JPS6481223A - Coater for multi-layer film - Google Patents

Coater for multi-layer film

Info

Publication number
JPS6481223A
JPS6481223A JP23828887A JP23828887A JPS6481223A JP S6481223 A JPS6481223 A JP S6481223A JP 23828887 A JP23828887 A JP 23828887A JP 23828887 A JP23828887 A JP 23828887A JP S6481223 A JPS6481223 A JP S6481223A
Authority
JP
Japan
Prior art keywords
cup
nozzle
discharge
wafer
spin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23828887A
Other languages
English (en)
Other versions
JPH054808B2 (ja
Inventor
Takeo Hashimoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP23828887A priority Critical patent/JPS6481223A/ja
Publication of JPS6481223A publication Critical patent/JPS6481223A/ja
Publication of JPH054808B2 publication Critical patent/JPH054808B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Coating Apparatus (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP23828887A 1987-09-22 1987-09-22 Coater for multi-layer film Granted JPS6481223A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23828887A JPS6481223A (en) 1987-09-22 1987-09-22 Coater for multi-layer film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23828887A JPS6481223A (en) 1987-09-22 1987-09-22 Coater for multi-layer film

Publications (2)

Publication Number Publication Date
JPS6481223A true JPS6481223A (en) 1989-03-27
JPH054808B2 JPH054808B2 (ja) 1993-01-20

Family

ID=17027962

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23828887A Granted JPS6481223A (en) 1987-09-22 1987-09-22 Coater for multi-layer film

Country Status (1)

Country Link
JP (1) JPS6481223A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6395086B1 (en) * 1993-04-08 2002-05-28 Chartered Semiconductor Manufacturing Pte Ltd Shield for wafer station
CN109807141A (zh) * 2017-11-22 2019-05-28 长鑫存储技术有限公司 应用于光刻胶收集杯的光刻胶清洗装置和清洗方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57197069A (en) * 1981-05-29 1982-12-03 Fuji Xerox Co Ltd Apparatus for coating resist film
JPS5840275U (ja) * 1981-09-09 1983-03-16 日本電気株式会社 塗布装置
JPS5916332A (ja) * 1982-07-19 1984-01-27 Nec Corp 半導体装置の製造方法
JPS59155841A (ja) * 1983-02-25 1984-09-05 Matsushita Electric Ind Co Ltd 塗布装置および塗布膜形成方法
JPS59211226A (ja) * 1983-05-17 1984-11-30 Nec Kyushu Ltd 半導体基板のレジスト塗布装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5840275B2 (ja) * 1976-12-06 1983-09-05 富士通株式会社 コラツプス磁界自動測定装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57197069A (en) * 1981-05-29 1982-12-03 Fuji Xerox Co Ltd Apparatus for coating resist film
JPS5840275U (ja) * 1981-09-09 1983-03-16 日本電気株式会社 塗布装置
JPS5916332A (ja) * 1982-07-19 1984-01-27 Nec Corp 半導体装置の製造方法
JPS59155841A (ja) * 1983-02-25 1984-09-05 Matsushita Electric Ind Co Ltd 塗布装置および塗布膜形成方法
JPS59211226A (ja) * 1983-05-17 1984-11-30 Nec Kyushu Ltd 半導体基板のレジスト塗布装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6395086B1 (en) * 1993-04-08 2002-05-28 Chartered Semiconductor Manufacturing Pte Ltd Shield for wafer station
CN109807141A (zh) * 2017-11-22 2019-05-28 长鑫存储技术有限公司 应用于光刻胶收集杯的光刻胶清洗装置和清洗方法

Also Published As

Publication number Publication date
JPH054808B2 (ja) 1993-01-20

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