JPS6433920A - Growth method of semiconductor film - Google Patents
Growth method of semiconductor filmInfo
- Publication number
- JPS6433920A JPS6433920A JP18873087A JP18873087A JPS6433920A JP S6433920 A JPS6433920 A JP S6433920A JP 18873087 A JP18873087 A JP 18873087A JP 18873087 A JP18873087 A JP 18873087A JP S6433920 A JPS6433920 A JP S6433920A
- Authority
- JP
- Japan
- Prior art keywords
- section
- film
- polycrystalline semiconductor
- epitaxial growth
- selective epitaxial
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
PURPOSE:To take a contact to a base without lengthening the growth time from a conductive film buried to a sidewall section, not the surface, and to reduce parasitic capacitance by growing approximately a section where the thickness of a selective epitaxial growth film reaches the cross section of a polycrystalline semiconductor layer under the state in which a large quantity of HCl gas are added. CONSTITUTION:A first dielectric insulating layer 102, a polycrystalline semiconductor layer 104 and a second dielectric insulating layer 106 are formed onto a semiconductor substrate 100 in succession, an opening section 108, whose cross section has the polycrystalline semiconductor layer 104, is shaped, and selective epitaxial growth is conducted in an atmosphere containing HCl gas on the exposed substrate semiconductor surface. Approximately a section where the thickness of a selective epitaxial growth film reaches the cross section of the polycrystalline semiconductor layer 104 is grown under the state in which a large quantity of HCl gas are added at that time. Consequently, the polycrystalline semiconductor film 104 is etched, and only a selective epitaxial growth film 103 is grown. The selective epitaxial growth film 103 is grown in the cross direction on the insulating layer 102, and brought into contact with the polycrystalline semiconductor film 104, thus forming a semiconductor film having structure as shown in the figure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18873087A JPS6433920A (en) | 1987-07-30 | 1987-07-30 | Growth method of semiconductor film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18873087A JPS6433920A (en) | 1987-07-30 | 1987-07-30 | Growth method of semiconductor film |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6433920A true JPS6433920A (en) | 1989-02-03 |
Family
ID=16228774
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18873087A Pending JPS6433920A (en) | 1987-07-30 | 1987-07-30 | Growth method of semiconductor film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6433920A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5378644A (en) * | 1990-04-13 | 1995-01-03 | Mitsubishi Denki Kabushiki Kaisha | Method for manufacturing a semiconductor device |
-
1987
- 1987-07-30 JP JP18873087A patent/JPS6433920A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5378644A (en) * | 1990-04-13 | 1995-01-03 | Mitsubishi Denki Kabushiki Kaisha | Method for manufacturing a semiconductor device |
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