JPS6443512A - Phenyl alpha-trifluoromethylacrylate copolymer and its preparation - Google Patents

Phenyl alpha-trifluoromethylacrylate copolymer and its preparation

Info

Publication number
JPS6443512A
JPS6443512A JP20053087A JP20053087A JPS6443512A JP S6443512 A JPS6443512 A JP S6443512A JP 20053087 A JP20053087 A JP 20053087A JP 20053087 A JP20053087 A JP 20053087A JP S6443512 A JPS6443512 A JP S6443512A
Authority
JP
Japan
Prior art keywords
copolymer
resist material
trifluoromethylacrylate
preparation
dry
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP20053087A
Other languages
Japanese (ja)
Inventor
Shinji Tamaru
Kazuo Taira
Morio Mizuguchi
Koichi Hatada
Haruhiko Mori
Yoshio Okamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Daikin Industries Ltd
Original Assignee
Daikin Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daikin Industries Ltd filed Critical Daikin Industries Ltd
Priority to JP20053087A priority Critical patent/JPS6443512A/en
Publication of JPS6443512A publication Critical patent/JPS6443512A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)

Abstract

PURPOSE:To obtain the title copolymer contg. two different kinds of alpha- trifluoromethylacrylic acid derivative units and providing a resist material which is excellent in heat resistance and dry-etching resistance and has a high sensitivity and a high resolution. CONSTITUTION:The title product is a copolymer contg. 1-99mol.% structural units of formula I (where R<1> is CH3; R<2> and R<3> are each CH3 or C6H5) and 99-1mol.% structural units of formula II. It provides a resist material which is excellent in heat resistance and dry-etching resistance and has higher concentration and resolution. This resist material is applied to the surface of a semiconductor substrate by a known method and submitted to prebaking, irradiation and development.
JP20053087A 1987-08-10 1987-08-10 Phenyl alpha-trifluoromethylacrylate copolymer and its preparation Pending JPS6443512A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20053087A JPS6443512A (en) 1987-08-10 1987-08-10 Phenyl alpha-trifluoromethylacrylate copolymer and its preparation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20053087A JPS6443512A (en) 1987-08-10 1987-08-10 Phenyl alpha-trifluoromethylacrylate copolymer and its preparation

Publications (1)

Publication Number Publication Date
JPS6443512A true JPS6443512A (en) 1989-02-15

Family

ID=16425839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20053087A Pending JPS6443512A (en) 1987-08-10 1987-08-10 Phenyl alpha-trifluoromethylacrylate copolymer and its preparation

Country Status (1)

Country Link
JP (1) JPS6443512A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153103A (en) * 1990-03-13 1992-10-06 Fujitsu Limited Resist composition and pattern formation process
WO2001074916A1 (en) * 2000-04-04 2001-10-11 Daikin Industries, Ltd. Novel fluoropolymer having acid-reactive group and chemical amplification type photoresist composition containing the same
US6683202B2 (en) 2001-02-22 2004-01-27 Tokyo Ohka, Kogyo Co., Ltd. Fluorine-containing monomeric ester compound for base resin in photoresist composition

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5153103A (en) * 1990-03-13 1992-10-06 Fujitsu Limited Resist composition and pattern formation process
WO2001074916A1 (en) * 2000-04-04 2001-10-11 Daikin Industries, Ltd. Novel fluoropolymer having acid-reactive group and chemical amplification type photoresist composition containing the same
US6908724B2 (en) 2000-04-04 2005-06-21 Daikin Industries, Ltd. Fluorine-containing polymer having acid-reactive group and chemically amplifying type photoresist composition prepared from same
US6683202B2 (en) 2001-02-22 2004-01-27 Tokyo Ohka, Kogyo Co., Ltd. Fluorine-containing monomeric ester compound for base resin in photoresist composition
US6846949B2 (en) 2001-02-22 2005-01-25 Tokyo Ohka Kogyo Co., Ltd. Fluorine-containing monomeric ester compound for base resin in photoresist composition

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