JPS6449283A - Planar-type heterojunction semiconductor photodetector - Google Patents

Planar-type heterojunction semiconductor photodetector

Info

Publication number
JPS6449283A
JPS6449283A JP62206113A JP20611387A JPS6449283A JP S6449283 A JPS6449283 A JP S6449283A JP 62206113 A JP62206113 A JP 62206113A JP 20611387 A JP20611387 A JP 20611387A JP S6449283 A JPS6449283 A JP S6449283A
Authority
JP
Japan
Prior art keywords
guard ring
impurity
layer
curvature
forbidden
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62206113A
Other languages
Japanese (ja)
Other versions
JP2680817B2 (en
Inventor
Toshitaka Torikai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP62206113A priority Critical patent/JP2680817B2/en
Priority to DE3855924T priority patent/DE3855924T2/en
Priority to EP88113417A priority patent/EP0304048B1/en
Priority to US07/234,059 priority patent/US4974061A/en
Publication of JPS6449283A publication Critical patent/JPS6449283A/en
Application granted granted Critical
Publication of JP2680817B2 publication Critical patent/JP2680817B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PURPOSE:To form a guard ring whose curvature is relaxed by a method wherein a forbidden-band width in an avalanche multiplication layer is increased at an arbitrary grade as the layer becomes more distant from a light-absorbing layer so that an impurity can be diffused deeply. CONSTITUTION:A guard ring 5' completely covers the curvature at an edge part of a stepped-shape p<+>-n junction, and relaxes the curvature at an edge part of the guard ring 5' to a certain extent; a break-down voltage of the guard ring 5' itself is increased. Therefore, a forbidden-band width in an avalanche multiplication layer 4 is increased at an arbitrary grade as the layer becomes more distant from a light-absorbing layer 3. That is, when a p-type impurity is diffused into an n-type conductive region or an ion is implanted, the coupling energy between atoms constituting a semiconductor becomes strong as the forbidden-band width in the n-type conductive region becomes large. Accordingly, the probability to substitute the atoms constituting the semiconductor for the impurity is lowered; the impurity is diffused deeply; the guard ring 5' whose curvature has been relaxed can be formed.
JP62206113A 1987-08-19 1987-08-19 Method for manufacturing planar heterojunction semiconductor photodetector Expired - Lifetime JP2680817B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP62206113A JP2680817B2 (en) 1987-08-19 1987-08-19 Method for manufacturing planar heterojunction semiconductor photodetector
DE3855924T DE3855924T2 (en) 1987-08-19 1988-08-18 Planar avalanche photodiode with heterostructure
EP88113417A EP0304048B1 (en) 1987-08-19 1988-08-18 A planar type heterostructure avalanche photodiode
US07/234,059 US4974061A (en) 1987-08-19 1988-08-19 Planar type heterostructure avalanche photodiode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62206113A JP2680817B2 (en) 1987-08-19 1987-08-19 Method for manufacturing planar heterojunction semiconductor photodetector

Publications (2)

Publication Number Publication Date
JPS6449283A true JPS6449283A (en) 1989-02-23
JP2680817B2 JP2680817B2 (en) 1997-11-19

Family

ID=16518013

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62206113A Expired - Lifetime JP2680817B2 (en) 1987-08-19 1987-08-19 Method for manufacturing planar heterojunction semiconductor photodetector

Country Status (1)

Country Link
JP (1) JP2680817B2 (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS616820A (en) * 1984-06-21 1986-01-13 Matsushita Electric Ind Co Ltd Manufacture of compound semiconductor device
JPS61267375A (en) * 1985-05-21 1986-11-26 Nec Corp Planar type hetero junction semiconductor photodetector

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS616820A (en) * 1984-06-21 1986-01-13 Matsushita Electric Ind Co Ltd Manufacture of compound semiconductor device
JPS61267375A (en) * 1985-05-21 1986-11-26 Nec Corp Planar type hetero junction semiconductor photodetector

Also Published As

Publication number Publication date
JP2680817B2 (en) 1997-11-19

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