JPS63308896A - Plasma x-ray source - Google Patents

Plasma x-ray source

Info

Publication number
JPS63308896A
JPS63308896A JP62143132A JP14313287A JPS63308896A JP S63308896 A JPS63308896 A JP S63308896A JP 62143132 A JP62143132 A JP 62143132A JP 14313287 A JP14313287 A JP 14313287A JP S63308896 A JPS63308896 A JP S63308896A
Authority
JP
Japan
Prior art keywords
discharge
conductive plates
plasma
capacitor bank
ceramic capacitors
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62143132A
Other languages
Japanese (ja)
Inventor
Hiroshi Arita
浩 有田
Yukio Kurosawa
黒沢 幸夫
Koji Suzuki
光二 鈴木
Shunji Tokuyama
徳山 俊二
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP62143132A priority Critical patent/JPS63308896A/en
Publication of JPS63308896A publication Critical patent/JPS63308896A/en
Pending legal-status Critical Current

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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)

Abstract

PURPOSE:To strengthen emitted X-rays by using a capacitor bank pinched with multiple ceramic capacitors between parallel conductive plates and arranging a discharging electrode near the parallel conductive plates. CONSTITUTION:Ceramic capacitors 20a... are pinched in sandwiches between multiple conductive plates 21, 21, 22 respectively to form a disk-shaped capacitor bank centering a discharge device 5. A discharge switch 4 is provided near the conductive plates 21, 22 and formed into a coaxial shape to reduce the inductance. When the ceramic capacitors 20a... are discharged, the circuit becomes a distributed constant circuit, and the discharge current wave-form with the quick rising time can be obtained. Since the plasma generated between electrodes 11, 12 can be strongly pinched in a short time according to this constitution, strong X-rays can be obtained.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はプラズマx、msに係り、特にLSI製造用X
線リソグラフィ装置用のX線強度向上をはかるのに好適
なプラズマX線源に関するものである。
[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to plasma
The present invention relates to a plasma X-ray source suitable for improving X-ray intensity for a line lithography apparatus.

〔従来の技術〕[Conventional technology]

この種従来装置としては、特開昭60−151945号
公報に示されているようなものが知られている。
As a conventional device of this kind, the one shown in Japanese Patent Laid-Open No. 151945/1983 is known.

これは、第9図に示すように、充電用電源1.充電用抵
抗2.コンデンサ3.放電スイッチ4.放電装置5及び
電路7から構成されている。電路7は高圧電送板8.低
圧電送板9.絶縁スペーサ10とから構成されていて、
放電装置5は、図示してない排気装置、放電用電極11
,12.絶縁スペーサ18から構成されている。16は
露出用X線マスク、17は露光ウェーハ、19はアライ
ナである。動作は、まず適当に制御された充電用層g1
より充電用抵抗2を介してコンデンサ3に電力を供給し
、所定の電圧まで充電する。その後、放電スイッチ4を
図示しない外的要因によって閉じて電路7を経由し、放
電装置5の一対の電極11.12間に上記電圧を印加し
て放電を起こさせ、そしてプラズマを生成し、それ以後
、コンデンサ3に蓄えられたエネルギーを供給すること
によって放電電極間隙13でプラズマピンチを生じさせ
、X線14を放出させる。6は保護抵抗で、放電装置5
で放電を生じなかった場合、コンデンサ3のエネルギー
を吸収する。X線14はX線取り出し窓15とX線マス
ク16を通してレジストを塗布したウェーハ17に照射
され、露光する。
As shown in FIG. 9, the charging power source 1. Charging resistor 2. Capacitor 3. Discharge switch 4. It is composed of a discharge device 5 and an electric circuit 7. The electric line 7 is connected to a high voltage transmission board 8. Low voltage power transmission plate9. It is composed of an insulating spacer 10,
The discharge device 5 includes an exhaust device and a discharge electrode 11 (not shown).
,12. It is composed of an insulating spacer 18. 16 is an exposure X-ray mask, 17 is an exposure wafer, and 19 is an aligner. The operation begins with the appropriately controlled charging layer g1.
Power is supplied to the capacitor 3 via the charging resistor 2, and the capacitor 3 is charged to a predetermined voltage. Thereafter, the discharge switch 4 is closed by an external factor (not shown), and the voltage is applied between the pair of electrodes 11 and 12 of the discharge device 5 via the electric circuit 7 to cause discharge, thereby generating plasma. Thereafter, by supplying the energy stored in the capacitor 3, a plasma pinch is generated in the discharge electrode gap 13, and X-rays 14 are emitted. 6 is a protective resistor, and discharge device 5
If no discharge occurs, the energy of the capacitor 3 is absorbed. The X-rays 14 are irradiated onto a resist-coated wafer 17 through an X-ray extraction window 15 and an X-ray mask 16, thereby exposing the wafer 17 to light.

