JPS6417449A - Formation of bump electrode of semiconductor device - Google Patents
Formation of bump electrode of semiconductor deviceInfo
- Publication number
- JPS6417449A JPS6417449A JP62172290A JP17229087A JPS6417449A JP S6417449 A JPS6417449 A JP S6417449A JP 62172290 A JP62172290 A JP 62172290A JP 17229087 A JP17229087 A JP 17229087A JP S6417449 A JPS6417449 A JP S6417449A
- Authority
- JP
- Japan
- Prior art keywords
- bump electrode
- solder
- electrical plating
- resist film
- semiconductor device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
Landscapes
- Wire Bonding (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62172290A JPS6417449A (en) | 1987-07-10 | 1987-07-10 | Formation of bump electrode of semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62172290A JPS6417449A (en) | 1987-07-10 | 1987-07-10 | Formation of bump electrode of semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS6417449A true JPS6417449A (en) | 1989-01-20 |
Family
ID=15939185
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62172290A Pending JPS6417449A (en) | 1987-07-10 | 1987-07-10 | Formation of bump electrode of semiconductor device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6417449A (ja) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02244722A (ja) * | 1989-03-17 | 1990-09-28 | Casio Comput Co Ltd | 半導体素子のバンプ電極形成方法 |
JPH0346233A (ja) * | 1989-07-13 | 1991-02-27 | Sharp Corp | バンプの製造方法 |
JPH05228983A (ja) * | 1992-02-25 | 1993-09-07 | Mitsuba Seisakusho:Kk | 押出機への発泡用注入ガス制御装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5365663A (en) * | 1976-11-24 | 1978-06-12 | Nec Corp | Manufacture of semiconductor device |
JPS62266851A (ja) * | 1986-05-14 | 1987-11-19 | Nec Corp | 半田バンプ電極の形成方法 |
JPS63119551A (ja) * | 1986-11-07 | 1988-05-24 | Toshiba Corp | パタ−ニングされた金属膜の形成方法 |
-
1987
- 1987-07-10 JP JP62172290A patent/JPS6417449A/ja active Pending
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5365663A (en) * | 1976-11-24 | 1978-06-12 | Nec Corp | Manufacture of semiconductor device |
JPS62266851A (ja) * | 1986-05-14 | 1987-11-19 | Nec Corp | 半田バンプ電極の形成方法 |
JPS63119551A (ja) * | 1986-11-07 | 1988-05-24 | Toshiba Corp | パタ−ニングされた金属膜の形成方法 |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02244722A (ja) * | 1989-03-17 | 1990-09-28 | Casio Comput Co Ltd | 半導体素子のバンプ電極形成方法 |
JPH0346233A (ja) * | 1989-07-13 | 1991-02-27 | Sharp Corp | バンプの製造方法 |
JPH05228983A (ja) * | 1992-02-25 | 1993-09-07 | Mitsuba Seisakusho:Kk | 押出機への発泡用注入ガス制御装置 |
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