JPS6378444A - 電子ビ−ム装置 - Google Patents
電子ビ−ム装置Info
- Publication number
- JPS6378444A JPS6378444A JP61220847A JP22084786A JPS6378444A JP S6378444 A JPS6378444 A JP S6378444A JP 61220847 A JP61220847 A JP 61220847A JP 22084786 A JP22084786 A JP 22084786A JP S6378444 A JPS6378444 A JP S6378444A
- Authority
- JP
- Japan
- Prior art keywords
- grid
- electron beam
- analysis
- objective lens
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Tests Of Electronic Circuits (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61220847A JPS6378444A (ja) | 1986-09-20 | 1986-09-20 | 電子ビ−ム装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61220847A JPS6378444A (ja) | 1986-09-20 | 1986-09-20 | 電子ビ−ム装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6378444A true JPS6378444A (ja) | 1988-04-08 |
| JPH0565968B2 JPH0565968B2 (enrdf_load_stackoverflow) | 1993-09-20 |
Family
ID=16757473
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61220847A Granted JPS6378444A (ja) | 1986-09-20 | 1986-09-20 | 電子ビ−ム装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6378444A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5517028A (en) * | 1993-12-07 | 1996-05-14 | Fujitsu Limited | Electron beam apparatus for measuring a voltage of a sample |
-
1986
- 1986-09-20 JP JP61220847A patent/JPS6378444A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5517028A (en) * | 1993-12-07 | 1996-05-14 | Fujitsu Limited | Electron beam apparatus for measuring a voltage of a sample |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0565968B2 (enrdf_load_stackoverflow) | 1993-09-20 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4933552A (en) | Inspection system utilizing retarding field back scattered electron collection | |
| JP5948084B2 (ja) | 走査電子顕微鏡 | |
| JP2592180B2 (ja) | 磁気フィルタ式低損失走査型電子顕微鏡 | |
| JP5964055B2 (ja) | 試料を加工及び/又は解析するための粒子ビーム装置及び方法 | |
| NL8602177A (nl) | Electronen detectie met energie discriminatie. | |
| Spool | The practice of TOF-SIMS: time of flight secondary ion mass spectrometry | |
| JPH03105841A (ja) | 質量分析方法 | |
| US5783823A (en) | Apparatus to be used in the field of accelerator mass spectrometry | |
| JPS6251144A (ja) | 質量分析計 | |
| JPS6378444A (ja) | 電子ビ−ム装置 | |
| JPS63121738A (ja) | 固体物体の組成決定方法 | |
| JPS63211551A (ja) | 荷電粒子線装置 | |
| US7030375B1 (en) | Time of flight electron detector | |
| JP2678059B2 (ja) | 電子ビーム装置 | |
| US11410843B1 (en) | Mass spectrometry system and measuring method thereof | |
| JP5545922B2 (ja) | 試料分析方法及び装置 | |
| JP2590417B2 (ja) | オージェ電子分光装置 | |
| US5689112A (en) | Apparatus for detection of surface contaminations on silicon wafers | |
| JP2000146876A (ja) | 電子デバイス非破壊内部欠陥検出装置 | |
| JP6309381B2 (ja) | 質量分析装置および質量分析方法 | |
| JPS5968159A (ja) | イオン源を用いた分析装置 | |
| Kruit et al. | An Electron Beam Tester with Dispersive Secondary Electron Energy Analyser | |
| JPS61220330A (ja) | 半導体装置へのイオンビ−ム加工方法およびその装置 | |
| JP2628348B2 (ja) | 電子ビーム装置 | |
| JPH05251035A (ja) | スパッタ中性粒子質量分析装置 |