JPS62118235U - - Google Patents
Info
- Publication number
- JPS62118235U JPS62118235U JP676786U JP676786U JPS62118235U JP S62118235 U JPS62118235 U JP S62118235U JP 676786 U JP676786 U JP 676786U JP 676786 U JP676786 U JP 676786U JP S62118235 U JPS62118235 U JP S62118235U
- Authority
- JP
- Japan
- Prior art keywords
- pattern
- light
- exposure amount
- width
- shielding
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010586 diagram Methods 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
第１図は本案品の模式的平面図、第２図は本案
品におけるパターン部の拡大図、第３図は従来品
の模式図である。
Ａ−４，Ａ−３，Ａ−２，Ａ−１，Ａ０，Ａ１
，Ａ２，Ａ３，Ａ４……パターン部、１ａ，１ｂ
……遮光領域、１ｃ……遮光部、２ａ，２ｂ……
透光領域、２ｃ……透光部。
FIG. 1 is a schematic plan view of the present product, FIG. 2 is an enlarged view of the pattern portion of the present product, and FIG. 3 is a schematic diagram of the conventional product. A -4 , A -3 , A -2 , A -1 , A0, A1
, A 2 , A 3 , A 4 ...pattern part, 1a, 1b
... Light-shielding area, 1c... Light-shielding portion, 2a, 2b...
Translucent area, 2c...translucent part.
Claims (1)
光部を夫々幅寸法の中心を一直線上に位置させて
形成したパターン部を有する露光量判定パターン
において、前記透光部の幅寸法よりも遮光部の幅
寸法が大きく、且つ幅寸法の大きさが相異なる２
以上のパターン部を形成し、このパターン部のう
ち１のパターン部は、適正露光量での投影により
形成されたレジストパターン上での抜きパターン
幅と残しパターン幅との寸法が等しくなるように
したことを特長とする露光量判定パターン。 ２ 前記パターン部は３以上である実用新案登録
請求の範囲第１項記載の露光量判定パターン。 ３ 前記パターン部は一直線上に配列形成されて
いる実用新案登録請求の範囲第１項記載の露光量
判定パターン。[Claims for Utility Model Registration] 1. In an exposure amount determination pattern having a pattern portion formed with a light-transmitting portion between light-shielding regions and a light-shielding portion between light-transmitting regions with the centers of their widths aligned on a straight line. , the width of the light-shielding part is larger than the width of the light-transmitting part, and the widths are different in size.
The above pattern parts were formed, and one of the pattern parts was made so that the dimensions of the punched pattern width and the remaining pattern width on the resist pattern formed by projection with an appropriate exposure amount were equal. This is an exposure amount judgment pattern that is characterized by: 2. The exposure amount determination pattern according to claim 1, wherein the number of pattern portions is three or more. 3. The exposure amount determination pattern according to claim 1, wherein the pattern portions are arranged in a straight line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP676786U JPS62118235U (en) | 1986-01-20 | 1986-01-20 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP676786U JPS62118235U (en) | 1986-01-20 | 1986-01-20 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62118235U true JPS62118235U (en) | 1987-07-27 |
Family
ID=30789590
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP676786U Pending JPS62118235U (en) | 1986-01-20 | 1986-01-20 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62118235U (en) |
-
1986
- 1986-01-20 JP JP676786U patent/JPS62118235U/ja active Pending