JPS6433975A - Manufacture of semiconductor light emitting device - Google Patents

Manufacture of semiconductor light emitting device

Info

Publication number
JPS6433975A
JPS6433975A JP19069587A JP19069587A JPS6433975A JP S6433975 A JPS6433975 A JP S6433975A JP 19069587 A JP19069587 A JP 19069587A JP 19069587 A JP19069587 A JP 19069587A JP S6433975 A JPS6433975 A JP S6433975A
Authority
JP
Japan
Prior art keywords
recessed part
forming
mask
applying
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19069587A
Other languages
Japanese (ja)
Inventor
Nagataka Ishiguro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP19069587A priority Critical patent/JPS6433975A/en
Publication of JPS6433975A publication Critical patent/JPS6433975A/en
Pending legal-status Critical Current

Links

Landscapes

  • Semiconductor Lasers (AREA)
  • Led Devices (AREA)

Abstract

PURPOSE:To obtain a semiconductor light emitting device having a structure to realize high efficiency and high response, by forming a recessed part by partially etching a semicondcutor substrate by applying an insulating film to a mask, and forming an epitaxial layer for forming a double heterojunction in the above recessed part. CONSTITUTION:By applying an insulating film 5 wherein a pattern is formed on a semiconductor substrate 4 to a mask, the substrate 4 is partially etched for forming a recessed part. By applying the above insulating film 5 to a mask, epitaxial layers 2, 1, 3 for forming a double heterojunction are formed in the above recessed part. Thus a light emitting part is formed in the above recessed part. For example, an SiO2 film 5 is formed on an N-type InP substrate 4, and a circular aperture whose diameter is about 35mum is formed. By applying the SiO2 film 5 to a mask, etching is performed to form a recessed part whose depth is about 4mum. In the recessed part, the following are grown in order by liquid growth and the like; an N-type InP clad layer 2, an InGaAsP active layer 1, and a P-type InP clad layer 3. Thereby, an LED for long wavelength band communication is manufactured.
JP19069587A 1987-07-30 1987-07-30 Manufacture of semiconductor light emitting device Pending JPS6433975A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19069587A JPS6433975A (en) 1987-07-30 1987-07-30 Manufacture of semiconductor light emitting device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19069587A JPS6433975A (en) 1987-07-30 1987-07-30 Manufacture of semiconductor light emitting device

Publications (1)

Publication Number Publication Date
JPS6433975A true JPS6433975A (en) 1989-02-03

Family

ID=16262318

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19069587A Pending JPS6433975A (en) 1987-07-30 1987-07-30 Manufacture of semiconductor light emitting device

Country Status (1)

Country Link
JP (1) JPS6433975A (en)

Similar Documents

Publication Publication Date Title
US3981023A (en) Integral lens light emitting diode
KR900000209B1 (en) Manufacture of semiconductor a photo diode and avalanche photodiode
US3962714A (en) Semiconductor optical modulator
US4220960A (en) Light emitting diode structure
JPS6433975A (en) Manufacture of semiconductor light emitting device
JPH07153991A (en) Light emitting diode and its production
JPS5618484A (en) Manufacture of semiconductor laser
JPH0716081B2 (en) Semiconductor light emitting device
JPS5642388A (en) Semiconductor light emitting device
KR900001407B1 (en) Surface radiation type radiation diode manufacturing method
KR970072507A (en) Method for manufacturing a horizontal semiconductor PN junction array
JPS6476782A (en) Semiconductor light-emitting diode
JPS56142691A (en) Semiconductor light emitting device
JPS5748286A (en) Manufacture of buried hetero structured semiconductor laser
JPS5518087A (en) Semiconductor laser device and manufacture thereof
JPS6450591A (en) Semiconductor device and manufacture thereof
JPS6472577A (en) Optical semiconductor element
JPS6468979A (en) Formation of light emitting device using gaalas wafer
JPS57139984A (en) Buried photo emitting and receiving semiconductor integrated device
KR960009302B1 (en) Manufacturing method of semiconductor laser diode with multi lasing area
JPS5565483A (en) Manufacture of semiconductor light emitting element
KR910005392B1 (en) Manufacturing method of double-hetero junction type led with junction current limited region
JPS56158495A (en) Manufacture of semiconductor light emitting device
JPS6476783A (en) Semiconductor light-emitting diode
JPS55128894A (en) Semiconductor light emitting device and method of fabricating the same