JPS6482533A - Dry etching - Google Patents

Dry etching

Info

Publication number
JPS6482533A
JPS6482533A JP23885587A JP23885587A JPS6482533A JP S6482533 A JPS6482533 A JP S6482533A JP 23885587 A JP23885587 A JP 23885587A JP 23885587 A JP23885587 A JP 23885587A JP S6482533 A JPS6482533 A JP S6482533A
Authority
JP
Japan
Prior art keywords
article
active species
etching
gas
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP23885587A
Other languages
English (en)
Inventor
Haruo Okano
Nobuo Hayasaka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP23885587A priority Critical patent/JPS6482533A/ja
Publication of JPS6482533A publication Critical patent/JPS6482533A/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP23885587A 1987-09-25 1987-09-25 Dry etching Pending JPS6482533A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23885587A JPS6482533A (en) 1987-09-25 1987-09-25 Dry etching

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23885587A JPS6482533A (en) 1987-09-25 1987-09-25 Dry etching

Publications (1)

Publication Number Publication Date
JPS6482533A true JPS6482533A (en) 1989-03-28

Family

ID=17036265

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23885587A Pending JPS6482533A (en) 1987-09-25 1987-09-25 Dry etching

Country Status (1)

Country Link
JP (1) JPS6482533A (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03109729A (ja) * 1989-09-25 1991-05-09 Tokuda Seisakusho Ltd ドライエッチング方法
JPH05339762A (ja) * 1992-01-31 1993-12-21 Hughes Aircraft Co プラズマ補助化学エッチング用の反応ガスおよび基体の安定なプラズマエッチング方法
JPH08236512A (ja) * 1994-12-20 1996-09-13 Siemens Ag サブミクロンゲートスタック用ポリシリコン／ポリサイドｅｔｃｈ法
JP2021153170A (ja) * 2019-11-08 2021-09-30 東京エレクトロン株式会社 エッチング方法及びプラズマ処理装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03109729A (ja) * 1989-09-25 1991-05-09 Tokuda Seisakusho Ltd ドライエッチング方法
JPH05339762A (ja) * 1992-01-31 1993-12-21 Hughes Aircraft Co プラズマ補助化学エッチング用の反応ガスおよび基体の安定なプラズマエッチング方法
JPH08236512A (ja) * 1994-12-20 1996-09-13 Siemens Ag サブミクロンゲートスタック用ポリシリコン／ポリサイドｅｔｃｈ法
JP2021153170A (ja) * 2019-11-08 2021-09-30 東京エレクトロン株式会社 エッチング方法及びプラズマ処理装置

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