JPH01236598A - Plasma x-ray source - Google Patents

Plasma x-ray source

Info

Publication number
JPH01236598A
JPH01236598A JP63060413A JP6041388A JPH01236598A JP H01236598 A JPH01236598 A JP H01236598A JP 63060413 A JP63060413 A JP 63060413A JP 6041388 A JP6041388 A JP 6041388A JP H01236598 A JPH01236598 A JP H01236598A
Authority
JP
Japan
Prior art keywords
bank
dust
capacitor
capacitor bank
conductive plates
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP63060413A
Other languages
Japanese (ja)
Inventor
Hiroshi Arita
浩 有田
Koji Suzuki
光二 鈴木
Yukio Kurosawa
黒沢 幸夫
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP63060413A priority Critical patent/JPH01236598A/en
Publication of JPH01236598A publication Critical patent/JPH01236598A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858Environment aspects, e.g. pressure of beam-path gas, temperature
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Public Health (AREA)
  • Environmental & Geological Engineering (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • X-Ray Techniques (AREA)
  • Ceramic Capacitors (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)

Abstract

PURPOSE:To improve reliability by sandwitching plural number of ceramic capacitors between parallel conductive plates, circulating air or an insulation gas inside of the capacitor bank, and by providing a dust collector of the dust within a capacitor bank, in a capacitor bank. CONSTITUTION:An air circulator 21 and a filter 22 are provided in the inside of a bank 1, and ventilation is made through an air duct 23. The dust between conductive plates 3 and 4 is eliminated via an airflow change plate 24. Consequently when a capacitor is charged, a strong electric field is generated between the conductive plates, the dust in the inside of the bank is electrified, and when charging and discharging are repeated (generally charge cycle number of 100ms, and discharge cycle number of mus), the dust gathers on the conductive plates, and short-circuit is prevented by the current collecting action with an electrical field. Consequently the use of gas, particularly an insulation gas SF3, etc., as a ventilated gas except air, can contribute the improvement of the voltage resistance in the inside of the bank.

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明はLSI製造用X線リソグラフィ装置のX線源に
係り、特にプラズマX線源を光源に用いるのに好適な電
源に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an X-ray source for an X-ray lithography apparatus for LSI manufacturing, and particularly to a power source suitable for using a plasma X-ray source as a light source.

〔従来の技術〕[Conventional technology]

従来装置としては、特開昭60−151945に示され
ているものがあり、コンデンサバンク、スイッチ。
As a conventional device, there is one shown in Japanese Patent Application Laid-Open No. 60-151945, which includes a capacitor bank and a switch.

X線発生用放電管等が電路で結ばれている。プラズマX
線源の電源には高頻度(106〜109回)の高速パル
ス大電流源が必要とされている。上記放電電路のうち、
スイッチや放電管は電極等の交換で対処できるが、コン
デンサはバンクごと交換することになる。現在電力用に
使用されている油浸コンデンサの寿命は10”〜106
回と短い。
X-ray generating discharge tubes, etc. are connected by electrical circuits. Plasma X
A high frequency (10 6 to 10 9 times) high speed pulse large current source is required for the power source of the line source. Of the above discharge circuits,
Switches and discharge tubes can be replaced by replacing electrodes, but capacitors require replacing the entire bank. The lifespan of oil-immersed capacitors currently used for electric power is 10” to 106
times and short.

〔発明が解決しようとする課題〕[Problem to be solved by the invention]

上記従来技術はコンデンサバンクの寿命の点についての
配慮がされておらず、−年足らずでコンデンサバンク自
体を交換することになる。このため、長寿命(108〜
10°回)が期待できるセラミックコンデンサの使用が
考えられた。しかし現在のところ一個の容量が小さく、
数十個のセラミックコンデンサを並列で集積することに
なり、実用上信頼性の高いものが要求される。。
The above-mentioned conventional technology does not take into account the lifespan of the capacitor bank, and the capacitor bank itself must be replaced in less than - years. For this reason, it has a long life (108~
The use of ceramic capacitors, which can be expected to be used (10° times), was considered. However, at present, the capacity of each piece is small,
Dozens of ceramic capacitors will be integrated in parallel, and a highly reliable one is required for practical use. .

本発明の目的はセラミックコンデンサを多数個集積した
コンデンサバンクの信頼性向上方法を提供することにあ
る。
An object of the present invention is to provide a method for improving the reliability of a capacitor bank in which a large number of ceramic capacitors are integrated.

