JPS6467824A - Forming device for oxide superconducting material - Google Patents

Forming device for oxide superconducting material

Info

Publication number
JPS6467824A
JPS6467824A JP62223674A JP22367487A JPS6467824A JP S6467824 A JPS6467824 A JP S6467824A JP 62223674 A JP62223674 A JP 62223674A JP 22367487 A JP22367487 A JP 22367487A JP S6467824 A JPS6467824 A JP S6467824A
Authority
JP
Japan
Prior art keywords
space
thin film
oxide superconducting
gas
magnetic field
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62223674A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0556282B2 (enrdf_load_html_response
Inventor
Shunpei Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Semiconductor Energy Laboratory Co Ltd
Original Assignee
Semiconductor Energy Laboratory Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP62223674A priority Critical patent/JPS6467824A/ja
Publication of JPS6467824A publication Critical patent/JPS6467824A/ja
Publication of JPH0556282B2 publication Critical patent/JPH0556282B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Oxygen, Ozone, And Oxides In General (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
JP62223674A 1987-09-07 1987-09-07 Forming device for oxide superconducting material Granted JPS6467824A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62223674A JPS6467824A (en) 1987-09-07 1987-09-07 Forming device for oxide superconducting material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62223674A JPS6467824A (en) 1987-09-07 1987-09-07 Forming device for oxide superconducting material

Publications (2)

Publication Number Publication Date
JPS6467824A true JPS6467824A (en) 1989-03-14
JPH0556282B2 JPH0556282B2 (enrdf_load_html_response) 1993-08-19

Family

ID=16801869

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62223674A Granted JPS6467824A (en) 1987-09-07 1987-09-07 Forming device for oxide superconducting material

Country Status (1)

Country Link
JP (1) JPS6467824A (enrdf_load_html_response)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0288408A (ja) * 1988-05-31 1990-03-28 Mitsubishi Metal Corp 超電導セラミックス膜の製造法
JPH0288763A (ja) * 1988-09-26 1990-03-28 Matsushita Electric Ind Co Ltd 薄膜超電導体およびその製造方法および製造装置

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI438953B (zh) * 2008-01-30 2014-05-21 Osram Opto Semiconductors Gmbh 電子組件之製造方法及電子組件

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56109824A (en) * 1980-02-05 1981-08-31 Nippon Telegr & Teleph Corp <Ntt> Manufacture of oxide superconductive thin film
JPS5963732A (ja) * 1982-10-04 1984-04-11 Hitachi Ltd 薄膜形成装置
JPS59219461A (ja) * 1983-05-24 1984-12-10 Toshiba Corp アモルフアスシリコン成膜装置
JPS60117711A (ja) * 1983-11-30 1985-06-25 Toshiba Corp 薄膜形成装置
JPS61109036A (ja) * 1984-11-01 1986-05-27 Canon Inc テレビレンズの表示装置
JPS61125133A (ja) * 1984-11-22 1986-06-12 Hitachi Ltd 低温プラズマ電磁界制御機構
JPS61267324A (ja) * 1985-05-21 1986-11-26 Fuji Electric Co Ltd 乾式薄膜加工装置
JPS62150726A (ja) * 1985-12-24 1987-07-04 Fuji Electric Co Ltd 半導体装置の製造方法

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56109824A (en) * 1980-02-05 1981-08-31 Nippon Telegr & Teleph Corp <Ntt> Manufacture of oxide superconductive thin film
JPS5963732A (ja) * 1982-10-04 1984-04-11 Hitachi Ltd 薄膜形成装置
JPS59219461A (ja) * 1983-05-24 1984-12-10 Toshiba Corp アモルフアスシリコン成膜装置
JPS60117711A (ja) * 1983-11-30 1985-06-25 Toshiba Corp 薄膜形成装置
JPS61109036A (ja) * 1984-11-01 1986-05-27 Canon Inc テレビレンズの表示装置
JPS61125133A (ja) * 1984-11-22 1986-06-12 Hitachi Ltd 低温プラズマ電磁界制御機構
JPS61267324A (ja) * 1985-05-21 1986-11-26 Fuji Electric Co Ltd 乾式薄膜加工装置
JPS62150726A (ja) * 1985-12-24 1987-07-04 Fuji Electric Co Ltd 半導体装置の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0288408A (ja) * 1988-05-31 1990-03-28 Mitsubishi Metal Corp 超電導セラミックス膜の製造法
JPH0288763A (ja) * 1988-09-26 1990-03-28 Matsushita Electric Ind Co Ltd 薄膜超電導体およびその製造方法および製造装置

Also Published As

Publication number Publication date
JPH0556282B2 (enrdf_load_html_response) 1993-08-19

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