このような従来装置は、まだ研究の段階であり、コンデ
ンサ3には一般に電力用に使用されている油浸紙コンデ
ンサや油浸プラスチックフィルムコンデンサなどが使用
されている。
Such conventional devices are still in the research stage, and the capacitor 3 is an oil-immersed paper capacitor or an oil-immersed plastic film capacitor that is generally used for electric power.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

上記従来技術は、放111!電流の立ち上り時間の点に
ついては配慮がされておらず、弱いX線出力しか得られ
ないことに問題があった。すなわち、放電電流の立ち上
り時間が遅いと、電極間が発生したプラズマをピンチさ
せる磁気力が弱くなるため、結果的にX線出力が弱くな
る傾向にある。従来技術の場合、放電スイッチと放電管
を結ぶ電路が比較的長く、この電路のインダクタンスを
小さくできないため、早い立ち上り時間の放電電流を得
ることが困難であった。
The above conventional technology has 111! No consideration was given to the rise time of the current, and there was a problem in that only a weak X-ray output could be obtained. That is, when the rise time of the discharge current is slow, the magnetic force that pinches the plasma generated between the electrodes becomes weak, and as a result, the X-ray output tends to become weak. In the case of the conventional technology, the electric path connecting the discharge switch and the discharge tube is relatively long, and the inductance of this electric path cannot be reduced, so it is difficult to obtain a discharge current with a quick rise time.

本発明の目的は、上記した従来技術の欠点をなくし、強
いX線出力を得ることができるプラズマX線源を提供す
ることにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a plasma X-ray source that eliminates the above-mentioned drawbacks of the prior art and can obtain strong X-ray output.

〔問題点を解決するための手段〕[Means for solving problems]

上記目的は、複数個のコンデンサを有するコンデンサバ
ンクを複数個のセラミックコンデンサを平行導電板でサ
ンドイッチ状にしたもので形成し、かつ、上記平行導電
板の少なくとも一方にX線発生部の放電用電極を設けた
構成として達成するようにした。
The above object is to form a capacitor bank having a plurality of capacitors by sandwiching a plurality of ceramic capacitors with parallel conductive plates, and to provide a discharging electrode of an X-ray generating section on at least one of the parallel conductive plates. This was achieved by using a configuration with .

〔作用〕[Effect]

セラミックコンデンサを複数個平行導電板間に配設しで
あるため、回路的に分布定数回路となり、ある電圧を充
電しておいて回路的に短絡させると、矩形波形の電流が
流れることになり、電流の立ち上り峻度が極めて大きく
なる。また、導電板の一部にX線発生部の放電用電極を
設けたことにより、実質的に電路長が短くなり1.:れ
によっても電流波形の立ち上り峻度が大きくなる。この
ように放電電流の立ち上り峻度が極めて大きくなること
により、放電装置のプラズマの加熱温度が上昇し、強い
X線放射を行うことができる。
Since multiple ceramic capacitors are arranged between parallel conductive plates, the circuit becomes a distributed constant circuit, and if a certain voltage is charged and the circuit is short-circuited, a rectangular waveform current will flow. The steepness of the current rise becomes extremely large. In addition, by providing the discharge electrode of the X-ray generating section on a part of the conductive plate, the length of the electric path is substantially shortened.1. : This also increases the steepness of the rise of the current waveform. As the rise steepness of the discharge current becomes extremely large in this manner, the heating temperature of the plasma in the discharge device increases, and strong X-ray radiation can be performed.

