JPS6373535A - 半導体装置の製造方法 - Google Patents
半導体装置の製造方法Info
- Publication number
- JPS6373535A JPS6373535A JP21838086A JP21838086A JPS6373535A JP S6373535 A JPS6373535 A JP S6373535A JP 21838086 A JP21838086 A JP 21838086A JP 21838086 A JP21838086 A JP 21838086A JP S6373535 A JPS6373535 A JP S6373535A
- Authority
- JP
- Japan
- Prior art keywords
- metal film
- film pattern
- unit element
- pattern
- marking
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 230000002950 deficient Effects 0.000 claims abstract description 25
- 239000002184 metal Substances 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 10
- 239000003550 marker Substances 0.000 claims abstract description 6
- 239000000758 substrate Substances 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 230000001678 irradiating effect Effects 0.000 claims description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 13
- 229910052814 silicon oxide Inorganic materials 0.000 abstract description 13
- 230000003287 optical effect Effects 0.000 abstract description 6
- 239000008188 pellet Substances 0.000 abstract description 6
- 230000002093 peripheral effect Effects 0.000 abstract 1
- 238000010330 laser marking Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
Landscapes
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21838086A JPS6373535A (ja) | 1986-09-16 | 1986-09-16 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP21838086A JPS6373535A (ja) | 1986-09-16 | 1986-09-16 | 半導体装置の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6373535A true JPS6373535A (ja) | 1988-04-04 |
JPH0516664B2 JPH0516664B2 (enrdf_load_stackoverflow) | 1993-03-05 |
Family
ID=16718990
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP21838086A Granted JPS6373535A (ja) | 1986-09-16 | 1986-09-16 | 半導体装置の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6373535A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08227919A (ja) * | 1994-12-09 | 1996-09-03 | Sgs Thomson Microelectron Sa | レーザーによる集積回路のマーキング方法およびそれに関する器械 |
-
1986
- 1986-09-16 JP JP21838086A patent/JPS6373535A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH08227919A (ja) * | 1994-12-09 | 1996-09-03 | Sgs Thomson Microelectron Sa | レーザーによる集積回路のマーキング方法およびそれに関する器械 |
US6559409B1 (en) * | 1994-12-09 | 2003-05-06 | Sgs-Thomson Microelectronics S.A. | Method for marking integrated circuits with a laser |
Also Published As
Publication number | Publication date |
---|---|
JPH0516664B2 (enrdf_load_stackoverflow) | 1993-03-05 |
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