JPS6430224A - Plasma processing method - Google Patents

Plasma processing method

Info

Publication number
JPS6430224A
JPS6430224A JP18717787A JP18717787A JPS6430224A JP S6430224 A JPS6430224 A JP S6430224A JP 18717787 A JP18717787 A JP 18717787A JP 18717787 A JP18717787 A JP 18717787A JP S6430224 A JPS6430224 A JP S6430224A
Authority
JP
Japan
Prior art keywords
magnetic field
specimen
changing
level
chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP18717787A
Other languages
English (en)
Inventor
Takashi Hirao
Masatoshi Kitagawa
Tetsuhisa Yoshida
Haruhide Fuse
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP18717787A priority Critical patent/JPS6430224A/ja
Publication of JPS6430224A publication Critical patent/JPS6430224A/ja
Pending legal-status Critical Current

Links

JP18717787A 1987-07-27 1987-07-27 Plasma processing method Pending JPS6430224A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18717787A JPS6430224A (en) 1987-07-27 1987-07-27 Plasma processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18717787A JPS6430224A (en) 1987-07-27 1987-07-27 Plasma processing method

Publications (1)

Publication Number Publication Date
JPS6430224A true JPS6430224A (en) 1989-02-01

Family

ID=16201453

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18717787A Pending JPS6430224A (en) 1987-07-27 1987-07-27 Plasma processing method

Country Status (1)

Country Link
JP (1) JPS6430224A (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02111023A (ja) * 1988-10-20 1990-04-24 Fujitsu Ltd 成膜方法及びプラズマｃｖｄ装置
DE4107329A1 (de) * 1990-03-09 1991-09-12 Mitsubishi Electric Corp Verfahren und geraet zum reinigen von halbleitereinrichtungen
DE4331549A1 (de) * 1993-09-16 1995-04-13 Gold Star Electronics Verfahren zur Herstellung einer ULSI-Halbleitereinrichtung
US7033514B2 (en) * 2001-08-27 2006-04-25 Micron Technology, Inc. Method and apparatus for micromachining using a magnetic field and plasma etching
JP2012507866A (ja) * 2008-10-31 2012-03-29 アプライド マテリアルズ インコーポレイテッド Ｐ３ｉチャンバにおける共形ドープの改善

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02111023A (ja) * 1988-10-20 1990-04-24 Fujitsu Ltd 成膜方法及びプラズマｃｖｄ装置
DE4107329A1 (de) * 1990-03-09 1991-09-12 Mitsubishi Electric Corp Verfahren und geraet zum reinigen von halbleitereinrichtungen
DE4331549A1 (de) * 1993-09-16 1995-04-13 Gold Star Electronics Verfahren zur Herstellung einer ULSI-Halbleitereinrichtung
US7033514B2 (en) * 2001-08-27 2006-04-25 Micron Technology, Inc. Method and apparatus for micromachining using a magnetic field and plasma etching
JP2012507866A (ja) * 2008-10-31 2012-03-29 アプライド マテリアルズ インコーポレイテッド Ｐ３ｉチャンバにおける共形ドープの改善

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