JPS6410625A - X-ray reduction projection aligner - Google Patents

X-ray reduction projection aligner

Info

Publication number
JPS6410625A
JPS6410625A JP62166174A JP16617487A JPS6410625A JP S6410625 A JPS6410625 A JP S6410625A JP 62166174 A JP62166174 A JP 62166174A JP 16617487 A JP16617487 A JP 16617487A JP S6410625 A JPS6410625 A JP S6410625A
Authority
JP
Japan
Prior art keywords
reflection
rays
mask
substrate
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP62166174A
Other languages
English (en)
Other versions
JP2614863B2 (ja
Inventor
Hiroo Kinoshita
Toyoki Kitayama
Takashi Kaneko
Sunao Ishihara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP62166174A priority Critical patent/JP2614863B2/ja
Publication of JPS6410625A publication Critical patent/JPS6410625A/ja
Application granted granted Critical
Publication of JP2614863B2 publication Critical patent/JP2614863B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62166174A 1987-07-02 1987-07-02 Ｘ線縮小投影露光装置 Expired - Lifetime JP2614863B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62166174A JP2614863B2 (ja) 1987-07-02 1987-07-02 Ｘ線縮小投影露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62166174A JP2614863B2 (ja) 1987-07-02 1987-07-02 Ｘ線縮小投影露光装置

Publications (2)

Publication Number Publication Date
JPS6410625A true JPS6410625A (en) 1989-01-13
JP2614863B2 JP2614863B2 (ja) 1997-05-28

Family

ID=15826447

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62166174A Expired - Lifetime JP2614863B2 (ja) 1987-07-02 1987-07-02 Ｘ線縮小投影露光装置

Country Status (1)

Country Link
JP (1) JP2614863B2 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03196513A (ja) * 1989-12-26 1991-08-28 Hiroshima Univ 単収束ミラーによる反射型２次元パターン縮小転写法および装置
JPH05259026A (ja) * 1992-01-21 1993-10-08 Hughes Aircraft Co マイクロパターン化した表面用の装置および方法
US5678913A (en) * 1994-09-30 1997-10-21 Nippondenso Co., Ltd. Indicating instrument
US6721390B2 (en) 2001-07-18 2004-04-13 Matsushita Electric Industrial Co., Ltd. Soft X-ray reduction projection exposure system, soft X-ray reduction projection exposure method and pattern formation method
JP2006349620A (ja) * 2005-06-20 2006-12-28 Yazaki Corp 計器用指針

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60173551A (ja) * 1984-02-20 1985-09-06 Hideki Matsumura Ｘ線など光線の反射投影によるパタ−ン転写法
JPS629632A (ja) * 1985-07-06 1987-01-17 Agency Of Ind Science & Technol 投影露光装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60173551A (ja) * 1984-02-20 1985-09-06 Hideki Matsumura Ｘ線など光線の反射投影によるパタ−ン転写法
JPS629632A (ja) * 1985-07-06 1987-01-17 Agency Of Ind Science & Technol 投影露光装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03196513A (ja) * 1989-12-26 1991-08-28 Hiroshima Univ 単収束ミラーによる反射型２次元パターン縮小転写法および装置
JPH05259026A (ja) * 1992-01-21 1993-10-08 Hughes Aircraft Co マイクロパターン化した表面用の装置および方法
US5678913A (en) * 1994-09-30 1997-10-21 Nippondenso Co., Ltd. Indicating instrument
US5839809A (en) * 1994-09-30 1998-11-24 Nippondenso Co., Ltd. Indicating instrument
US6120158A (en) * 1994-09-30 2000-09-19 Nippondenso Corporation Illuminated indicator for an indicating instrument
US6721390B2 (en) 2001-07-18 2004-04-13 Matsushita Electric Industrial Co., Ltd. Soft X-ray reduction projection exposure system, soft X-ray reduction projection exposure method and pattern formation method
JP2006349620A (ja) * 2005-06-20 2006-12-28 Yazaki Corp 計器用指針

Also Published As

Publication number Publication date
JP2614863B2 (ja) 1997-05-28

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