JPS6435913A - Method and device for correcting defect of device - Google Patents
Method and device for correcting defect of deviceInfo
- Publication number
- JPS6435913A JPS6435913A JP19002987A JP19002987A JPS6435913A JP S6435913 A JPS6435913 A JP S6435913A JP 19002987 A JP19002987 A JP 19002987A JP 19002987 A JP19002987 A JP 19002987A JP S6435913 A JPS6435913 A JP S6435913A
- Authority
- JP
- Japan
- Prior art keywords
- ion
- processing
- processed
- ion species
- conductivity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19002987A JPS6435913A (en) | 1987-07-31 | 1987-07-31 | Method and device for correcting defect of device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP19002987A JPS6435913A (en) | 1987-07-31 | 1987-07-31 | Method and device for correcting defect of device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6435913A true JPS6435913A (en) | 1989-02-07 |
Family
ID=16251184
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP19002987A Pending JPS6435913A (en) | 1987-07-31 | 1987-07-31 | Method and device for correcting defect of device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6435913A (ja) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58164135A (ja) * | 1982-03-25 | 1983-09-29 | Agency Of Ind Science & Technol | 収束イオンビ−ムを用いた半導体加工装置 |
JPS59135726A (ja) * | 1983-01-24 | 1984-08-04 | Hitachi Ltd | 低温吸着を利用した光によるパタ−ン形成方法 |
JPS60217635A (ja) * | 1984-04-12 | 1985-10-31 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
JPS61245164A (ja) * | 1985-04-23 | 1986-10-31 | Seiko Instr & Electronics Ltd | パタ−ン修正装置 |
-
1987
- 1987-07-31 JP JP19002987A patent/JPS6435913A/ja active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58164135A (ja) * | 1982-03-25 | 1983-09-29 | Agency Of Ind Science & Technol | 収束イオンビ−ムを用いた半導体加工装置 |
JPS59135726A (ja) * | 1983-01-24 | 1984-08-04 | Hitachi Ltd | 低温吸着を利用した光によるパタ−ン形成方法 |
JPS60217635A (ja) * | 1984-04-12 | 1985-10-31 | Mitsubishi Electric Corp | 半導体装置の製造方法 |
JPS61245164A (ja) * | 1985-04-23 | 1986-10-31 | Seiko Instr & Electronics Ltd | パタ−ン修正装置 |
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