JPS6468470A - Plasma electron beam heating source - Google Patents

Plasma electron beam heating source

Info

Publication number
JPS6468470A
JPS6468470A JP22409087A JP22409087A JPS6468470A JP S6468470 A JPS6468470 A JP S6468470A JP 22409087 A JP22409087 A JP 22409087A JP 22409087 A JP22409087 A JP 22409087A JP S6468470 A JPS6468470 A JP S6468470A
Authority
JP
Japan
Prior art keywords
electron beam
heated
plasma electron
container
electron gun
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP22409087A
Other languages
English (en)
Inventor
Akihiko Toku
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Seimaku KK
Original Assignee
Ulvac Seimaku KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Seimaku KK filed Critical Ulvac Seimaku KK
Priority to JP22409087A priority Critical patent/JPS6468470A/ja
Publication of JPS6468470A publication Critical patent/JPS6468470A/ja
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
JP22409087A 1987-09-09 1987-09-09 Plasma electron beam heating source Pending JPS6468470A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22409087A JPS6468470A (en) 1987-09-09 1987-09-09 Plasma electron beam heating source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22409087A JPS6468470A (en) 1987-09-09 1987-09-09 Plasma electron beam heating source

Publications (1)

Publication Number Publication Date
JPS6468470A true JPS6468470A (en) 1989-03-14

Family

ID=16808392

Family Applications (1)

Application Number Title Priority Date Filing Date
JP22409087A Pending JPS6468470A (en) 1987-09-09 1987-09-09 Plasma electron beam heating source

Country Status (1)

Country Link
JP (1) JPS6468470A (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02290964A (ja) * 1989-04-28 1990-11-30 Hoya Corp プラスチックレンズ基板への二酸化チタン膜の形成方法
JP2012533686A (ja) * 2009-07-23 2012-12-27 エムエスゲー リトグラス アクチエンゲゼルシャフト 構造化被覆部を基板上に形成する方法、被覆済み基板、および、被覆済み基板を備えた半完成品
JP2014231618A (ja) * 2013-05-28 2014-12-11 住友重機械工業株式会社 蒸発炉及び蒸発装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50148285A (ja) * 1974-05-02 1975-11-27
JPS56163265A (en) * 1980-05-19 1981-12-15 Rohm Co Ltd Vapor depositing apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50148285A (ja) * 1974-05-02 1975-11-27
JPS56163265A (en) * 1980-05-19 1981-12-15 Rohm Co Ltd Vapor depositing apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02290964A (ja) * 1989-04-28 1990-11-30 Hoya Corp プラスチックレンズ基板への二酸化チタン膜の形成方法
JP2012533686A (ja) * 2009-07-23 2012-12-27 エムエスゲー リトグラス アクチエンゲゼルシャフト 構造化被覆部を基板上に形成する方法、被覆済み基板、および、被覆済み基板を備えた半完成品
JP2016166425A (ja) * 2009-07-23 2016-09-15 エムエスゲー リトグラス ゲーエムベーハー 構造化被覆部を基板上に形成する方法および被覆済み基板
US10954591B2 (en) 2009-07-23 2021-03-23 Msg Lithoglas Ag Method for producing a structured coating on a substrate, coated substrate, and semi-finished product having a coated substrate
JP2014231618A (ja) * 2013-05-28 2014-12-11 住友重機械工業株式会社 蒸発炉及び蒸発装置

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