JPS6426182A - Intensity monitor for exposure of x rays - Google Patents
Intensity monitor for exposure of x raysInfo
- Publication number
- JPS6426182A JPS6426182A JP62182641A JP18264187A JPS6426182A JP S6426182 A JPS6426182 A JP S6426182A JP 62182641 A JP62182641 A JP 62182641A JP 18264187 A JP18264187 A JP 18264187A JP S6426182 A JPS6426182 A JP S6426182A
- Authority
- JP
- Japan
- Prior art keywords
- rays
- exposure
- ssd
- ray beam
- intensity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Measurement Of Radiation (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
PURPOSE:To continuously execute monitoring by using an SSD even against an SOR light, by utilizing gaseous scattering of X rays. CONSTITUTION:X rays incoming into an exposure chamber 10 are divided into an X-ray beam 13 for exposure and an X-ray beam 14 for monitoring by a slit and a shielding plate 12. An SSD 4 being a solid state detector is placed vertically under a scattering area 6. The X-ray beam is allowed to pass through in gaseous helium of an atmospheric pressure. By changing the size of the slit, gaseous helium pressure, and the kind of gas, the scattering intensity is adjusted. In such a way, the SSD can be used against an SOR light (X rays) whose intensity is high, and also, even in the course of exposure of X rays, the intensity can be monitored without obstructing the exposure.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62182641A JPS6426182A (en) | 1987-07-22 | 1987-07-22 | Intensity monitor for exposure of x rays |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62182641A JPS6426182A (en) | 1987-07-22 | 1987-07-22 | Intensity monitor for exposure of x rays |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6426182A true JPS6426182A (en) | 1989-01-27 |
Family
ID=16121851
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62182641A Pending JPS6426182A (en) | 1987-07-22 | 1987-07-22 | Intensity monitor for exposure of x rays |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6426182A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016526171A (en) * | 2013-06-03 | 2016-09-01 | アンフォース・レイセイフ・アーベー | X-ray imaging apparatus and apparatus for measuring X-ray dose parameters in an X-ray detector |
-
1987
- 1987-07-22 JP JP62182641A patent/JPS6426182A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016526171A (en) * | 2013-06-03 | 2016-09-01 | アンフォース・レイセイフ・アーベー | X-ray imaging apparatus and apparatus for measuring X-ray dose parameters in an X-ray detector |
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