JPS6476755A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS6476755A JPS6476755A JP62232209A JP23220987A JPS6476755A JP S6476755 A JPS6476755 A JP S6476755A JP 62232209 A JP62232209 A JP 62232209A JP 23220987 A JP23220987 A JP 23220987A JP S6476755 A JPS6476755 A JP S6476755A
- Authority
- JP
- Japan
- Prior art keywords
- channel
- face
- current flows
- becomes minimum
- stress
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
- 239000000758 substrate Substances 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/04—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes
- H01L29/045—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their crystalline structure, e.g. polycrystalline, cubic or particular orientation of crystalline planes by their particular orientation of crystalline planes
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
Abstract
PURPOSE:To reduce the characteristics fluctuation due to stress applied from resin, and stabilize characteristics, by using a silicon substrate of face 110, and arranging a P-channel FET element in a manner in which the channel current flows in a specific direction. CONSTITUTION:A silicon substrate 1 of face 110 is used. The source electrode 5, the gate electrode 6, and the drain electrode 7 of a P-channel FET are arranged in the direction <110>, and the P-channel current flows in the direction <110>. The source electrode 10, the gate electrode 11 and the drain electrode 12 of an N-channel FET are arranged in the direction <110>, and the N- channel current flows in the direction <110>. As the result of characteristics fluctuation caused by the stress of a resin-seal type FET element, an important piezoelectric resistance coefficient pi55' becomes minimum in the direction <110> of face 110 in the case of P-channel, and pi55' of N-channel becomes minimum in the direction <110> of face 110. Since characteristics fluctuation due to stress becomes minimum, stable characteristics are obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62232209A JPS6476755A (en) | 1987-09-18 | 1987-09-18 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62232209A JPS6476755A (en) | 1987-09-18 | 1987-09-18 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6476755A true JPS6476755A (en) | 1989-03-22 |
Family
ID=16935695
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62232209A Pending JPS6476755A (en) | 1987-09-18 | 1987-09-18 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6476755A (en) |
Cited By (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6615668B2 (en) | 2000-10-27 | 2003-09-09 | Denso Corporation | Semiconductor pressure sensor having signal processor circuit |
US7144767B2 (en) | 2003-09-23 | 2006-12-05 | International Business Machines Corporation | NFETs using gate induced stress modulation |
US7148559B2 (en) * | 2003-06-20 | 2006-12-12 | International Business Machines Corporation | Substrate engineering for optimum CMOS device performance |
US7202513B1 (en) | 2005-09-29 | 2007-04-10 | International Business Machines Corporation | Stress engineering using dual pad nitride with selective SOI device architecture |
US7202132B2 (en) | 2004-01-16 | 2007-04-10 | International Business Machines Corporation | Protecting silicon germanium sidewall with silicon for strained silicon/silicon germanium MOSFETs |
US7205207B2 (en) | 2003-10-16 | 2007-04-17 | International Business Machines Corporation | High performance strained CMOS devices |
US7224033B2 (en) | 2005-02-15 | 2007-05-29 | International Business Machines Corporation | Structure and method for manufacturing strained FINFET |
JP2007141977A (en) * | 2005-11-16 | 2007-06-07 | Matsushita Electric Ind Co Ltd | Semiconductor device |
US7274084B2 (en) | 2005-01-12 | 2007-09-25 | International Business Machines Corporation | Enhanced PFET using shear stress |
US7297601B2 (en) | 2003-09-09 | 2007-11-20 | International Business Machines Corporation | Method for reduced N+ diffusion in strained Si on SiGe substrate |
WO2007142107A1 (en) * | 2006-06-07 | 2007-12-13 | Sharp Kabushiki Kaisha | Power ic device and method for manufacturing same |
