JPS638187B2 - - Google Patents
Info
- Publication number
- JPS638187B2 JPS638187B2 JP53050793A JP5079378A JPS638187B2 JP S638187 B2 JPS638187 B2 JP S638187B2 JP 53050793 A JP53050793 A JP 53050793A JP 5079378 A JP5079378 A JP 5079378A JP S638187 B2 JPS638187 B2 JP S638187B2
- Authority
- JP
- Japan
- Prior art keywords
- etching
- processed
- substrate
- determination circuit
- aluminum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- ing And Chemical Polishing (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5079378A JPS54142143A (en) | 1978-04-27 | 1978-04-27 | Dry type etching device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5079378A JPS54142143A (en) | 1978-04-27 | 1978-04-27 | Dry type etching device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54142143A JPS54142143A (en) | 1979-11-06 |
| JPS638187B2 true JPS638187B2 (enrdf_load_stackoverflow) | 1988-02-22 |
Family
ID=12868670
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5079378A Granted JPS54142143A (en) | 1978-04-27 | 1978-04-27 | Dry type etching device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54142143A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59116366U (ja) * | 1983-01-28 | 1984-08-06 | 株式会社日立製作所 | エレベ−タ−ガイドレ−ルの清掃装置 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5135639A (ja) * | 1974-09-20 | 1976-03-26 | Hitachi Ltd | Himakunopurazumaetsuchingushorishutenkenshutsuho |
| CA1071579A (en) * | 1976-09-13 | 1980-02-12 | Northern Telecom Limited | End point control in plasma etching |
-
1978
- 1978-04-27 JP JP5079378A patent/JPS54142143A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54142143A (en) | 1979-11-06 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US5352902A (en) | Method for controlling plasma surface-treatments with a plurality of photodetectors and optical filters | |
| JP4567828B2 (ja) | 終点検出方法 | |
| KR920010726B1 (ko) | 반도체 제조장치의 크리닝 종점 판정방법 | |
| KR100704108B1 (ko) | 무산소 플라즈마 공정에서의 종점 검출 방법 | |
| JP4500510B2 (ja) | エッチング量検出方法,エッチング方法,およびエッチング装置 | |
| JP2001527151A (ja) | チャンバクリーニングの終点検出方法及び装置 | |
| CN101127300A (zh) | 采用反射辐射监控衬底处理 | |
| US6124927A (en) | Method to protect chamber wall from etching by endpoint plasma clean | |
| KR20180106797A (ko) | 에칭 방법 및 플라스마 처리 장치 | |
| US7312865B2 (en) | Method for in situ monitoring of chamber peeling | |
| US6599759B2 (en) | Method for detecting end point in plasma etching by impedance change | |
| JPS638187B2 (enrdf_load_stackoverflow) | ||
| US6267121B1 (en) | Process to season and determine condition of a high density plasma etcher | |
| JPS635532A (ja) | プラズマクリ−ニング方法 | |
| JPS627274B2 (enrdf_load_stackoverflow) | ||
| JPH05206076A (ja) | プラズマ処理装置 | |
| JPH07258853A (ja) | プロセスの状態を識別する方法および装置 | |
| TWI640031B (zh) | Plasma processing device and method for monitoring plasma process | |
| JPS62282435A (ja) | エツチングの終点検出方法 | |
| KR950010713A (ko) | 플라즈마처리의 종점검출 방법 및 장치 | |
| JPH07169753A (ja) | プラズマ処理装置のクリーニング方法 | |
| Selwyn | Atomic arsenic detection by ArF laser‐induced fluorescence | |
| JPH0343775B2 (enrdf_load_stackoverflow) | ||
| JP3609241B2 (ja) | プラズマ処理装置およびプラズマ処理方法 | |
| JPH05206078A (ja) | 処理装置 |