JPS6461070A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JPS6461070A
JPS6461070A JP21940687A JP21940687A JPS6461070A JP S6461070 A JPS6461070 A JP S6461070A JP 21940687 A JP21940687 A JP 21940687A JP 21940687 A JP21940687 A JP 21940687A JP S6461070 A JPS6461070 A JP S6461070A
Authority
JP
Japan
Prior art keywords
region
impurity
type
channel forming
type high
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP21940687A
Other languages
Japanese (ja)
Inventor
Yoshiharu Nishimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP21940687A priority Critical patent/JPS6461070A/en
Publication of JPS6461070A publication Critical patent/JPS6461070A/en
Pending legal-status Critical Current

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  • Semiconductor Integrated Circuits (AREA)

Abstract

PURPOSE:To place a capacitor having large change rate of a capacity with respect to a voltage by forming first and second capacity electrodes in contact with a channel forming region, and forming a plurality of capacitors having different threshold voltage values by connecting them in parallel. CONSTITUTION:A P-type low concentration impurity region 3 is formed on a P-type low impurity concentration silicon substrate 1 having an N-type high impurity concentration buried layer 2 on its surface, and channel forming region made of impurity layers 7a-7d of P type in which concentrations are sequentially increased, a source made of an N-type high concentration impurity region 6 in contact with the channel forming region, and a back gate region made of a P-type high concentration impurity region 5 are formed on a section surrounded by an element isolation region 4 made of the trench isolating oxide film of the surface of the region 3. A common gate electrode 9g is formed through the gate insulating film, and a back gate electrode 9b and a source electrode 9s are formed.
JP21940687A 1987-09-01 1987-09-01 Semiconductor device Pending JPS6461070A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21940687A JPS6461070A (en) 1987-09-01 1987-09-01 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21940687A JPS6461070A (en) 1987-09-01 1987-09-01 Semiconductor device

Publications (1)

Publication Number Publication Date
JPS6461070A true JPS6461070A (en) 1989-03-08

Family

ID=16734907

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21940687A Pending JPS6461070A (en) 1987-09-01 1987-09-01 Semiconductor device

Country Status (1)

Country Link
JP (1) JPS6461070A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003068869A (en) * 2001-08-24 2003-03-07 Mitsubishi Electric Corp Semiconductor device and method of manufacturing the same
WO2004079828A1 (en) * 2003-03-03 2004-09-16 Fujitsu Limited Mos variable capacitive device
US7183867B2 (en) 2003-10-17 2007-02-27 Matsushita Electric Industrial Co., Ltd. Voltage controlled variable capacitor
JP2012028782A (en) * 1997-09-11 2012-02-09 Telefon Ab L M Ericsson Electric device
JP2016510516A (en) * 2013-02-19 2016-04-07 クアルコム,インコーポレイテッド Three-terminal semiconductor device having variable capacitance
JP2020155921A (en) * 2019-03-20 2020-09-24 セイコーエプソン株式会社 Circuit device, oscillator, electronic equipment and mobile body

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012028782A (en) * 1997-09-11 2012-02-09 Telefon Ab L M Ericsson Electric device
JP2014039043A (en) * 1997-09-11 2014-02-27 Telefon Ab L M Ericsson Electric device
JP2003068869A (en) * 2001-08-24 2003-03-07 Mitsubishi Electric Corp Semiconductor device and method of manufacturing the same
WO2004079828A1 (en) * 2003-03-03 2004-09-16 Fujitsu Limited Mos variable capacitive device
US7622760B2 (en) 2003-03-03 2009-11-24 Fujitsu Microelectronics Limited MOS type variable capacitance device
US7183867B2 (en) 2003-10-17 2007-02-27 Matsushita Electric Industrial Co., Ltd. Voltage controlled variable capacitor
JP2016510516A (en) * 2013-02-19 2016-04-07 クアルコム,インコーポレイテッド Three-terminal semiconductor device having variable capacitance
JP2020155921A (en) * 2019-03-20 2020-09-24 セイコーエプソン株式会社 Circuit device, oscillator, electronic equipment and mobile body

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