JPS6430110A - Superconductor - Google Patents
SuperconductorInfo
- Publication number
- JPS6430110A JPS6430110A JP62184012A JP18401287A JPS6430110A JP S6430110 A JPS6430110 A JP S6430110A JP 62184012 A JP62184012 A JP 62184012A JP 18401287 A JP18401287 A JP 18401287A JP S6430110 A JPS6430110 A JP S6430110A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- gan
- layer
- superconductive
- crack
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
- Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment
Landscapes
- Crystals, And After-Treatments Of Crystals (AREA)
- Physical Vapour Deposition (AREA)
- Superconductor Devices And Manufacturing Methods Thereof (AREA)
- Superconductors And Manufacturing Methods Therefor (AREA)
Abstract
PURPOSE:To make it possible to grow up a superconductive membrane with no crack by growing up a compound of GaN or AlN on a saphier substrate as a buffer layer. CONSTITUTION:On a siphier C axis substrate 1, GaN crystals 3 are grown up in a gaseous phase breeding in which NH3 and H2 are reacted with Ga metal. Then, on the resultant substrate 1, a superconductive material layer 2 is formed in a beam vacuum evaporation method. In this case, the GaN breeding layer 3 grows as single crystals on the substrate 1, and it has extremely numerous empty grid points of N, being flexible to a grid distortion. Consequently, when a superconductor layer is formed thereover, no crack is produced, and a stable superconductive membrane is obtained even through an annealing and cooling processes are applied.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62184012A JPS6430110A (en) | 1987-07-23 | 1987-07-23 | Superconductor |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62184012A JPS6430110A (en) | 1987-07-23 | 1987-07-23 | Superconductor |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6430110A true JPS6430110A (en) | 1989-02-01 |
Family
ID=16145788
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62184012A Pending JPS6430110A (en) | 1987-07-23 | 1987-07-23 | Superconductor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6430110A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5290393A (en) * | 1991-01-31 | 1994-03-01 | Nichia Kagaku Kogyo K.K. | Crystal growth method for gallium nitride-based compound semiconductor |
US5725674A (en) * | 1991-03-18 | 1998-03-10 | Trustees Of Boston University | Device and method for epitaxially growing gallium nitride layers |
MD174Z (en) * | 2009-05-19 | 2010-10-31 | Институт Электронной Инженерии И Промышленных Технологий Академии Наук Молдовы | Semiconducting material |
MD323Z (en) * | 2009-12-29 | 2011-08-31 | Институт Электронной Инженерии И Промышленных Технологий Академии Наук Молдовы | Thermoelectric microwire in glass insulation |
-
1987
- 1987-07-23 JP JP62184012A patent/JPS6430110A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5290393A (en) * | 1991-01-31 | 1994-03-01 | Nichia Kagaku Kogyo K.K. | Crystal growth method for gallium nitride-based compound semiconductor |
US5725674A (en) * | 1991-03-18 | 1998-03-10 | Trustees Of Boston University | Device and method for epitaxially growing gallium nitride layers |
MD174Z (en) * | 2009-05-19 | 2010-10-31 | Институт Электронной Инженерии И Промышленных Технологий Академии Наук Молдовы | Semiconducting material |
MD323Z (en) * | 2009-12-29 | 2011-08-31 | Институт Электронной Инженерии И Промышленных Технологий Академии Наук Молдовы | Thermoelectric microwire in glass insulation |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Akasaki et al. | Effects of ain buffer layer on crystallographic structure and on electrical and optical properties of GaN and Ga1− xAlxN (0< x≦ 0.4) films grown on sapphire substrate by MOVPE | |
EP1479795A4 (en) | Process for producing group iii nitride compound semiconductor | |
JPS649613A (en) | Formation of iii-v compound semiconductor | |
JPS5659699A (en) | Gallium nitride growing method | |
EP0253611A3 (en) | Method of epitaxially growing gallium arsenide on silicon | |
JPS6430110A (en) | Superconductor | |
GB1042933A (en) | Methods of growing crystals of gallium arsenide, gallium phosphide or mixtures thereof | |
JPS56138917A (en) | Vapor phase epitaxial growth | |
JPS5618000A (en) | Vapor phase growing method for 3-5 group compound semiconductor | |
JPS5710223A (en) | Semiconductor device | |
EP0445307A4 (en) | Single crystal oxide substrate, superconductor device produced therefrom, and producing thereof | |
JPS538374A (en) | Growing method for single crystal of semiconductor | |
JPS57196523A (en) | Growing method of semiconductor | |
JPS5659700A (en) | Forming method for gallium nitride single crystal thin film | |
JPS6410619A (en) | Vapor phase epitaxial growth method | |
JPS6427222A (en) | Manufacture of thin single crystalline film | |
JPS6421074A (en) | Method for selectively growing thin metallic film | |
JPS5649520A (en) | Vapor growth of compound semiconductor | |
JPS6456424A (en) | Production of organic film | |
JPS52120764A (en) | Manufacture of semiconductor device on insulator substrate | |
Igamberdiyev et al. | Investigations of Semiconductor Heterostructures GaAs--AlxGa 1--xAs by Electron Probe Method | |
JPS5383577A (en) | Molecule beam epitaxial growth method | |
JPS6437832A (en) | Method of growing compound semiconductor crystal | |
JPS5646524A (en) | Gaseous phase growing of compound semiconductor | |
JPS6430210A (en) | Method for growing iii-v compound semiconductor |