〔実施例〕〔Example〕

以下本発明を第1図〜第8図に示した実施例及び第10
図を用いて詳細に説明する。
Examples of the present invention shown in FIGS. 1 to 8 and 10
This will be explained in detail using figures.

第1図は本発明のプラズマX線源の一実施例を示す上面
図で、第2図は第1図のA−B線断面図である。ここに
、第9図と同一構成要素は同じ符号で示し、ここでは説
明を省略する。第1図、第2図では、複数個のセラミッ
クコンデンサ20が円板状の高圧導電板22.低圧導電
板21間にサンドイッチ状に設けである。そして、高圧
導電板22の一方は、放電スイッチ4を介して放電装置
5の電極11に接続され、低圧導電板21は放電スイッ
チ4の外筒を介して電極12に接続されている。放電ス
イッタ4は、インダクタンスを低減するため、同軸状形
状としである。第1図の場合。
FIG. 1 is a top view showing an embodiment of the plasma X-ray source of the present invention, and FIG. 2 is a sectional view taken along the line AB in FIG. 1. Here, the same components as in FIG. 9 are indicated by the same reference numerals, and their explanation will be omitted here. 1 and 2, a plurality of ceramic capacitors 20 are connected to a disk-shaped high voltage conductive plate 22. It is provided sandwich-like between low-voltage conductive plates 21. One end of the high-voltage conductive plate 22 is connected to the electrode 11 of the discharge device 5 via the discharge switch 4, and the low-voltage conductive plate 21 is connected to the electrode 12 via the outer cylinder of the discharge switch 4. The discharge switch 4 has a coaxial shape to reduce inductance. In the case of Figure 1.

セラミックコンデンサ20の電荷が均一に4個の放電ス
イッチ4に流れるように、円板状の導電板を絶縁物23
によって区分しである。
A disc-shaped conductive plate is connected to an insulator 23 so that the electric charge of the ceramic capacitor 20 flows uniformly to the four discharge switches 4.
It is classified by

セラミックコンデンサ20を充電後、放電スイッチ4を
入れると、セラミックコンデンサ20の電荷は急速に放
出される。このとき、この回路は分布定数回路となり、
電極までの電路の最も短い位置にあるセラミックコンデ
ンサ20aの電荷が最初に電極11.12間に到達し、
ある一定の遅延時間後に順次セラミックコンデンサ20
b。
When the discharge switch 4 is turned on after charging the ceramic capacitor 20, the electric charge of the ceramic capacitor 20 is rapidly discharged. At this time, this circuit becomes a distributed constant circuit,
The electric charge of the ceramic capacitor 20a at the shortest position of the electric path to the electrodes first reaches between the electrodes 11 and 12,
After a certain delay time, the ceramic capacitors 20
b.

20c、20dの電荷が流入する。このように電路長が
実質的に短くなるため、放電電流波形は、第10図の曲
線aに示すようになる。このため、従来例の放ff1t
流波形すに比べて立ち上り時間の早い放電電流波形が得
られる。この結果、?11極11.12間にあるプラズ
マをピンチさせるのに必要な磁気力が強く、加熱温度が
上昇するため、強力なX線出力を得ることができる。ま
た、この発明の実施例の場合、高圧導電板22が内側に
入っており、!8電に対する安全性の高い構造となって
いる。
Charges 20c and 20d flow in. Since the electric path length is substantially shortened in this manner, the discharge current waveform becomes as shown by curve a in FIG. 10. Therefore, in the conventional example, the release ff1t
A discharge current waveform with a faster rise time than a current waveform can be obtained. As a result,? The magnetic force required to pinch the plasma between the 11 poles 11 and 12 is strong and the heating temperature rises, making it possible to obtain powerful X-ray output. Moreover, in the case of the embodiment of the present invention, the high voltage conductive plate 22 is placed inside! It has a highly safe structure against 8 electric currents.

