Publication number Publication date
US4938598A (en) 1990-07-03

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