JPS6369982A - 電気絶縁性無機材料のメツキ下地処理方法 - Google Patents
電気絶縁性無機材料のメツキ下地処理方法Info
- Publication number
- JPS6369982A JPS6369982A JP21066386A JP21066386A JPS6369982A JP S6369982 A JPS6369982 A JP S6369982A JP 21066386 A JP21066386 A JP 21066386A JP 21066386 A JP21066386 A JP 21066386A JP S6369982 A JPS6369982 A JP S6369982A
- Authority
- JP
- Japan
- Prior art keywords
- inorg
- electrically insulating
- insulating inorganic
- thin film
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
- C23C18/1208—Oxides, e.g. ceramics
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
- C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
- C23C18/1229—Composition of the substrate
- C23C18/1245—Inorganic substrates other than metallic
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Thermal Sciences (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Inorganic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Ceramic Engineering (AREA)
- Chemically Coating (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21066386A JPS6369982A (ja) | 1986-09-09 | 1986-09-09 | 電気絶縁性無機材料のメツキ下地処理方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21066386A JPS6369982A (ja) | 1986-09-09 | 1986-09-09 | 電気絶縁性無機材料のメツキ下地処理方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6369982A true JPS6369982A (ja) | 1988-03-30 |
| JPH059518B2 JPH059518B2 (enrdf_load_stackoverflow) | 1993-02-05 |
Family
ID=16593044
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21066386A Granted JPS6369982A (ja) | 1986-09-09 | 1986-09-09 | 電気絶縁性無機材料のメツキ下地処理方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6369982A (enrdf_load_stackoverflow) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5175991A (en) * | 1974-12-25 | 1976-06-30 | Sharp Kk | Tomeidenkyokuno seiho |
-
1986
- 1986-09-09 JP JP21066386A patent/JPS6369982A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5175991A (en) * | 1974-12-25 | 1976-06-30 | Sharp Kk | Tomeidenkyokuno seiho |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH059518B2 (enrdf_load_stackoverflow) | 1993-02-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US4908065A (en) | Coating solution for use in the formation of metal oxide film | |
| FR2442669A1 (fr) | Composition servant a former une pellicule d'oxyde metallique sur la surface chauffee d'un support et procede pour former cette pellicule | |
| RU2152911C2 (ru) | Способ нанесения покрытия на непроводящее основание (варианты) | |
| US20080193638A1 (en) | Process and Apparatus for Coating Substrates by Spray Pyrolysis | |
| JPH11319547A5 (enrdf_load_stackoverflow) | ||
| US4960618A (en) | Process for formation of metal oxide film | |
| JP2002146536A (ja) | 酸化スズ薄膜の低温形成方法 | |
| US3759743A (en) | Method of applying coarings of tin oxide upon transparent substrates | |
| US4201453A (en) | Liquid crystal cell having an insulating layer of a silicon oxide base | |
| GB1181033A (en) | A Method of Applying a Coating comprising Tin Oxide upon Substrates | |
| JPH064497B2 (ja) | 酸化錫膜の形成方法 | |
| JPS6369982A (ja) | 電気絶縁性無機材料のメツキ下地処理方法 | |
| JP3016795B2 (ja) | 銀皮膜の固着性析出方法、銀皮膜及びこれから構成される導電性、反射性または装飾的皮膜 | |
| FR2317241A1 (fr) | Procede et dispositif pour la formation d'un depot d'oxyde metallique sur du verre | |
| JPS62278705A (ja) | 透明導電材料 | |
| US3331702A (en) | Iridizing method | |
| KR100378019B1 (ko) | 투명 도전막의 보호막 형성용 조성물 및 이로부터 투명도전막을 제조하는 방법 | |
| JPS6441194A (en) | Manufacture of thin film electroluminescent element | |
| CN106242314A (zh) | 一种玻璃镀铜工艺 | |
| JPS62228484A (ja) | チタニア薄膜の製造方法 | |
| JPH01132003A (ja) | 透明導電基板およびその製造方法 | |
| JP4007082B2 (ja) | 透明導電膜及びその形成方法 | |
| JPS6241315B2 (enrdf_load_stackoverflow) | ||
| KR100200322B1 (ko) | 코팅졸을 이용한 산화아연 박막 제조방법 | |
| JPS63257121A (ja) | 導電性被膜の形成方法 |