JPS6414961A - Mesh-emitter type transistor - Google Patents

Mesh-emitter type transistor

Info

Publication number
JPS6414961A
JPS6414961A JP17149687A JP17149687A JPS6414961A JP S6414961 A JPS6414961 A JP S6414961A JP 17149687 A JP17149687 A JP 17149687A JP 17149687 A JP17149687 A JP 17149687A JP S6414961 A JPS6414961 A JP S6414961A
Authority
JP
Japan
Prior art keywords
region
nodal
mesh
emitter
base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP17149687A
Other languages
Japanese (ja)
Other versions
JPH0575172B2 (en
Inventor
Kazuhiro Yamada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP17149687A priority Critical patent/JPS6414961A/en
Publication of JPS6414961A publication Critical patent/JPS6414961A/en
Publication of JPH0575172B2 publication Critical patent/JPH0575172B2/ja
Granted legal-status Critical Current

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  • Bipolar Transistors (AREA)

Abstract

PURPOSE:To improve both switching characteristics and the reverse direction safety movement region when inductance is in an on-load state of the title transistor without decrease in hFE by a method wherein a mesh-like high density second base region having a nodal is provided directly under the nodal of a mesh-like emitter region. CONSTITUTION:The first base region 2' is formed in an N-type semiconductor substrate 1, which is a collector region, and a region 4 is formed in mesh-like shape in the region 2 '. The second base region 3 crosses with the meth direction of the region 4 in the direction of 45 deg., a part of a nodal is overlapped with the nodal of the emitter region at the position of an emitter contact 6, the impurity density of the region 3 is higher than that of the region 2', and the former is formed deeper than the latter. As the high density region 3 is brought to the point directly under the nodal part of the emitter region, the amount of transverse resistance of R1 is reduced, and it can be balanced with the amount of resistance in the base lateral direction R2. Accordingly, the inclination in carrier distribution can be reduced when the transistor is ON-OFF operated, the switching characteristics and the inverse safe-operating area in an inductance on-load state can be improved.
JP17149687A 1987-07-08 1987-07-08 Mesh-emitter type transistor Granted JPS6414961A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17149687A JPS6414961A (en) 1987-07-08 1987-07-08 Mesh-emitter type transistor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17149687A JPS6414961A (en) 1987-07-08 1987-07-08 Mesh-emitter type transistor

Publications (2)

Publication Number Publication Date
JPS6414961A true JPS6414961A (en) 1989-01-19
JPH0575172B2 JPH0575172B2 (en) 1993-10-20

Family

ID=15924177

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17149687A Granted JPS6414961A (en) 1987-07-08 1987-07-08 Mesh-emitter type transistor

Country Status (1)

Country Link
JP (1) JPS6414961A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010503999A (en) * 2006-09-22 2010-02-04 インテル コーポレイション Symmetric bipolar junction transistor design for deep submicron manufacturing processes
JP2014232883A (en) * 2014-07-28 2014-12-11 ローム株式会社 Bipolar semiconductor device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5026480A (en) * 1973-07-09 1975-03-19
JPS5222885A (en) * 1975-08-14 1977-02-21 Matsushita Electronics Corp Transistor and manufacturing system
JPS62142356A (en) * 1985-12-17 1987-06-25 Sanken Electric Co Ltd Transistor

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5026480A (en) * 1973-07-09 1975-03-19
JPS5222885A (en) * 1975-08-14 1977-02-21 Matsushita Electronics Corp Transistor and manufacturing system
JPS62142356A (en) * 1985-12-17 1987-06-25 Sanken Electric Co Ltd Transistor

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010503999A (en) * 2006-09-22 2010-02-04 インテル コーポレイション Symmetric bipolar junction transistor design for deep submicron manufacturing processes
JP2014232883A (en) * 2014-07-28 2014-12-11 ローム株式会社 Bipolar semiconductor device

Also Published As

Publication number Publication date
JPH0575172B2 (en) 1993-10-20

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