JPS6463072A - Wax coating method - Google Patents
Wax coating methodInfo
- Publication number
- JPS6463072A JPS6463072A JP62219578A JP21957887A JPS6463072A JP S6463072 A JPS6463072 A JP S6463072A JP 62219578 A JP62219578 A JP 62219578A JP 21957887 A JP21957887 A JP 21957887A JP S6463072 A JPS6463072 A JP S6463072A
- Authority
- JP
- Japan
- Prior art keywords
- wax
- wafer
- storage part
- coating
- built
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating Apparatus (AREA)
Abstract
PURPOSE:To eliminate the running off of wax from the peripheral margin of a wafer so that uniform coating can be executed by building up the wax by surface tension in the aperture of a wax storage part and pressing the coating surface of the wafer, faced downward, to the wax, thereby sticking the wax to the coating surface. CONSTITUTION:The wax Wx for one sheet of the wafer W is admitted into the storage part 6 from a communication route 7 by the stroke of a main actuator 11 so that the wax Wx in the storage part 6 is held built up by the surface tension from the top margin of a ring 17. The surface to be polished of the wafer W is then sucked and held to the rear face of a disk member 24 of a suction part 23 and an auxiliary actuator 12 is actuated to rise a cylindrical body 1, by which the lower face of the wafer W is pressed to the surface of the wax Wx in the storage part 6 and the wax Wx of the amt. corresponding to the built-up component is stuck to the wafer. The disk member 24 is thereafter rotated at a high speed to spread the wax Wx over the entire surface of the wafer W to a uniform thickness.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62219578A JPS6463072A (en) | 1987-09-02 | 1987-09-02 | Wax coating method |
| EP87115599A EP0264957A3 (en) | 1986-10-23 | 1987-10-23 | Method and apparatus for application of wax on wafers |
| US07/111,540 US4851263A (en) | 1986-10-23 | 1987-10-23 | Method and apparatus for application of wax on wafers |
| KR1019880000373A KR950007962B1 (en) | 1987-09-02 | 1988-01-19 | Wax depositing method of wafer and apparatus thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62219578A JPS6463072A (en) | 1987-09-02 | 1987-09-02 | Wax coating method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6463072A true JPS6463072A (en) | 1989-03-09 |
Family
ID=16737722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62219578A Pending JPS6463072A (en) | 1986-10-23 | 1987-09-02 | Wax coating method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6463072A (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61104623A (en) * | 1984-10-29 | 1986-05-22 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Rotary coater |
-
1987
- 1987-09-02 JP JP62219578A patent/JPS6463072A/en active Pending
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61104623A (en) * | 1984-10-29 | 1986-05-22 | インタ−ナショナル ビジネス マシ−ンズ コ−ポレ−ション | Rotary coater |
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