JPS6457599A - Plasma x-ray source - Google Patents
Plasma x-ray sourceInfo
- Publication number
- JPS6457599A JPS6457599A JP62212810A JP21281087A JPS6457599A JP S6457599 A JPS6457599 A JP S6457599A JP 62212810 A JP62212810 A JP 62212810A JP 21281087 A JP21281087 A JP 21281087A JP S6457599 A JPS6457599 A JP S6457599A
- Authority
- JP
- Japan
- Prior art keywords
- conductor plates
- charges
- electrodes
- strong
- capacitors
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- X-Ray Techniques (AREA)
- Ceramic Capacitors (AREA)
Abstract
PURPOSE:To increase the rising steepness or the discharge current and obtain strong X-ray emission by laminating a bank of capacitors, with multiple ceramic capacitors sandwiched by parallel conductor plates and flat faces of the conductor plates aligned in the nearly vertical direction to the ground. CONSTITUTION:Ceramic capacitors 20 are sandwiched between low-voltage conductor plates 21 and high-voltage conductor plates 22. After the ceramic capacitor 20 is charged, if a discharge switch 4 is turned on, charges of the ceramic capacitor 20 are quickly discharged between electrodes 11, 12. This circuit serves as a distributed constant circuit at this time, charges of the ceramic capacitor 20a at the position with the shortest electric path to a discharge tube reach between the electrodes 11, 12 first, and charges of ceramic capacitors 20b, 20c...20h flow in sequence after the fixed delay time. Since the electric path is practically shortened, the discharge current wave-form with a short rising time is obtained. As a result, the magnetic force necessary to pinch the plasma between the electrodes 11, 12 is strong, the heating temperature is increased, thus a strong X-ray output can be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62212810A JPS6457599A (en) | 1987-08-28 | 1987-08-28 | Plasma x-ray source |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62212810A JPS6457599A (en) | 1987-08-28 | 1987-08-28 | Plasma x-ray source |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6457599A true JPS6457599A (en) | 1989-03-03 |
Family
ID=16628740
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62212810A Pending JPS6457599A (en) | 1987-08-28 | 1987-08-28 | Plasma x-ray source |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6457599A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6202293B1 (en) * | 2000-01-28 | 2001-03-20 | Visteon Global Technologies, Inc. | Work holder assembly |
-
1987
- 1987-08-28 JP JP62212810A patent/JPS6457599A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6202293B1 (en) * | 2000-01-28 | 2001-03-20 | Visteon Global Technologies, Inc. | Work holder assembly |
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