JPS6417205A - Heat treatment of nitrided alloy film - Google Patents
Heat treatment of nitrided alloy filmInfo
- Publication number
- JPS6417205A JPS6417205A JP17322887A JP17322887A JPS6417205A JP S6417205 A JPS6417205 A JP S6417205A JP 17322887 A JP17322887 A JP 17322887A JP 17322887 A JP17322887 A JP 17322887A JP S6417205 A JPS6417205 A JP S6417205A
- Authority
- JP
- Japan
- Prior art keywords
- alloy film
- heat treatment
- compsn
- 4pims
- metals
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62173228A JP2529274B2 (ja) | 1987-07-10 | 1987-07-10 | 窒化合金膜の熱処理方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP62173228A JP2529274B2 (ja) | 1987-07-10 | 1987-07-10 | 窒化合金膜の熱処理方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6417205A true JPS6417205A (en) | 1989-01-20 |
JP2529274B2 JP2529274B2 (ja) | 1996-08-28 |
Family
ID=15956520
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP62173228A Expired - Lifetime JP2529274B2 (ja) | 1987-07-10 | 1987-07-10 | 窒化合金膜の熱処理方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2529274B2 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02275605A (ja) * | 1989-01-26 | 1990-11-09 | Fuji Photo Film Co Ltd | 軟磁性薄膜 |
JPH031513A (ja) * | 1989-02-08 | 1991-01-08 | Fuji Photo Film Co Ltd | 軟磁性薄膜の製造方法 |
US5105100A (en) * | 1990-06-29 | 1992-04-14 | Nec Corporation | Easily and quickly testable master-slave flipflop circuit |
EP0897022A1 (en) * | 1996-11-20 | 1999-02-17 | Kabushiki Kaisha Toshiba | Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the same |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5827941A (ja) * | 1981-08-11 | 1983-02-18 | Hitachi Ltd | 非晶質薄膜の製造方法 |
JPH0456110A (ja) * | 1990-06-22 | 1992-02-24 | Toshiba Corp | 変圧器の外部冷却器 |
-
1987
- 1987-07-10 JP JP62173228A patent/JP2529274B2/ja not_active Expired - Lifetime
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5827941A (ja) * | 1981-08-11 | 1983-02-18 | Hitachi Ltd | 非晶質薄膜の製造方法 |
JPH0456110A (ja) * | 1990-06-22 | 1992-02-24 | Toshiba Corp | 変圧器の外部冷却器 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH02275605A (ja) * | 1989-01-26 | 1990-11-09 | Fuji Photo Film Co Ltd | 軟磁性薄膜 |
JPH031513A (ja) * | 1989-02-08 | 1991-01-08 | Fuji Photo Film Co Ltd | 軟磁性薄膜の製造方法 |
US5105100A (en) * | 1990-06-29 | 1992-04-14 | Nec Corporation | Easily and quickly testable master-slave flipflop circuit |
EP0897022A1 (en) * | 1996-11-20 | 1999-02-17 | Kabushiki Kaisha Toshiba | Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the same |
US6165607A (en) * | 1996-11-20 | 2000-12-26 | Kabushiki Kaisha Toshiba | Sputtering target and antiferromagnetic film and magneto-resistance effect element formed by using the same |
EP0897022A4 (en) * | 1996-11-20 | 2001-05-02 | Toshiba Kk | TARGET FOR SPRAYING, AND ANTIFERROMAGNETIC FILM AND MAGNETORESISTANT EFFECT ELEMENT FORMED USING THE SAME |
Also Published As
Publication number | Publication date |
---|---|
JP2529274B2 (ja) | 1996-08-28 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term | ||
FPAY | Renewal fee payment (prs date is renewal date of database) |
Year of fee payment: 12 Free format text: PAYMENT UNTIL: 20080614 |