JPS6457729A - Semiconductor device - Google Patents
Semiconductor deviceInfo
- Publication number
- JPS6457729A JPS6457729A JP21445187A JP21445187A JPS6457729A JP S6457729 A JPS6457729 A JP S6457729A JP 21445187 A JP21445187 A JP 21445187A JP 21445187 A JP21445187 A JP 21445187A JP S6457729 A JPS6457729 A JP S6457729A
- Authority
- JP
- Japan
- Prior art keywords
- resistance region
- pattern
- polycrystalline silicon
- line width
- impurity concentration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To eliminate the need for a plurality of patterns for measurement, and to improve space efficiency by forming a pattern for measuring line width extending over each region having different impurity concentration in a semiconductor device in which the regions having different impurity concentration are shaped in the same polycrystalline silicon film. CONSTITUTION:A pattern 15 for measuring line width is formed by photoetching a polycrystalline silicon film shaped onto a semiconductor substrate 11 through an oxide (SiO2) film 12. The polycrystalline silicon film has regions having different impurity concentration as a high resistance region 13 and a low resistance region 14 in the same film, and the pattern 15 for measuring line width is shaped extending over the high resistance region 13 and the low resistance region 14.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21445187A JPS6457729A (en) | 1987-08-28 | 1987-08-28 | Semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21445187A JPS6457729A (en) | 1987-08-28 | 1987-08-28 | Semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6457729A true JPS6457729A (en) | 1989-03-06 |
Family
ID=16655977
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21445187A Pending JPS6457729A (en) | 1987-08-28 | 1987-08-28 | Semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6457729A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7301210B2 (en) | 2006-01-12 | 2007-11-27 | International Business Machines Corporation | Method and structure to process thick and thin fins and variable fin to fin spacing |
US7763531B2 (en) | 2004-05-25 | 2010-07-27 | International Business Machines Corporation | Method and structure to process thick and thin fins and variable fin to fin spacing |
-
1987
- 1987-08-28 JP JP21445187A patent/JPS6457729A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7763531B2 (en) | 2004-05-25 | 2010-07-27 | International Business Machines Corporation | Method and structure to process thick and thin fins and variable fin to fin spacing |
US7301210B2 (en) | 2006-01-12 | 2007-11-27 | International Business Machines Corporation | Method and structure to process thick and thin fins and variable fin to fin spacing |
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