US7388259B2 (en) | 2002-11-25 | 2008-06-17 | International Business Machines Corporation | Strained finFET CMOS device structures |
US7452761B2 (en) | 2004-02-27 | 2008-11-18 | International Business Machines Corporation | Hybrid SOI-bulk semiconductor transistors |
JP2009521808A (en) * | 2005-12-22 | 2009-06-04 | ビシェイ−シリコニクス | High mobility power metal oxide semiconductor field effect transistor |
US7544577B2 (en) | 2005-08-26 | 2009-06-09 | International Business Machines Corporation | Mobility enhancement in SiGe heterojunction bipolar transistors |
US7615435B2 (en) | 2007-07-31 | 2009-11-10 | International Business Machines Corporation | Semiconductor device and method of manufacture |
US7635620B2 (en) | 2006-01-10 | 2009-12-22 | International Business Machines Corporation | Semiconductor device structure having enhanced performance FET device |
US7709317B2 (en) | 2005-11-14 | 2010-05-04 | International Business Machines Corporation | Method to increase strain enhancement with spacerless FET and dual liner process |
US7741185B2 (en) | 2005-03-29 | 2010-06-22 | Fujitsu Semiconductor Limited | Method of manufacturing semiconductor device |
US7776695B2 (en) | 2006-01-09 | 2010-08-17 | International Business Machines Corporation | Semiconductor device structure having low and high performance devices of same conductive type on same substrate |
US7785950B2 (en) | 2005-11-10 | 2010-08-31 | International Business Machines Corporation | Dual stress memory technique method and related structure |
WO2010116587A1 (en) * | 2009-04-09 | 2010-10-14 | パナソニック株式会社 | Semiconductor device and method of producing same |
US7964865B2 (en) | 2003-09-23 | 2011-06-21 | International Business Machines Corporation | Strained silicon on relaxed sige film with uniform misfit dislocation density |
US8183643B2 (en) | 2000-09-28 | 2012-05-22 | Oki Semiconductor Co., Ltd. | Semiconductor device having silicide layer completely occupied amorphous layer formed in the substrate and an interface junction of (111) silicon plane |
US8853746B2 (en) | 2006-06-29 | 2014-10-07 | International Business Machines Corporation | CMOS devices with stressed channel regions, and methods for fabricating the same |
US9006836B2 (en) | 2004-01-16 | 2015-04-14 | International Business Machines Corporation | Method and structure for controlling stress in a transistor channel |
US9053970B2 (en) | 2004-07-23 | 2015-06-09 | International Business Machines Corporation | Patterned strained semiconductor substrate and device |
US9685524B2 (en) | 2005-03-11 | 2017-06-20 | Vishay-Siliconix | Narrow semiconductor trench structure |
US9887266B2 (en) | 2006-03-21 | 2018-02-06 | Vishay-Siliconix | Ultra-low drain-source resistance power MOSFET |
-
1987
- 1987-09-18 JP JP62232209A patent/JPS6476755A/en active Pending
Cited By (38)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8183643B2 (en) | 2000-09-28 | 2012-05-22 | Oki Semiconductor Co., Ltd. | Semiconductor device having silicide layer completely occupied amorphous layer formed in the substrate and an interface junction of (111) silicon plane |
US6615668B2 (en) | 2000-10-27 | 2003-09-09 | Denso Corporation | Semiconductor pressure sensor having signal processor circuit |
US7388259B2 (en) | 2002-11-25 | 2008-06-17 | International Business Machines Corporation | Strained finFET CMOS device structures |
US7148559B2 (en) * | 2003-06-20 | 2006-12-12 | International Business Machines Corporation | Substrate engineering for optimum CMOS device performance |
US7482216B2 (en) | 2003-06-20 | 2009-01-27 | International Business Machines Corporation | Substrate engineering for optimum CMOS device performance |
US7297601B2 (en) | 2003-09-09 | 2007-11-20 | International Business Machines Corporation | Method for reduced N+ diffusion in strained Si on SiGe substrate |
US7410846B2 (en) | 2003-09-09 | 2008-08-12 | International Business Machines Corporation | Method for reduced N+ diffusion in strained Si on SiGe substrate |
US7964865B2 (en) | 2003-09-23 | 2011-06-21 | International Business Machines Corporation | Strained silicon on relaxed sige film with uniform misfit dislocation density |
US7144767B2 (en) | 2003-09-23 | 2006-12-05 | International Business Machines Corporation | NFETs using gate induced stress modulation |
