JPS6472583A - Wavelength tunable semiconductor laser - Google Patents
Wavelength tunable semiconductor laserInfo
- Publication number
- JPS6472583A JPS6472583A JP22891087A JP22891087A JPS6472583A JP S6472583 A JPS6472583 A JP S6472583A JP 22891087 A JP22891087 A JP 22891087A JP 22891087 A JP22891087 A JP 22891087A JP S6472583 A JPS6472583 A JP S6472583A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- waveguide
- thickness
- single crystal
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/06—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium
- H01S5/062—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes
- H01S5/0625—Arrangements for controlling the laser output parameters, e.g. by operating on the active medium by varying the potential of the electrodes in multi-section lasers
- H01S5/06255—Controlling the frequency of the radiation
- H01S5/06256—Controlling the frequency of the radiation with DBR-structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
- H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
- H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
Abstract
PURPOSE:To increase the width of variation of an emitted light wavelength by forming a waveguide having a variable refractive index in a superlattice structure formed of a base crystal layer and a single crystal layer having smaller energy gap than that of the base layer, and forming the thickness of the single crystal layer so as to sequentially increase the thickness toward a separation from its center. CONSTITUTION:An optical resonator is provided in a semiconductor single crystal, and a voltage is applied to the part of the waveguide of the resonator to vary the refractive index of the waveguide. In such a semiconductor laser, the waveguide having the variable refractive index is formed in a superlattice structure formed of a base crystal layer and a single cryltal layer having smaller energy gap than that of the base crystal in such a manner that the thicknesses of the single crystal layers each having the small energy gap are so increased sequentially toward a separation from its center. For example, the superlattice layer 3b is formed of an InGaAsP layer for forming a quantum well and an InP layer of a barrier layer, and the thickness of the two n-th InGaAsP layers counted from the central layer are set to (1+alphan2)W0 with respect to the thickness W0 of the InGaAsP layer disposed at the center.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62228910A JP2666297B2 (en) | 1987-09-11 | 1987-09-11 | Tunable semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62228910A JP2666297B2 (en) | 1987-09-11 | 1987-09-11 | Tunable semiconductor laser |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6472583A true JPS6472583A (en) | 1989-03-17 |
JP2666297B2 JP2666297B2 (en) | 1997-10-22 |
Family
ID=16883768
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62228910A Expired - Lifetime JP2666297B2 (en) | 1987-09-11 | 1987-09-11 | Tunable semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2666297B2 (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01152784A (en) * | 1987-12-10 | 1989-06-15 | Sony Corp | Electrode structure of semiconductor laser |
JPH01175784A (en) * | 1987-12-29 | 1989-07-12 | Matsushita Electric Ind Co Ltd | Optical integrated circuit |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS561589A (en) * | 1979-06-18 | 1981-01-09 | Furukawa Electric Co Ltd:The | Method of controlling laser oscillation output |
JPS6142189A (en) * | 1984-08-02 | 1986-02-28 | Matsushita Electric Ind Co Ltd | Semiconductor laser |
JPS6154690A (en) * | 1984-08-24 | 1986-03-18 | Nec Corp | Semiconductor laser device |
JPS61116896A (en) * | 1984-11-13 | 1986-06-04 | Sharp Corp | Semiconductor laser device |
JPS62183587A (en) * | 1986-02-07 | 1987-08-11 | Fujitsu Ltd | Semiconductor laser |
-
1987
- 1987-09-11 JP JP62228910A patent/JP2666297B2/en not_active Expired - Lifetime
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS561589A (en) * | 1979-06-18 | 1981-01-09 | Furukawa Electric Co Ltd:The | Method of controlling laser oscillation output |
JPS6142189A (en) * | 1984-08-02 | 1986-02-28 | Matsushita Electric Ind Co Ltd | Semiconductor laser |
JPS6154690A (en) * | 1984-08-24 | 1986-03-18 | Nec Corp | Semiconductor laser device |
JPS61116896A (en) * | 1984-11-13 | 1986-06-04 | Sharp Corp | Semiconductor laser device |
JPS62183587A (en) * | 1986-02-07 | 1987-08-11 | Fujitsu Ltd | Semiconductor laser |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01152784A (en) * | 1987-12-10 | 1989-06-15 | Sony Corp | Electrode structure of semiconductor laser |
JPH01175784A (en) * | 1987-12-29 | 1989-07-12 | Matsushita Electric Ind Co Ltd | Optical integrated circuit |
Also Published As
Publication number | Publication date |
---|---|
JP2666297B2 (en) | 1997-10-22 |
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