JPS6442575A - Ceramic target having high melting point for vacuum deposition with arc - Google Patents

Ceramic target having high melting point for vacuum deposition with arc

Info

Publication number
JPS6442575A
JPS6442575A JP62199406A JP19940687A JPS6442575A JP S6442575 A JPS6442575 A JP S6442575A JP 62199406 A JP62199406 A JP 62199406A JP 19940687 A JP19940687 A JP 19940687A JP S6442575 A JPS6442575 A JP S6442575A
Authority
JP
Japan
Prior art keywords
arc
vacuum deposition
ceramics
ceramic
ceramic target
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62199406A
Other languages
Japanese (ja)
Inventor
Tsutomu Ikeda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP62199406A priority Critical patent/JPS6442575A/en
Publication of JPS6442575A publication Critical patent/JPS6442575A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/067—Borides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

PURPOSE:To form a ceramic film having high hardness and superior wear resistance when a vacuum-deposited film of ceramics having a high m.p. is formed on the surface of a substrate by vacuum deposition with arc, by regulating the void volume of a ceramic target used to a specified value or below. CONSTITUTION:When a thin film of a boride such as TiB2, ZrB2, NbB2, TaB2, CrB, MoB or WB or other ceramics having high hardness and superior wear resistance is formed on the surface of a substrate having a complex shape by vacuum deposition with arc, powdery starting material for the ceramics is subjected to hot isostatic pressing or other processing to produce a ceramic target having <=5% void volume and low arc voltage is impressed on the target. A ceramic film having superior characteristics such as superior wear, corrosion and heat resistances, dielectric, magnetic and optical properties can be formed in a uniform thickness.
JP62199406A 1987-08-10 1987-08-10 Ceramic target having high melting point for vacuum deposition with arc Pending JPS6442575A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62199406A JPS6442575A (en) 1987-08-10 1987-08-10 Ceramic target having high melting point for vacuum deposition with arc

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62199406A JPS6442575A (en) 1987-08-10 1987-08-10 Ceramic target having high melting point for vacuum deposition with arc

Publications (1)

Publication Number Publication Date
JPS6442575A true JPS6442575A (en) 1989-02-14

Family

ID=16407264

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62199406A Pending JPS6442575A (en) 1987-08-10 1987-08-10 Ceramic target having high melting point for vacuum deposition with arc

Country Status (1)

Country Link
JP (1) JPS6442575A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001316800A (en) * 2000-02-25 2001-11-16 Sumitomo Electric Ind Ltd Amorphous carbon coated member
DE3914986C2 (en) * 1986-12-12 2003-10-30 Vapor Technologies Inc Coating process for the protection of ceramic objects against mechanical and thermal interference and protective coated ceramic object
WO2011137967A1 (en) * 2010-05-04 2011-11-10 Oerlikon Trading Ag, Trübbach Method for spark deposition using ceramic targets
US9481925B2 (en) 2010-05-04 2016-11-01 Plansee Se Titanium diboride target

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3914986C2 (en) * 1986-12-12 2003-10-30 Vapor Technologies Inc Coating process for the protection of ceramic objects against mechanical and thermal interference and protective coated ceramic object
JP2001316800A (en) * 2000-02-25 2001-11-16 Sumitomo Electric Ind Ltd Amorphous carbon coated member
WO2011137967A1 (en) * 2010-05-04 2011-11-10 Oerlikon Trading Ag, Trübbach Method for spark deposition using ceramic targets
US9481925B2 (en) 2010-05-04 2016-11-01 Plansee Se Titanium diboride target

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