JPS6480944A - Photosensitive resin composition - Google Patents

Photosensitive resin composition

Info

Publication number
JPS6480944A
JPS6480944A JP23712487A JP23712487A JPS6480944A JP S6480944 A JPS6480944 A JP S6480944A JP 23712487 A JP23712487 A JP 23712487A JP 23712487 A JP23712487 A JP 23712487A JP S6480944 A JPS6480944 A JP S6480944A
Authority
JP
Japan
Prior art keywords
diazoketone
aliphatic
sensitivity
alkali
resolution
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23712487A
Other languages
English (en)
Other versions
JPH07117750B2 (ja
Inventor
Hisashi Sugiyama
Kazuo Nate
Akiko Mizushima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP23712487A priority Critical patent/JPH07117750B2/ja
Priority to US07/247,882 priority patent/US5158855A/en
Publication of JPS6480944A publication Critical patent/JPS6480944A/ja
Publication of JPH07117750B2 publication Critical patent/JPH07117750B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/016—Diazonium salts or compounds
    • G03F7/0163—Non ionic diazonium compounds, e.g. diazosulphonates; Precursors thereof, e.g. triazenes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
JP23712487A 1987-09-24 1987-09-24 感光性樹脂組成物 Expired - Lifetime JPH07117750B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP23712487A JPH07117750B2 (ja) 1987-09-24 1987-09-24 感光性樹脂組成物
US07/247,882 US5158855A (en) 1987-09-24 1988-09-22 α-diazoacetoacetates and photosensitive resin compositions containing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23712487A JPH07117750B2 (ja) 1987-09-24 1987-09-24 感光性樹脂組成物

Publications (2)

Publication Number Publication Date
JPS6480944A true JPS6480944A (en) 1989-03-27
JPH07117750B2 JPH07117750B2 (ja) 1995-12-18

Family

ID=17010766

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23712487A Expired - Lifetime JPH07117750B2 (ja) 1987-09-24 1987-09-24 感光性樹脂組成物

Country Status (1)

Country Link
JP (1) JPH07117750B2 (ja)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01155338A (ja) * 1987-12-14 1989-06-19 Hitachi Ltd 感光性樹脂組成物
JPH01155339A (ja) * 1987-12-14 1989-06-19 Hitachi Ltd 感光性樹脂組成物
JPH02239250A (ja) * 1989-01-12 1990-09-21 Hoechst Ag 多官能α―ジアゾ―β―ケトエステルを含有するポジ作動性感放射線混合物、その製法およびこの混合物を含有する感放射線記録材料
US5350660A (en) * 1990-01-30 1994-09-27 Wako Pure Chemical Industries, Ltd. Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere
EP0704762A1 (en) 1994-09-02 1996-04-03 Wako Pure Chemical Industries Ltd Resist material and pattern formation
EP0690348A3 (en) * 1994-06-27 1996-05-15 Ibm Photoresist composition for deep UV and method for its use
EP0780732A2 (en) 1995-12-21 1997-06-25 Wako Pure Chemical Industries Ltd Polymer composition and resist material
KR100313150B1 (ko) * 1997-12-31 2001-12-28 박종섭 리소콜릴에시딜(메타)아크릴레이트 단량체와 그를 도입한 공중합체 수지 및 이 수지를 이용한 포토레지스트
KR100583092B1 (ko) * 2000-06-15 2006-05-24 주식회사 하이닉스반도체 레지스트 플로우 공정용 포토레지스트 조성물의 첨가제
KR100604793B1 (ko) * 1999-11-16 2006-07-26 삼성전자주식회사 감광성 중합체 및 이를 포함하는 화학 증폭형포토레지스트 조성물
CN114031736A (zh) * 2021-12-17 2022-02-11 广东粤港澳大湾区黄埔材料研究院 一种光刻胶用改性酚醛树脂及其制备方法和光刻胶组合物

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01155338A (ja) * 1987-12-14 1989-06-19 Hitachi Ltd 感光性樹脂組成物
JPH01155339A (ja) * 1987-12-14 1989-06-19 Hitachi Ltd 感光性樹脂組成物
JPH02239250A (ja) * 1989-01-12 1990-09-21 Hoechst Ag 多官能α―ジアゾ―β―ケトエステルを含有するポジ作動性感放射線混合物、その製法およびこの混合物を含有する感放射線記録材料
US5350660A (en) * 1990-01-30 1994-09-27 Wako Pure Chemical Industries, Ltd. Chemical amplified resist material containing photosensitive compound capable of generating an acid and specific polystyrene copolymer having functional groups that become alkali-soluble under an acid atmosphere
EP0690348A3 (en) * 1994-06-27 1996-05-15 Ibm Photoresist composition for deep UV and method for its use
EP0704762A1 (en) 1994-09-02 1996-04-03 Wako Pure Chemical Industries Ltd Resist material and pattern formation
EP0780732A2 (en) 1995-12-21 1997-06-25 Wako Pure Chemical Industries Ltd Polymer composition and resist material
KR100313150B1 (ko) * 1997-12-31 2001-12-28 박종섭 리소콜릴에시딜(메타)아크릴레이트 단량체와 그를 도입한 공중합체 수지 및 이 수지를 이용한 포토레지스트
KR100604793B1 (ko) * 1999-11-16 2006-07-26 삼성전자주식회사 감광성 중합체 및 이를 포함하는 화학 증폭형포토레지스트 조성물
KR100583092B1 (ko) * 2000-06-15 2006-05-24 주식회사 하이닉스반도체 레지스트 플로우 공정용 포토레지스트 조성물의 첨가제
CN114031736A (zh) * 2021-12-17 2022-02-11 广东粤港澳大湾区黄埔材料研究院 一种光刻胶用改性酚醛树脂及其制备方法和光刻胶组合物
CN114031736B (zh) * 2021-12-17 2023-10-10 广东粤港澳大湾区黄埔材料研究院 一种光刻胶用改性酚醛树脂及其制备方法和光刻胶组合物

Also Published As

Publication number Publication date
JPH07117750B2 (ja) 1995-12-18

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