JPS6417427A - Fine pattern transferring device - Google Patents

Fine pattern transferring device

Info

Publication number
JPS6417427A
JPS6417427A JP62173076A JP17307687A JPS6417427A JP S6417427 A JPS6417427 A JP S6417427A JP 62173076 A JP62173076 A JP 62173076A JP 17307687 A JP17307687 A JP 17307687A JP S6417427 A JPS6417427 A JP S6417427A
Authority
JP
Japan
Prior art keywords
light
current
sor
variation
intensity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62173076A
Other languages
Japanese (ja)
Other versions
JP2628045B2 (en
Inventor
Teruo Hosokawa
Takashi Kaneko
Sunao Ishihara
Masayuki Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP62173076A priority Critical patent/JP2628045B2/en
Publication of JPS6417427A publication Critical patent/JPS6417427A/en
Application granted granted Critical
Publication of JP2628045B2 publication Critical patent/JP2628045B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To make light energy density constant on a sample surface and to prevent exposure irregularity between wafers from occurring due to variation in intensity of light, by changing a motion speed of a light irradiated region in accordance with variation in intensity of synchrotron radiant light. CONSTITUTION:A current booster 1 outputs a rocking magnet exciting current IM according to an input voltage VM. Since a rocking magnet mounted on an accumulation ring is excited by this current IM, an orbit of an electron current accumulated in the accumulation ring is rocked by changing this current, and so a region irradiated with synchrotron radiant light SOR from there is shifted. Further, a means, which is disposed between an SOR light source and a sample and used to selectively screen the SOR light, is operated synchronizing with the shift of the irradiated region. Since energy density of the SOR light on the sample surface can be hence made constant, exposure irregularity between wafers can be prevented from occurring due to variation in intensity of light. Exposure regulation by a shading means is performed without the exposure irregularity.
JP62173076A 1987-07-13 1987-07-13 Fine pattern transfer device Expired - Lifetime JP2628045B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62173076A JP2628045B2 (en) 1987-07-13 1987-07-13 Fine pattern transfer device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62173076A JP2628045B2 (en) 1987-07-13 1987-07-13 Fine pattern transfer device

Publications (2)

Publication Number Publication Date
JPS6417427A true JPS6417427A (en) 1989-01-20
JP2628045B2 JP2628045B2 (en) 1997-07-09

Family

ID=15953763

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62173076A Expired - Lifetime JP2628045B2 (en) 1987-07-13 1987-07-13 Fine pattern transfer device

Country Status (1)

Country Link
JP (1) JP2628045B2 (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6435300A (en) * 1987-07-30 1989-02-06 Nippon Telegraph & Telephone Transfer of fine pattern
JPH0276213A (en) * 1988-09-13 1990-03-15 Canon Inc Exposure device
EP0697295A2 (en) 1994-07-18 1996-02-21 Toppan Printing Co., Ltd. Printed decorative paper having a three dimensional pattern and a process for the production thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62141721A (en) * 1985-12-17 1987-06-25 Mitsubishi Electric Corp Charged particle device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62141721A (en) * 1985-12-17 1987-06-25 Mitsubishi Electric Corp Charged particle device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6435300A (en) * 1987-07-30 1989-02-06 Nippon Telegraph & Telephone Transfer of fine pattern
JPH0276213A (en) * 1988-09-13 1990-03-15 Canon Inc Exposure device
EP0697295A2 (en) 1994-07-18 1996-02-21 Toppan Printing Co., Ltd. Printed decorative paper having a three dimensional pattern and a process for the production thereof

Also Published As

Publication number Publication date
JP2628045B2 (en) 1997-07-09

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