JPS639020B2 - - Google Patents
Info
- Publication number
- JPS639020B2 JPS639020B2 JP57039869A JP3986982A JPS639020B2 JP S639020 B2 JPS639020 B2 JP S639020B2 JP 57039869 A JP57039869 A JP 57039869A JP 3986982 A JP3986982 A JP 3986982A JP S639020 B2 JPS639020 B2 JP S639020B2
- Authority
- JP
- Japan
- Prior art keywords
- copper
- complexing agent
- solution
- exchange membrane
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1617—Purification and regeneration of coating baths
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemically Coating (AREA)
- Water Treatment By Electricity Or Magnetism (AREA)
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57039869A JPS58157959A (ja) | 1982-03-13 | 1982-03-13 | 無電解めつき浴の再生方法およびそれに使用する装置 |
US06/372,133 US4425205A (en) | 1982-03-13 | 1982-04-27 | Process for regenerating electroless plating bath and a regenerating apparatus of electroless plating bath |
DE8282400798T DE3272286D1 (en) | 1982-03-13 | 1982-04-30 | A process for regenerating electroless plating bath and a regenerating apparatus of electroless plating bath |
EP82400798A EP0088852B1 (en) | 1982-03-13 | 1982-04-30 | A process for regenerating electroless plating bath and a regenerating apparatus of electroless plating bath |
KR8201949A KR870001547B1 (ko) | 1982-03-13 | 1982-05-04 | 무전해 도금욕 재생방법 및 그 재생장치 |
GB08212818A GB2117003B (en) | 1982-03-13 | 1982-05-04 | Apparatus and process for electroless plating bath regeneration |
CA000418017A CA1220759A (en) | 1982-03-13 | 1982-12-17 | Regeneration of plating bath by acidification and treatment of recovered chelating agent in membrane cell |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP57039869A JPS58157959A (ja) | 1982-03-13 | 1982-03-13 | 無電解めつき浴の再生方法およびそれに使用する装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS58157959A JPS58157959A (ja) | 1983-09-20 |
JPS639020B2 true JPS639020B2 (enrdf_load_stackoverflow) | 1988-02-25 |
Family
ID=12564974
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57039869A Granted JPS58157959A (ja) | 1982-03-13 | 1982-03-13 | 無電解めつき浴の再生方法およびそれに使用する装置 |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS58157959A (enrdf_load_stackoverflow) |
KR (1) | KR870001547B1 (enrdf_load_stackoverflow) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8177956B2 (en) * | 2008-03-12 | 2012-05-15 | Micyus Nicole J | Method of electrolytically dissolving nickel into electroless nickel plating solutions |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH573126A5 (enrdf_load_stackoverflow) * | 1974-06-07 | 1976-02-27 | Bbc Brown Boveri & Cie | |
JPS5223530A (en) * | 1975-08-17 | 1977-02-22 | Inoue Japax Res | Treating method of chemical copper plating solution |
JPS565965A (en) * | 1979-06-27 | 1981-01-22 | Hitachi Ltd | Treatment of chemical copper plating waste liquor |
-
1982
- 1982-03-13 JP JP57039869A patent/JPS58157959A/ja active Granted
- 1982-05-04 KR KR8201949A patent/KR870001547B1/ko not_active Expired
Also Published As
Publication number | Publication date |
---|---|
JPS58157959A (ja) | 1983-09-20 |
KR870001547B1 (ko) | 1987-09-02 |
KR830010223A (ko) | 1983-12-26 |
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