JPS639386B2 - - Google Patents
Info
- Publication number
- JPS639386B2 JPS639386B2 JP760979A JP760979A JPS639386B2 JP S639386 B2 JPS639386 B2 JP S639386B2 JP 760979 A JP760979 A JP 760979A JP 760979 A JP760979 A JP 760979A JP S639386 B2 JPS639386 B2 JP S639386B2
- Authority
- JP
- Japan
- Prior art keywords
- region
- gate
- type
- channel
- potential
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000012535 impurity Substances 0.000 claims description 27
- 239000004065 semiconductor Substances 0.000 claims description 5
- 238000005036 potential barrier Methods 0.000 description 11
- 239000000969 carrier Substances 0.000 description 6
- 239000002131 composite material Substances 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
- 230000003068 static effect Effects 0.000 description 3
- 239000000758 substrate Substances 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 2
- 230000000903 blocking effect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000002829 reductive effect Effects 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 210000001520 comb Anatomy 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/02—Semiconductor bodies ; Multistep manufacturing processes therefor
- H01L29/06—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions
- H01L29/10—Semiconductor bodies ; Multistep manufacturing processes therefor characterised by their shape; characterised by the shapes, relative sizes, or dispositions of the semiconductor regions ; characterised by the concentration or distribution of impurities within semiconductor regions with semiconductor regions connected to an electrode not carrying current to be rectified, amplified or switched and such electrode being part of a semiconductor device which comprises three or more electrodes
- H01L29/1025—Channel region of field-effect devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/739—Transistor-type devices, i.e. able to continuously respond to applied control signals controlled by field-effect, e.g. bipolar static induction transistors [BSIT]
- H01L29/7391—Gated diode structures
- H01L29/7392—Gated diode structures with PN junction gate, e.g. field controlled thyristors (FCTh), static induction thyristors (SITh)
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Thyristors (AREA)
- Junction Field-Effect Transistors (AREA)
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP760979A JPS5599772A (en) | 1979-01-24 | 1979-01-24 | Electrostatic induction type thyristor |
US06/018,774 US4364072A (en) | 1978-03-17 | 1979-03-08 | Static induction type semiconductor device with multiple doped layers for potential modification |
DE2910566A DE2910566C2 (de) | 1978-03-17 | 1979-03-17 | Statische Induktionshalbleitervorrichtung |
US06/386,313 US4504847A (en) | 1978-03-17 | 1982-06-08 | Static induction type semiconductor device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP760979A JPS5599772A (en) | 1979-01-24 | 1979-01-24 | Electrostatic induction type thyristor |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5975687A Division JPS6372162A (ja) | 1987-03-12 | 1987-03-12 | 静電誘導型サイリスタ |
JP5975587A Division JPS6372161A (ja) | 1987-03-12 | 1987-03-12 | 静電誘導型サイリスタ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5599772A JPS5599772A (en) | 1980-07-30 |
JPS639386B2 true JPS639386B2 (US07922777-20110412-C00004.png) | 1988-02-29 |
Family
ID=11670541
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP760979A Granted JPS5599772A (en) | 1978-03-17 | 1979-01-24 | Electrostatic induction type thyristor |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5599772A (US07922777-20110412-C00004.png) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5788771A (en) * | 1980-11-21 | 1982-06-02 | Semiconductor Res Found | Electrostatic induction thyristor |
JPH06101566B2 (ja) * | 1984-04-25 | 1994-12-12 | 株式会社日立製作所 | 縦型電界効果トランジスタ |
JPH0795592B2 (ja) * | 1987-04-14 | 1995-10-11 | 株式会社豊田中央研究所 | 静電誘導型半導体装置 |
JPH0793421B2 (ja) * | 1991-01-09 | 1995-10-09 | 東洋電機製造株式会社 | 静電誘導形半導体素子とその製造方法 |
US7615802B2 (en) | 2003-03-19 | 2009-11-10 | Siced Electronics Development Gmbh & Co. Kg | Semiconductor structure comprising a highly doped conductive channel region and method for producing a semiconductor structure |
-
1979
- 1979-01-24 JP JP760979A patent/JPS5599772A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5599772A (en) | 1980-07-30 |
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