JPS6435300A - Transfer of fine pattern - Google Patents

Transfer of fine pattern

Info

Publication number
JPS6435300A
JPS6435300A JP62188953A JP18895387A JPS6435300A JP S6435300 A JPS6435300 A JP S6435300A JP 62188953 A JP62188953 A JP 62188953A JP 18895387 A JP18895387 A JP 18895387A JP S6435300 A JPS6435300 A JP S6435300A
Authority
JP
Japan
Prior art keywords
counter
output
current
zone
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP62188953A
Other languages
English (en)
Inventor
Teruo Hosokawa
Takashi Kaneko
Sunao Ishihara
Masayuki Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP62188953A priority Critical patent/JPS6435300A/ja
Publication of JPS6435300A publication Critical patent/JPS6435300A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62188953A 1987-07-30 1987-07-30 Transfer of fine pattern Pending JPS6435300A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62188953A JPS6435300A (en) 1987-07-30 1987-07-30 Transfer of fine pattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62188953A JPS6435300A (en) 1987-07-30 1987-07-30 Transfer of fine pattern

Publications (1)

Publication Number Publication Date
JPS6435300A true JPS6435300A (en) 1989-02-06

Family

ID=16232810

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62188953A Pending JPS6435300A (en) 1987-07-30 1987-07-30 Transfer of fine pattern

Country Status (1)

Country Link
JP (1) JPS6435300A (ja)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6417427A (en) * 1987-07-13 1989-01-20 Nippon Telegraph & Telephone Fine pattern transferring device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6417427A (en) * 1987-07-13 1989-01-20 Nippon Telegraph & Telephone Fine pattern transferring device

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