JPS6476659A - Electron beam microanalyzer - Google Patents

Electron beam microanalyzer

Info

Publication number
JPS6476659A
JPS6476659A JP62234327A JP23432787A JPS6476659A JP S6476659 A JPS6476659 A JP S6476659A JP 62234327 A JP62234327 A JP 62234327A JP 23432787 A JP23432787 A JP 23432787A JP S6476659 A JPS6476659 A JP S6476659A
Authority
JP
Japan
Prior art keywords
sample
electron beam
spattering
observation
composition analysis
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62234327A
Other languages
Japanese (ja)
Inventor
Tetsuro Sato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62234327A priority Critical patent/JPS6476659A/en
Publication of JPS6476659A publication Critical patent/JPS6476659A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To perform the observation or composition analysis inside a sample by spattering the sample surface with an ion gun in the mirror body of an electron beam microanalyzer. CONSTITUTION:Fluorescent X-rays 13 and secondary electrons 15 are generated from the surface of a sample by the radiation of an electron beam 12. The fluorescent X-rays 13 are spectrum-analyzed by an X-ray spectroscope 10 and detected by an X-ray detector 9. The secondary electrons generated from a sample 6a are detected by a secondary electron detector 8. For the spattering of the sample 6a by an ion beam 14 generated from an ion gun 11, the sample 6a is moved to the position for spattering by a sample moving device 7, and the sample surface is spattered by the ion beam 14 of the ion gun 11. A sample 6b is then moved to the position for the observation or composition analysis of the sample by the sample moving device 7 again, and the observation or composition analysis of the sample surface is performed.
JP62234327A 1987-09-17 1987-09-17 Electron beam microanalyzer Pending JPS6476659A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62234327A JPS6476659A (en) 1987-09-17 1987-09-17 Electron beam microanalyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62234327A JPS6476659A (en) 1987-09-17 1987-09-17 Electron beam microanalyzer

Publications (1)

Publication Number Publication Date
JPS6476659A true JPS6476659A (en) 1989-03-22

Family

ID=16969266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62234327A Pending JPS6476659A (en) 1987-09-17 1987-09-17 Electron beam microanalyzer

Country Status (1)

Country Link
JP (1) JPS6476659A (en)

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