US7205207B2 (en) | 2003-10-16 | 2007-04-17 | International Business Machines Corporation | High performance strained CMOS devices |
US7202132B2 (en) | 2004-01-16 | 2007-04-10 | International Business Machines Corporation | Protecting silicon germanium sidewall with silicon for strained silicon/silicon germanium MOSFETs |
US9006836B2 (en) | 2004-01-16 | 2015-04-14 | International Business Machines Corporation | Method and structure for controlling stress in a transistor channel |
US7767503B2 (en) | 2004-02-27 | 2010-08-03 | International Business Machines Corporation | Hybrid SOI/bulk semiconductor transistors |
US7923782B2 (en) | 2004-02-27 | 2011-04-12 | International Business Machines Corporation | Hybrid SOI/bulk semiconductor transistors |
US7452761B2 (en) | 2004-02-27 | 2008-11-18 | International Business Machines Corporation | Hybrid SOI-bulk semiconductor transistors |
US9515140B2 (en) | 2004-07-23 | 2016-12-06 | Globalfoundries Inc. | Patterned strained semiconductor substrate and device |
US9053970B2 (en) | 2004-07-23 | 2015-06-09 | International Business Machines Corporation | Patterned strained semiconductor substrate and device |
US7274084B2 (en) | 2005-01-12 | 2007-09-25 | International Business Machines Corporation | Enhanced PFET using shear stress |
US7224033B2 (en) | 2005-02-15 | 2007-05-29 | International Business Machines Corporation | Structure and method for manufacturing strained FINFET |
US9685524B2 (en) | 2005-03-11 | 2017-06-20 | Vishay-Siliconix | Narrow semiconductor trench structure |
US7741185B2 (en) | 2005-03-29 | 2010-06-22 | Fujitsu Semiconductor Limited | Method of manufacturing semiconductor device |
US7544577B2 (en) | 2005-08-26 | 2009-06-09 | International Business Machines Corporation | Mobility enhancement in SiGe heterojunction bipolar transistors |
US7202513B1 (en) | 2005-09-29 | 2007-04-10 | International Business Machines Corporation | Stress engineering using dual pad nitride with selective SOI device architecture |
US7785950B2 (en) | 2005-11-10 | 2010-08-31 | International Business Machines Corporation | Dual stress memory technique method and related structure |
US7709317B2 (en) | 2005-11-14 | 2010-05-04 | International Business Machines Corporation | Method to increase strain enhancement with spacerless FET and dual liner process |
US8686544B2 (en) | 2005-11-16 | 2014-04-01 | Panasonic Corporation | Semiconductor device |
JP2007141977A (en) * | 2005-11-16 | 2007-06-07 | Matsushita Electric Ind Co Ltd | Semiconductor device |
JP2009521808A (en) * | 2005-12-22 | 2009-06-04 | ビシェイ−シリコニクス | High mobility power metal oxide semiconductor field effect transistor |
US9425043B2 (en) | 2005-12-22 | 2016-08-23 | Vishay-Siliconix | High mobility power metal-oxide semiconductor field-effect transistors |
US9437424B2 (en) | 2005-12-22 | 2016-09-06 | Vishay-Siliconix | High mobility power metal-oxide semiconductor field-effect transistors |
US7776695B2 (en) | 2006-01-09 | 2010-08-17 | International Business Machines Corporation | Semiconductor device structure having low and high performance devices of same conductive type on same substrate |
US7635620B2 (en) | 2006-01-10 | 2009-12-22 | International Business Machines Corporation | Semiconductor device structure having enhanced performance FET device |
US9887266B2 (en) | 2006-03-21 | 2018-02-06 | Vishay-Siliconix | Ultra-low drain-source resistance power MOSFET |
US7902595B2 (en) | 2006-06-07 | 2011-03-08 | Sharp Kabushiki Kaisha | Power IC device and method of manufacturing same |
WO2007142107A1 (en) * | 2006-06-07 | 2007-12-13 | Sharp Kabushiki Kaisha | Power ic device and method for manufacturing same |
US8853746B2 (en) | 2006-06-29 | 2014-10-07 | International Business Machines Corporation | CMOS devices with stressed channel regions, and methods for fabricating the same |
US7615435B2 (en) | 2007-07-31 | 2009-11-10 | International Business Machines Corporation | Semiconductor device and method of manufacture |
WO2010116587A1 (en) * | 2009-04-09 | 2010-10-14 | パナソニック株式会社 | Semiconductor device and method of producing same |
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