第3図、第4図はそれぞれ本発明の他の実施例を示す上
面図である。構成は第1図と同様になっているが、第3
図においては、高圧・低圧導電板を半円形状としてあり
、第4図においては、それを長方形状にしである。X線
リングラフィ装置として使用する場合、前面部を取り除
くことにより、人の作業性、安全性に対して効果がある
FIGS. 3 and 4 are top views showing other embodiments of the present invention, respectively. The configuration is the same as in Figure 1, but in Figure 3.
In the figure, the high-voltage and low-voltage conductive plates are semicircular, and in FIG. 4, they are rectangular. When used as an X-ray phosphorography device, removing the front portion is effective for improving workability and safety for humans.

第5図は本発明のさらに他の実施例を示す縦断面図で、
第6図は第5図はC−D線断面図である。
FIG. 5 is a longitudinal sectional view showing still another embodiment of the present invention,
FIG. 6 and FIG. 5 are cross-sectional views taken along the line CD.

本実施例は第2図の構成例と同様であるが、セラミック
コンデンサ20を垂直方向に配設しである。
This embodiment is similar to the configuration example shown in FIG. 2, but the ceramic capacitor 20 is arranged vertically.

この場合、第2図と同一効果を得ることができ、強いX
線出力が得られる。
In this case, the same effect as in Fig. 2 can be obtained, and a strong
Line output is obtained.

第6図の変形例をそれぞれ第7図、第8図に示す。第7
図においては、セラミックコンデンサ20を四角形配置
、第8図においては多角形配置とし、高圧導電板22と
低圧導電板21間にサンドイッチ状に設けである。本実
施例においても第2図と同様の効果を得ることができる
Modifications of FIG. 6 are shown in FIGS. 7 and 8, respectively. 7th
In the figure, the ceramic capacitors 20 are arranged in a rectangular arrangement, and in FIG. In this embodiment as well, effects similar to those shown in FIG. 2 can be obtained.

なお、第1図〜第8図に示した実施例では、コンデンサ
をすべてセラミックコンデンサとしであるが、従来の油
浸フィルムを用いたコンデンサに比べて2衝程度充放電
回数の寿命が伸びるという付帯的効果を有する。
In the examples shown in Figs. 1 to 8, all capacitors are ceramic capacitors, but an additional feature is that the lifespan is extended by approximately 2 charge/discharge cycles compared to capacitors using conventional oil-immersed films. It has a positive effect.

さらに、第2図、第5図に示す実施例では、放電スイッ
チ4と放電装置5を別個に設置しであるが、放電装置5
内に放電スイッチ4を設けるようにしてもよい。
Furthermore, in the embodiments shown in FIGS. 2 and 5, the discharge switch 4 and the discharge device 5 are installed separately, but the discharge device 5
A discharge switch 4 may be provided inside.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明によれば、コンデンサバン
クを複数個のセラミックコンデンサを平行導電板間にサ
ンドイッチ状にして形成し、がっ、その導電板の一部に
X線発生部の放電電極を設けたので、早い立ち上りの放
電電流を得ることができ、電極間のプラズマを短時間に
強力にピンチすることができるので、強いX線出力を得
ることができるという効果がある。
As explained above, according to the present invention, a capacitor bank is formed by sandwiching a plurality of ceramic capacitors between parallel conductive plates, and a discharge electrode of an X-ray generating part is formed on a part of the conductive plates. , it is possible to obtain a discharge current with a quick rise, and the plasma between the electrodes can be strongly pinched in a short period of time, resulting in the effect that a strong X-ray output can be obtained.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明のプラズマX線源の一実施例を示す上面
図、第2図は第1図のA−B線断面図、第3図、第4図
はそれぞれ本発明の他の実施例を示す上面図、第5図は
本発明のさらに他の実施例を示す縦断面図、第6図は第
5図のC−D線断面図、第7図、第8図はそれぞれ本発
明のさらに他の実施例を示す第6図に相当する断面図、
第9図は従来のプラズマX線源の構成図、第10図は放
電電流波形線図である。 4・・・放電スイッチ、5・・・放電装置、11.12
・・・放電用電極、15・・・X線取り出し窓、20・
・・セラミックコンデンサ、21.22・・・導電板、
23・・・第 1 図 ネ 3 図 竿 5 m ′$ 6 阻 2、? l 第7図 $grs 隼 9 目 拠to呂
FIG. 1 is a top view showing one embodiment of the plasma X-ray source of the present invention, FIG. 2 is a sectional view taken along line A-B in FIG. 1, and FIGS. 3 and 4 are other embodiments of the present invention. FIG. 5 is a longitudinal sectional view showing still another embodiment of the present invention, FIG. 6 is a sectional view taken along line CD in FIG. 5, and FIGS. A sectional view corresponding to FIG. 6 showing still another embodiment of
FIG. 9 is a configuration diagram of a conventional plasma X-ray source, and FIG. 10 is a discharge current waveform diagram. 4...Discharge switch, 5...Discharge device, 11.12
...Discharge electrode, 15...X-ray extraction window, 20.
... Ceramic capacitor, 21.22 ... Conductive plate,
23...1st figure 3 figure rod 5 m '$ 6 hindrance 2,? l Fig. 7 $grs Hayabusa 9 Objective toro

