GB1308077A - Exposing a target to a beam of charged particles - Google Patents

Exposing a target to a beam of charged particles

Info

Publication number
GB1308077A
GB1308077A GB1308077DA GB1308077A GB 1308077 A GB1308077 A GB 1308077A GB 1308077D A GB1308077D A GB 1308077DA GB 1308077 A GB1308077 A GB 1308077A
Authority
GB
United Kingdom
Prior art keywords
coil
work
additional
exposing
focusing lens
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Philips Components Ltd
Original Assignee
Mullard Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mullard Ltd filed Critical Mullard Ltd
Publication of GB1308077A publication Critical patent/GB1308077A/en
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002Details
    • H01J37/3007Electron or ion-optical systems
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/302Controlling tubes by external information, e.g. programme control

Abstract

1308077 Discharge apparatus MULLARD Ltd 19 April 1971 [27 Feb 1970] 9642/70 Heading H1D Charged particle beam apparatus used for treating work pieces is provided with a focusing system which can produce a fine beam for use in areas where fine tracing is required and a larger beam for use where large areas are to be irradiated. Fig. 1 shows electron beam apparatus including an additional coil 5 which, when energized, reduces the beam diameter at the work 10 from 3 microns to 1 micron. The coil 5 is preferably wound on a core of magnetically non-permeable material such as ceramic so that it can be switched rapidly on and off. Such switching alters the focal length, but the alteration is minimized by placing the coil close to the anode 4 and may be eliminated by providing an additional air-cored solenoid (not shown) in combination with the second focusing lens 9, the additional coil being connected in series with the coil 5. The apparatus shown also includes a first focusing lens 6 and deflecting plates 7 and 8. An electron beam may be used for exposing a photo-resist on the surface of a silicon slice, or an ion beam may be used for ion implantation, and in either case means are provided for moving the beam and/or the work in a desired pattern. The coil 5 may be oil-cooled.
GB1308077D 1970-02-27 1970-02-27 Exposing a target to a beam of charged particles Expired GB1308077A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB964270 1970-02-27

Publications (1)

Publication Number Publication Date
GB1308077A true GB1308077A (en) 1973-02-21

Family

ID=9875949

Family Applications (1)

Application Number Title Priority Date Filing Date
GB1308077D Expired GB1308077A (en) 1970-02-27 1970-02-27 Exposing a target to a beam of charged particles

Country Status (3)

Country Link
DE (1) DE2108669C3 (en)
FR (1) FR2078948A5 (en)
GB (1) GB1308077A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3956635A (en) * 1975-06-13 1976-05-11 International Business Machines Corporation Combined multiple beam size and spiral scan method for electron beam writing of microcircuit patterns
JPS5423476A (en) * 1977-07-25 1979-02-22 Akashi Seisakusho Kk Composite electron lens
FR2477827A1 (en) * 1980-03-04 1981-09-11 Cgr Mev ACCELERATOR DEVICE OF CHARGED PARTICLES OPERATING IN METRIC WAVES

Also Published As

Publication number Publication date
DE2108669B2 (en) 1978-06-22
FR2078948A5 (en) 1971-11-05
DE2108669C3 (en) 1979-03-01
DE2108669A1 (en) 1971-09-09

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Legal Events

Date Code Title Description
PS Patent sealed
PCNP Patent ceased through non-payment of renewal fee