JPS642191B2 - - Google Patents
Info
- Publication number
- JPS642191B2 JPS642191B2 JP28312785A JP28312785A JPS642191B2 JP S642191 B2 JPS642191 B2 JP S642191B2 JP 28312785 A JP28312785 A JP 28312785A JP 28312785 A JP28312785 A JP 28312785A JP S642191 B2 JPS642191 B2 JP S642191B2
- Authority
- JP
- Japan
- Prior art keywords
- deposited film
- reaction vessel
- cvd method
- plasma
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03G—ELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
- G03G5/00—Recording-members for original recording by exposure, e.g. to light, to heat or to electrons; Manufacture thereof; Selection of materials therefor
- G03G5/02—Charge-receiving layers
- G03G5/04—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
- G03G5/08—Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor characterised by the photoconductive material being inorganic
Landscapes
- Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photoreceptors In Electrophotography (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28312785A JPS62142784A (ja) | 1985-12-18 | 1985-12-18 | プラズマcvd法による堆積膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP28312785A JPS62142784A (ja) | 1985-12-18 | 1985-12-18 | プラズマcvd法による堆積膜形成装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62142784A JPS62142784A (ja) | 1987-06-26 |
| JPS642191B2 true JPS642191B2 (oth) | 1989-01-13 |
Family
ID=17661577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP28312785A Granted JPS62142784A (ja) | 1985-12-18 | 1985-12-18 | プラズマcvd法による堆積膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62142784A (oth) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115537765B (zh) * | 2022-09-27 | 2024-07-12 | 盛吉盛(宁波)半导体科技有限公司 | 等离子体化学气相沉积装置和小尺寸沟槽填充方法 |
-
1985
- 1985-12-18 JP JP28312785A patent/JPS62142784A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62142784A (ja) | 1987-06-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5129359A (en) | Microwave plasma CVD apparatus for the formation of functional deposited film with discharge space provided with gas feed device capable of applying bias voltage between the gas feed device and substrate | |
| JPH0510428B2 (oth) | ||
| JPH0676664B2 (ja) | マイクロ波プラズマcvd法による機能性堆積膜の形成装置 | |
| US4909184A (en) | Apparatus for the formation of a functional deposited film using microwave plasma chemical vapor deposition process | |
| JP2841243B2 (ja) | マイクロ波プラズマcvd法による堆積膜形成装置 | |
| US5338580A (en) | Method of preparation of functional deposited film by microwave plasma chemical vapor deposition | |
| JPS62142783A (ja) | プラズマcvd法による堆積膜形成装置 | |
| US5449880A (en) | Process and apparatus for forming a deposited film using microwave-plasma CVD | |
| JPS642191B2 (oth) | ||
| JPH01100275A (ja) | マイクロ波プラズマcvd法による機能性堆積膜形成装置 | |
| JPS62294181A (ja) | マイクロ波プラズマcvd法による機能性堆積膜の形成方法及び装置 | |
| JPS6153432B2 (oth) | ||
| JPH06196407A (ja) | 堆積膜形成方法および堆積膜形成装置 | |
| JPS6244578A (ja) | プラズマcvd法による堆積膜形成装置 | |
| JP2925310B2 (ja) | 堆積膜形成方法 | |
| JP2994658B2 (ja) | マイクロ波cvd法による堆積膜形成装置及び堆積膜形成方法 | |
| JPS6244577A (ja) | プラズマcvd法による堆積膜の量産装置 | |
| JPS6350479A (ja) | マイクロ波プラズマcvd法による機能性堆積膜形成装置 | |
| JP2925298B2 (ja) | 堆積膜形成方法 | |
| JPH0897161A (ja) | 高周波プラズマcvd法による堆積膜形成方法及び堆積膜形成装置 | |
| JPS6357779A (ja) | マイクロ波プラズマcvd法による機能性堆積膜形成装置 | |
| JPH02129378A (ja) | マイクロ波プラズマcvd法による機能性堆積膜の製造装置 | |
| JPS63230880A (ja) | マイクロ波プラズマcvd法による機能性堆積膜形成装置 | |
| JPS6347366A (ja) | マイクロ波プラズマcvd法による機能性堆積膜の形成装置 | |
| JPH02138476A (ja) | マイクロ波プラズマcvd法による機能性堆積膜形成方法 |