JPS57165943A - Acceleration controlling method for charged particle beams in electron microscope and similar device - Google Patents

Acceleration controlling method for charged particle beams in electron microscope and similar device

Info

Publication number
JPS57165943A
JPS57165943A JP4995981A JP4995981A JPS57165943A JP S57165943 A JPS57165943 A JP S57165943A JP 4995981 A JP4995981 A JP 4995981A JP 4995981 A JP4995981 A JP 4995981A JP S57165943 A JPS57165943 A JP S57165943A
Authority
JP
Japan
Prior art keywords
anode
charged particle
filament
particle beams
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4995981A
Other languages
Japanese (ja)
Inventor
Takeo Ichinokawa
Shigetomo Yamazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Akashi Seisakusho KK
Original Assignee
Akashi Seisakusho KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Akashi Seisakusho KK filed Critical Akashi Seisakusho KK
Priority to JP4995981A priority Critical patent/JPS57165943A/en
Publication of JPS57165943A publication Critical patent/JPS57165943A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns

Abstract

PURPOSE:To enable charged particle beams to be accelerated with a very low acceleration voltage by drawing the said charged particle beams sufficiently from a charged-particle source. CONSTITUTION:The electric field between a filament 1 and a second anode 21, and the electric field between a first anode 20 and the second anode 21 effect in reverse direction. Therefore, electrons discharged from the filament 1 are accelerated with high voltage until they reach the second anode 21, are decelerated due to the electric field of adverse direction until they reach the first anode 20, and are discharged from the anode 20 at an acceleration corresponding to the voltage applied across the filament 1 and the anode 20. Consequently, even when a low acceleration voltage of around many hundred volts or below is applied across the filament 1 and the anode 20, a sufficient amount of electron beams can be discharged at an acceleration corresponding to the voltage.
JP4995981A 1981-04-02 1981-04-02 Acceleration controlling method for charged particle beams in electron microscope and similar device Pending JPS57165943A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4995981A JPS57165943A (en) 1981-04-02 1981-04-02 Acceleration controlling method for charged particle beams in electron microscope and similar device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4995981A JPS57165943A (en) 1981-04-02 1981-04-02 Acceleration controlling method for charged particle beams in electron microscope and similar device

Publications (1)

Publication Number Publication Date
JPS57165943A true JPS57165943A (en) 1982-10-13

Family

ID=12845563

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4995981A Pending JPS57165943A (en) 1981-04-02 1981-04-02 Acceleration controlling method for charged particle beams in electron microscope and similar device

Country Status (1)

Country Link
JP (1) JPS57165943A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6149364A (en) * 1984-08-13 1986-03-11 イーツエーテー、インテグレイテツド、サーキツト、テスチング、ゲゼルシヤフト、フユア、ハルプライタープリユーフテヒニク、ミツト、ベシユレンクテル、ハフツング Scan type particle beam microscope
JPS6264033A (en) * 1985-09-13 1987-03-20 Nec Corp Linear electron beam generator
JPH0778855A (en) * 1994-09-05 1995-03-20 Hitachi Ltd Inspecting device by use of electron beam
JPH09181139A (en) * 1997-01-20 1997-07-11 Hitachi Ltd Defect inspection method
JPH09213256A (en) * 1997-01-20 1997-08-15 Hitachi Ltd Electric beam inspection device
JPH09213255A (en) * 1997-01-20 1997-08-15 Hitachi Ltd Defect inspection device
JPH09218171A (en) * 1997-01-20 1997-08-19 Hitachi Ltd Method for inspecting defect
JPH09219171A (en) * 1997-01-20 1997-08-19 Hitachi Ltd Electron beam inspection device
JPH1019538A (en) * 1997-03-27 1998-01-23 Hitachi Ltd Method and device for defect inspection by electron beam
JPWO2016110996A1 (en) * 2015-01-09 2017-04-27 技術研究組合次世代３Ｄ積層造形技術総合開発機構 Electron gun, electron gun control method, control program, and three-dimensional modeling apparatus
JPWO2016063325A1 (en) * 2014-10-20 2017-06-01 株式会社日立ハイテクノロジーズ Scanning electron microscope

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55161344A (en) * 1979-06-01 1980-12-15 Philips Nv Scan electron microscope

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55161344A (en) * 1979-06-01 1980-12-15 Philips Nv Scan electron microscope

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6149364A (en) * 1984-08-13 1986-03-11 イーツエーテー、インテグレイテツド、サーキツト、テスチング、ゲゼルシヤフト、フユア、ハルプライタープリユーフテヒニク、ミツト、ベシユレンクテル、ハフツング Scan type particle beam microscope
JPS6264033A (en) * 1985-09-13 1987-03-20 Nec Corp Linear electron beam generator
JPH0778855A (en) * 1994-09-05 1995-03-20 Hitachi Ltd Inspecting device by use of electron beam
JPH09218171A (en) * 1997-01-20 1997-08-19 Hitachi Ltd Method for inspecting defect
JPH09213256A (en) * 1997-01-20 1997-08-15 Hitachi Ltd Electric beam inspection device
JPH09213255A (en) * 1997-01-20 1997-08-15 Hitachi Ltd Defect inspection device
JPH09181139A (en) * 1997-01-20 1997-07-11 Hitachi Ltd Defect inspection method
JPH09219171A (en) * 1997-01-20 1997-08-19 Hitachi Ltd Electron beam inspection device
JPH1019538A (en) * 1997-03-27 1998-01-23 Hitachi Ltd Method and device for defect inspection by electron beam
JPWO2016063325A1 (en) * 2014-10-20 2017-06-01 株式会社日立ハイテクノロジーズ Scanning electron microscope
US10297416B2 (en) 2014-10-20 2019-05-21 Hitachi High-Technologies Corporation Scanning electron microscope
JPWO2016110996A1 (en) * 2015-01-09 2017-04-27 技術研究組合次世代３Ｄ積層造形技術総合開発機構 Electron gun, electron gun control method, control program, and three-dimensional modeling apparatus
US10217599B2 (en) 2015-01-09 2019-02-26 Technology Research Association For Future Additive Manufacturing Electron gun, control method and control program thereof, and three-dimensional shaping apparatus

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