Claims (1)

【特許請求の範囲】[Claims] 1、複数個のコンデンサを有するコンデンサバンクと、
該コンデンサバンクに接続する前記コンデンサバンクか
ら流れる電流を断続する放電スイッチと、該放電スイッ
チに接続された電路と、該電路に接続され、真空容器内
に設けられた少なくとも一対の放電用電極を有する放電
装置とからなるプラズマX線源において、前記コンデン
サバンクを複数個のセラミックコンデンサを平行導電板
でサンドイッチ状にしたもので形成し、かつ、前記平行
導電板の少なくとも一方に前記放電用電極を設けたこと
を特徴とするプラズマX線源。
1. A capacitor bank having multiple capacitors,
A discharge switch that connects to the capacitor bank and cuts off the current flowing from the capacitor bank, an electric path connected to the electric discharge switch, and at least one pair of discharge electrodes connected to the electric path and provided in a vacuum container. In a plasma X-ray source comprising a discharge device, the capacitor bank is formed of a plurality of ceramic capacitors sandwiched between parallel conductive plates, and the discharge electrode is provided on at least one of the parallel conductive plates. A plasma X-ray source characterized by:
JP62143132A 1987-06-10 1987-06-10 Plasma x-ray source Pending JPS63308896A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62143132A JPS63308896A (en) 1987-06-10 1987-06-10 Plasma x-ray source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62143132A JPS63308896A (en) 1987-06-10 1987-06-10 Plasma x-ray source

Publications (1)

Publication Number Publication Date
JPS63308896A true JPS63308896A (en) 1988-12-16

Family

ID=15331659

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62143132A Pending JPS63308896A (en) 1987-06-10 1987-06-10 Plasma x-ray source

Country Status (1)

Country Link
JP (1) JPS63308896A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007280950A (en) * 2006-03-31 2007-10-25 Xtreme Technologies Gmbh Extreme ultraviolet radiation generating device based on electrically operated gas discharge
EP2839556A1 (en) * 2012-05-30 2015-02-25 Siemens Aktiengesellschaft Spark gap with a capacitive energy accumulator

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007280950A (en) * 2006-03-31 2007-10-25 Xtreme Technologies Gmbh Extreme ultraviolet radiation generating device based on electrically operated gas discharge
EP2839556A1 (en) * 2012-05-30 2015-02-25 Siemens Aktiengesellschaft Spark gap with a capacitive energy accumulator
JP2015525441A (en) * 2012-05-30 2015-09-03 シーメンス アクティエンゲゼルシャフト Spark gap with capacitive energy storage device
US9825434B2 (en) 2012-05-30 2017-11-21 Siemens Aktiengesellschaft Spark gap comprising a capacitive energy store

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