JPS6384937U - - Google Patents
Info
- Publication number
- JPS6384937U JPS6384937U JP17956286U JP17956286U JPS6384937U JP S6384937 U JPS6384937 U JP S6384937U JP 17956286 U JP17956286 U JP 17956286U JP 17956286 U JP17956286 U JP 17956286U JP S6384937 U JPS6384937 U JP S6384937U
- Authority
- JP
- Japan
- Prior art keywords
- rod
- jet nozzle
- holder
- vacuum processing
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims 1
- 238000010586 diagram Methods 0.000 description 2
Description
第１図は本考案の一実施例を示す概略構成図、
第２図は第１図の搬送ホルダのロツド部分の縦断
面図、第３図は従来の真空処理装置を示す概略構
成図である。
１……真空チヤンバ、３……ウエハ、４……電
極、６……搬送ホルダ、７……ロツド、８……配
管、９……噴出口、１０……ノズル。
FIG. 1 is a schematic configuration diagram showing an embodiment of the present invention;
FIG. 2 is a longitudinal sectional view of the rod portion of the transport holder shown in FIG. 1, and FIG. 3 is a schematic configuration diagram showing a conventional vacuum processing apparatus. 1... Vacuum chamber, 3... Wafer, 4... Electrode, 6... Transfer holder, 7... Rod, 8... Piping, 9... Spout nozzle, 10... Nozzle.
Claims (1)
放電電極を配設し、ロツドを介して昇降自在に形
成された上記ウエハの搬送ホルダを上記電極に対
向して設けてなる真空処理装置において、上記搬
送ホルダを所定位置に停止可能に構成するととも
に、上記搬送ホルダのロツド内を通りこの搬送ホ
ルダの上面に形成された噴出口に連通する雰囲気
ガスの導入配管を設け、上記噴出口に噴出ノズル
を着脱自在に係合したことを特徴とする真空処理
装置。 In a vacuum processing apparatus, a discharge electrode for processing a semiconductor wafer is disposed on the upper surface of a vacuum chamber, and a wafer transfer holder, which is formed to be freely raised and lowered via a rod, is provided opposite to the electrode. is constructed such that it can be stopped at a predetermined position, and an atmospheric gas introduction pipe is provided that passes through the rod of the transport holder and communicates with a jet nozzle formed on the top surface of the transport holder, and a jet nozzle can be freely attached and detached from the jet port. A vacuum processing device characterized in that it is engaged with.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17956286U JPS6384937U (en) | 1986-11-21 | 1986-11-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17956286U JPS6384937U (en) | 1986-11-21 | 1986-11-21 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS6384937U true JPS6384937U (en) | 1988-06-03 |
Family
ID=31122731
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17956286U Pending JPS6384937U (en) | 1986-11-21 | 1986-11-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6384937U (en) |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5833828A (en) * | 1981-08-24 | 1983-02-28 | Hitachi Ltd | Semiconductor surface treatment apparatus |
| JPS59145519A (en) * | 1983-12-23 | 1984-08-21 | Hitachi Ltd | Vapor phase chemical treatment equipment |
-
1986
- 1986-11-21 JP JP17956286U patent/JPS6384937U/ja active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5833828A (en) * | 1981-08-24 | 1983-02-28 | Hitachi Ltd | Semiconductor surface treatment apparatus |
| JPS59145519A (en) * | 1983-12-23 | 1984-08-21 | Hitachi Ltd | Vapor phase chemical treatment equipment |