JPS646943Y2 - - Google Patents
Info
- Publication number
- JPS646943Y2 JPS646943Y2 JP16023284U JP16023284U JPS646943Y2 JP S646943 Y2 JPS646943 Y2 JP S646943Y2 JP 16023284 U JP16023284 U JP 16023284U JP 16023284 U JP16023284 U JP 16023284U JP S646943 Y2 JPS646943 Y2 JP S646943Y2
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- chamber
- substrate
- inlet
- vapor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000758 substrate Substances 0.000 claims description 41
- 239000011248 coating agent Substances 0.000 claims description 10
- 238000000576 coating method Methods 0.000 claims description 10
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 9
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 229910001873 dinitrogen Inorganic materials 0.000 description 5
- 239000011550 stock solution Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Coating Apparatus (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16023284U JPS646943Y2 (enExample) | 1984-10-23 | 1984-10-23 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16023284U JPS646943Y2 (enExample) | 1984-10-23 | 1984-10-23 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6175873U JPS6175873U (enExample) | 1986-05-22 |
| JPS646943Y2 true JPS646943Y2 (enExample) | 1989-02-23 |
Family
ID=30718157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16023284U Expired JPS646943Y2 (enExample) | 1984-10-23 | 1984-10-23 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS646943Y2 (enExample) |
-
1984
- 1984-10-23 JP JP16023284U patent/JPS646943Y2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6175873U (enExample) | 1986-05-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR20030042614A (ko) | Ｃｖｄ 장치의 멀티섹터 평판형 샤워헤드 | |
| JPH05239634A (ja) | 陰極スパッタリング装置 | |
| JPH06349761A (ja) | 半導体製造装置用ガス供給ノズル及び半導体製造装置 | |
| JPS646943Y2 (enExample) | ||
| JP2005536602A5 (enExample) | ||
| AU2003300509A1 (en) | Arrays of electrodes coated with molecules and their production | |
| JPH0322428A (ja) | 半導体装置の製造装置 | |
| JPH1056054A (ja) | ヒータ付き基板載置台、成膜装置及びエッチング装置 | |
| JPS6335776A (ja) | 気相化学蒸着装置 | |
| JPH0330326A (ja) | 半導体製造装置 | |
| EP3895801A1 (en) | Valve system for driving fluid and method for using the same | |
| JP3115640B2 (ja) | プラズマ処理装置およびそれに用いる電極の構造 | |
| CN111715440A (zh) | 一种全自动超声波干化学多层膜制备设备 | |
| KR100404859B1 (ko) | 박형 유기 이엘 패널 및 그의 패시베이션 방법 | |
| CN220753376U (zh) | 一种控温装置 | |
| JPS6235264B2 (enExample) | ||
| KR200144699Y1 (ko) | 핵사메틸디사일렌 도포용 챔버 | |
| JPS61283862A (ja) | 酵素固定化膜の製造方法 | |
| JPS5966120A (ja) | 半導体製造装置 | |
| JPS63310117A (ja) | 半導体製造用現像装置 | |
| JPS59112872A (ja) | 回転塗装装置 | |
| CN115976495A (zh) | 一种用于微纳光栅阴极组件的ald镀膜夹具 | |
| JP2647997B2 (ja) | 常圧ｃｖｄ装置 | |
| JPS6349734A (ja) | 液晶素子の製造方法 | |
| JPS6061722U (ja) | 成膜装置 |