〔課題を解決するための手段〕[Means to solve the problem]

本発明は上記目的を達成するために、コンデンサバンク
を平行導体に複数個のセラミックコンデンサをサンドイ
ッチ状にしたもので形成し、かつコンデンサバンク内を
空気もしくはガスを循環させ、バンク内の塵を集塵する
装置を設置した。
In order to achieve the above object, the present invention forms a capacitor bank by sandwiching a plurality of ceramic capacitors around parallel conductors, and circulates air or gas inside the capacitor bank to collect dust inside the bank. A dusting device was installed.

〔作用〕[Effect]

コンデンサバンク内部に多数のセラミックコンデンサを
積層するために、複数のセラミックコンデンサを平行導
体板にサンドイッチ状にする。このため充電時、導体板
間に強電界が発生し、バンク内部の塵が帯電される。充
放電をくり返すと、電界による集電作用のため導体板に
塵が集まり、導体板間が一時間に橋絡し、せん絡する恐
れがある。本発明では、平行導体間に空気もしくはガス
(例えば5Fa)を循環させ、導体間の塵を除去する。
To stack multiple ceramic capacitors inside a capacitor bank, multiple ceramic capacitors are sandwiched between parallel conductor plates. Therefore, during charging, a strong electric field is generated between the conductor plates, and the dust inside the bank is charged. When charging and discharging are repeated, dust collects on the conductor plates due to the current collecting effect of the electric field, and there is a risk that the conductor plates will become bridged within an hour, causing a flashover. In the present invention, air or gas (for example, 5Fa) is circulated between parallel conductors to remove dust between the conductors.

これにより多頻度の充放電時において、耐電圧信頼性の
良いコンデンサバンクを提供できる。
This makes it possible to provide a capacitor bank with good withstand voltage reliability during frequent charging and discharging.

〔実施例〕〔Example〕

以下1本発明の一実施例を第1図、第2図により説明す
る。第2図は第1図のAB視図を示す。
An embodiment of the present invention will be described below with reference to FIGS. 1 and 2. FIG. 2 shows an AB view of FIG.

コンデンサバンク1内部にセラミックコンデンサ4が、
高電圧側導体板3.低電圧側導体板2間にサンドイッチ
状に設けである。導体板の一方は同軸ケーブル6を介し
て放電スイッチ7に接続され、伝送板19.20を介し
て放電管8に接続されている。コンデンサバンク1は仕
切り板1aによって4段構造とし、各導体は絶縁物5に
よってコンデンサバンク1と絶縁されている。16は露
光用マスク、17は露光ウェーハ、18はアライナであ
る。放電装置8は図示していない排気装置、絶縁スペー
サ13.電極10.12から構成されている。
Ceramic capacitor 4 is inside capacitor bank 1,
High voltage side conductor plate 3. It is provided in a sandwich-like manner between the low voltage side conductor plates 2. One of the conductor plates is connected via a coaxial cable 6 to a discharge switch 7 and via a transmission plate 19, 20 to a discharge tube 8. The capacitor bank 1 has a four-stage structure with partition plates 1a, and each conductor is insulated from the capacitor bank 1 with an insulator 5. 16 is an exposure mask, 17 is an exposure wafer, and 18 is an aligner. The discharge device 8 includes an exhaust device and an insulating spacer 13. It consists of electrodes 10.12.

動作は図示していない充電用電源よりコンデンサ4に電
力を供給し、所定の電圧まで充電する、その後、放電ス
イッチ7を閉じて、伝送板19゜20を経由し、放電装
置8の有する一対の電極10.12間に、上記電圧を印
加して放電を起こさせ、電極間でのプラズマピンチによ
り、X線14を放出させる。保護抵抗9は放電装置8で
、放電を生じなかった場合、コンデンサ20のエネルギ
ーを吸収するために設けたものである。このX線14は
X線取り出し窓15とX線マスク16を通してレジスト
を塗布したウェーハ17に照射され、露光する。
In operation, power is supplied to the capacitor 4 from a charging power source (not shown) and charged to a predetermined voltage.Then, the discharge switch 7 is closed and the power is supplied to the pair of discharge devices 8 through the transmission plates 19 and 20. The above voltage is applied between the electrodes 10 and 12 to cause a discharge, and X-rays 14 are emitted due to the plasma pinch between the electrodes. The protective resistor 9 is provided in the discharge device 8 to absorb the energy of the capacitor 20 when no discharge occurs. The X-rays 14 are irradiated onto a resist-coated wafer 17 through an X-ray extraction window 15 and an X-ray mask 16, thereby exposing the wafer 17.

多数のセラミックコンデンサを並列接続する本実施例で
は、高電圧信頼性が最重点課題となる。
In this embodiment, in which a large number of ceramic capacitors are connected in parallel, high voltage reliability is the most important issue.

