JPS6418651A - Thick film thermal head and production thereof - Google Patents
Thick film thermal head and production thereofInfo
- Publication number
- JPS6418651A JPS6418651A JP17568687A JP17568687A JPS6418651A JP S6418651 A JPS6418651 A JP S6418651A JP 17568687 A JP17568687 A JP 17568687A JP 17568687 A JP17568687 A JP 17568687A JP S6418651 A JPS6418651 A JP S6418651A
- Authority
- JP
- Japan
- Prior art keywords
- heating resistor
- resistor layer
- section
- open part
- cross
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/315—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material
- B41J2/32—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of heat to a heat sensitive printing or impression-transfer material using thermal heads
- B41J2/335—Structure of thermal heads
Landscapes
- Electronic Switches (AREA)
Abstract
PURPOSE:To enhance a printing quality without increasing the power demand, by a method wherein the cross section in a sub-scanning direction of a heating resistor layer forming a thick film thermal head is shaped into a trapezoid with obtuse taper angles theta. CONSTITUTION:On a glazed ceramic substrate 1, a plurality of electrodes 2 are formed using a predetermined mask by photolitho etching etc. After that, a negative-type photosensitive resist 3 is uniformly applied thereon by spin coating etc. In this case, at a predetermined position to be applied with a heating resistor layer, an open part 4 is exposed to light and developed. With an exposure of more than 100-150mJ/cm<2>, as the shape of the side wall of a pattern, the photosensitive resist is provided with the open part 4 having a side wall of reversely tapered cross section with acute angles to the surface of the substrate. Thereafter, a resistor paste is embedded into the formed open part 4 by a doctor blade method and other means, whereby a heating resistor layer 5 is formed and baked at a high temperature. The cross section of the heating resistor layer 5 formed in this manner is shaped into a trapezoid with taper angles of more than 90 deg.C.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62175686A JP2580609B2 (en) | 1987-07-14 | 1987-07-14 | Manufacturing method of thick film thermal head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62175686A JP2580609B2 (en) | 1987-07-14 | 1987-07-14 | Manufacturing method of thick film thermal head |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6418651A true JPS6418651A (en) | 1989-01-23 |
JP2580609B2 JP2580609B2 (en) | 1997-02-12 |
Family
ID=16000466
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62175686A Expired - Fee Related JP2580609B2 (en) | 1987-07-14 | 1987-07-14 | Manufacturing method of thick film thermal head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2580609B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7954927B2 (en) | 2005-09-30 | 2011-06-07 | Lexmark International, Inc. | Nozzle members, compositions, and methods for micro-fluid ejection heads |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5617274A (en) * | 1979-07-20 | 1981-02-19 | Mitsubishi Electric Corp | Preparation of thermal head |
JPS5666203A (en) * | 1979-06-28 | 1981-06-04 | Matsushita Electric Works Ltd | Handleless dryer |
JPS5699680A (en) * | 1980-01-10 | 1981-08-11 | Ricoh Co Ltd | Thermal head |
JPS6292414A (en) * | 1985-10-18 | 1987-04-27 | 富士ゼロックス株式会社 | Manufacture of thick film thermal head |
JPS6295286A (en) * | 1985-10-23 | 1987-05-01 | Alps Electric Co Ltd | Method for forming thick film paste |
-
1987
- 1987-07-14 JP JP62175686A patent/JP2580609B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5666203A (en) * | 1979-06-28 | 1981-06-04 | Matsushita Electric Works Ltd | Handleless dryer |
JPS5617274A (en) * | 1979-07-20 | 1981-02-19 | Mitsubishi Electric Corp | Preparation of thermal head |
JPS5699680A (en) * | 1980-01-10 | 1981-08-11 | Ricoh Co Ltd | Thermal head |
JPS6292414A (en) * | 1985-10-18 | 1987-04-27 | 富士ゼロックス株式会社 | Manufacture of thick film thermal head |
JPS6295286A (en) * | 1985-10-23 | 1987-05-01 | Alps Electric Co Ltd | Method for forming thick film paste |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7954927B2 (en) | 2005-09-30 | 2011-06-07 | Lexmark International, Inc. | Nozzle members, compositions, and methods for micro-fluid ejection heads |
Also Published As
Publication number | Publication date |
---|---|
JP2580609B2 (en) | 1997-02-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
LAPS | Cancellation because of no payment of annual fees |