JPS6448416A - Transfer method of photoelectron image - Google Patents

Abstract

PURPOSE:To emit photoelectrons stably by using a mask in which a photoelectron emission region forms a pattern by the photoelectron emission region, in which a first conductive film, a nonconductive film and a second conductive film are laminated in the order, and a photoelectron non-emission region, in which a photoelectron interrupting film is shaped at a specific position. CONSTITUTION:With a mask 7, a first conductive film 7b is formed onto a transparent substrate 7a, a nonconductive film 7c is shaped onto the surface of the film 7b, photoelectron interrupting films 7d patterned in conformity with photoelectron non-emission regions are formed onto the film 7c, a second conductive film 7e is shaped onto the whole surface on the films 7d, the second conductive film 7e side is used as the surface, regions in which there are no photoelectron interrupting film 7d are employed as patterned photoelectron emission regions. The mask 7 increases the energy of photoelectrons at the time of reaching the emission of photoelectrons when photoelectrons generated through optical pumping are accelerated by bias voltage. Consequently, the second conductive film as the surface of the photoelectron emission region does not inhibit the emission of photoelectrons even when it is contaminated minutely. Accordingly, the emission of photoelectrons at the time of exposure is stabilized, and exposure can be performed stably.