通常耐電圧性能は50kV程度必要である。高耐電圧上
特に問題となるのは、導体板3,4間の塵である。この
ためバンク1内部に空気循環器21とフィルター22を
設け、空気ダクト23を通り送風している。気流変向板
24を介して導体板3゜4間の塵を除去している。これ
によりコンデンサ充電時、導体板間に強電界が発生し、
バンク内部の塵が帯電され、充放電をくり返す(一般に
充電周期数Looms、放電周期数μs)と、電界によ
る集電作用のため、導体板に塵が集まり、せん絡するの
を防止している。送風する気体は空気以外にガス特に絶
縁性ガスSFe等を用いると、バンク内部の耐電圧の向
上に寄与できる。
Normally, withstand voltage performance is required to be about 50 kV. Dust between the conductor plates 3 and 4 poses a particular problem in terms of high withstand voltage. For this purpose, an air circulator 21 and a filter 22 are provided inside the bank 1, and air is blown through an air duct 23. Dust between the conductor plates 3 and 4 is removed via the airflow deflection plate 24. This creates a strong electric field between the conductor plates when charging the capacitor.
When the dust inside the bank becomes electrically charged and is repeatedly charged and discharged (in general, the number of charging cycles is Looms and the number of discharge cycles is μs), the dust collects on the conductor plate due to the current collecting effect due to the electric field, which prevents flashover. There is. If a gas other than air, particularly an insulating gas SFe, is used as the gas to be blown, it can contribute to improving the withstand voltage inside the bank.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、コンデンサバンクを平行導体板にセラ
ミックコンデンサを複数個サンドイッチ状にし、かつコ
ンデンサバンク内を空気もしくは絶縁性ガスを循環させ
、バンク内の塵を集塵する装置を設置した。これにより
、耐電圧信頼性の良いコンデンサバンクを提供でき、プ
ラズマX線源の信頼性向上効果がある。
According to the present invention, a capacitor bank is constructed by sandwiching a plurality of ceramic capacitors between parallel conductor plates, and a device is installed to circulate air or an insulating gas within the capacitor bank and collect dust within the bank. This makes it possible to provide a capacitor bank with good withstand voltage reliability, which has the effect of improving the reliability of the plasma X-ray source.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例の縦断面図、第2図は第1図
のAB線線図図ある。 1・・・コンデンサバンク、2・・・低電圧側導板、3
・・・高電圧側導板、4・・・セラミックコンデンサ、
5・・・絶縁物、21・・・空気循環器、22・・・フ
ィルター、23・・・ダクト、24・・・気流変向板。 \                     (第2
図 一≧7    2ン
FIG. 1 is a longitudinal sectional view of an embodiment of the present invention, and FIG. 2 is an AB line diagram of FIG. 1. 1... Capacitor bank, 2... Low voltage side conductive plate, 3
...High voltage side conductor plate, 4...Ceramic capacitor,
5... Insulator, 21... Air circulator, 22... Filter, 23... Duct, 24... Air flow deflection plate. \ (Second
Figure 1≧7 2n

Claims (1)

【特許請求の範囲】[Claims] 1、真空容器内に設けられた少なくとも一対の電極を有
する放電装置と、該放電装置にパルス大電流を供給する
電路とコンデンサバンクからなるプラズマX線源におい
て、コンデンサバンクを平行導体板に複数個のセラミッ
クコンデンサをサンドイッチ状に接続し、かつコンデン
サバンク内を空気もしくは絶縁性ガスを循環させ、バン
ク内の塵を集塵する装置を設けたことを特徴とするプラ
ズマX線源。
1. In a plasma X-ray source consisting of a discharge device having at least one pair of electrodes provided in a vacuum container, an electric circuit for supplying a pulsed large current to the discharge device, and a capacitor bank, a plurality of capacitor banks are arranged on parallel conductor plates. 1. A plasma X-ray source characterized by connecting ceramic capacitors in a sandwich manner, circulating air or an insulating gas inside the capacitor bank, and providing a device for collecting dust inside the bank.
JP63060413A 1988-03-16 1988-03-16 Plasma x-ray source Pending JPH01236598A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63060413A JPH01236598A (en) 1988-03-16 1988-03-16 Plasma x-ray source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63060413A JPH01236598A (en) 1988-03-16 1988-03-16 Plasma x-ray source

Publications (1)

Publication Number Publication Date
JPH01236598A true JPH01236598A (en) 1989-09-21

Family

ID=13141473

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63060413A Pending JPH01236598A (en) 1988-03-16 1988-03-16 Plasma x-ray source

Country Status (1)

Country Link
JP (1) JPH01236598A (en)

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