JPS6380546U - - Google Patents
Info
- Publication number
- JPS6380546U JPS6380546U JP1986175401U JP17540186U JPS6380546U JP S6380546 U JPS6380546 U JP S6380546U JP 1986175401 U JP1986175401 U JP 1986175401U JP 17540186 U JP17540186 U JP 17540186U JP S6380546 U JPS6380546 U JP S6380546U
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- alignment
- boundary line
- alignment mark
- figures
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 1
- 238000000206 photolithography Methods 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 claims 1
Description
第1図a,bはこの考案の一実施例を示す平面
図、第2図a,bはそれぞれ第1図a,bの透明
領域と不透明領域を反転させた状態を示す平面図
、第3図a,bは従来のフオトマスクの目合せマ
ークの形状の一例を示す平面図、第4図a,bは
それぞれ第3図a,bの透明領域と不透明領域を
反転させた状態を示す平面図である。
1……十字形図形、2……正方形図形。なお、
図中同一符号は同一または相当する部分を示す。
Figures 1a and b are plan views showing one embodiment of this invention, Figures 2a and b are plan views showing the transparent and opaque areas of Figures 1a and b respectively inverted, and Figure 3 Figures a and b are plan views showing an example of the shape of the alignment mark of a conventional photomask, and Figures 4 a and b are plan views showing a state in which the transparent and opaque areas of Figures 3 a and b are reversed, respectively. It is. 1...Cross shape, 2...Square shape. In addition,
The same reference numerals in the figures indicate the same or corresponding parts.
Claims (1)
スク合せ用の目合せマークで、一つの図形のほか
に該図形の境界線とある間隔を隔てて平行な境界
線をもつ図形を備え、前工程のフオトマスクに対
して上記両図形の相対峙する境界線が同一方向に
ずれる状態に設けられ、該目合せマークを付した
フオトマスクをポジレジスト用、ネガレジスト用
の一方から他方へ変更する場合に書き直す必要の
ないことを特徴とする目合せマーク。 It is an alignment mark for mask alignment of a photomask used in photolithography, and includes one figure and a figure with a boundary line parallel to the boundary line of the figure at a certain interval, and is used for the photomask in the previous process. The boundary lines of the above-mentioned two figures facing each other are shifted in the same direction, and there is no need to rewrite the photomask with alignment marks when changing from one for positive resist to the other for negative resist. A distinctive alignment mark.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986175401U JPH0438355Y2 (en) | 1986-11-17 | 1986-11-17 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1986175401U JPH0438355Y2 (en) | 1986-11-17 | 1986-11-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6380546U true JPS6380546U (en) | 1988-05-27 |
JPH0438355Y2 JPH0438355Y2 (en) | 1992-09-08 |
Family
ID=31114693
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1986175401U Expired JPH0438355Y2 (en) | 1986-11-17 | 1986-11-17 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0438355Y2 (en) |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5116878A (en) * | 1974-08-01 | 1976-02-10 | Fujitsu Ltd | Hoto masukuno seizohoho |
-
1986
- 1986-11-17 JP JP1986175401U patent/JPH0438355Y2/ja not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5116878A (en) * | 1974-08-01 | 1976-02-10 | Fujitsu Ltd | Hoto masukuno seizohoho |
Also Published As
Publication number | Publication date |
---|---|
JPH0438355Y2 (en) | 1992-09-08 |