JPS636737A - 電子線照射装置における帯電防止装置 - Google Patents
電子線照射装置における帯電防止装置Info
- Publication number
- JPS636737A JPS636737A JP61149136A JP14913686A JPS636737A JP S636737 A JPS636737 A JP S636737A JP 61149136 A JP61149136 A JP 61149136A JP 14913686 A JP14913686 A JP 14913686A JP S636737 A JPS636737 A JP S636737A
- Authority
- JP
- Japan
- Prior art keywords
- sample
- electron beam
- photocathode
- photo
- ultraviolet lamp
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 title claims abstract description 20
- 239000000463 material Substances 0.000 claims description 5
- FHGTUGKSLIJMAV-UHFFFAOYSA-N tricesium;antimony Chemical compound [Sb].[Cs+].[Cs+].[Cs+] FHGTUGKSLIJMAV-UHFFFAOYSA-N 0.000 claims description 3
- 230000004907 flux Effects 0.000 claims description 2
- SOWXYAAAVMKBPO-UHFFFAOYSA-N [Cs].[O].[Bi].[Ag] Chemical compound [Cs].[O].[Bi].[Ag] SOWXYAAAVMKBPO-UHFFFAOYSA-N 0.000 claims 1
- 230000005684 electric field Effects 0.000 abstract description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 7
- 239000012212 insulator Substances 0.000 abstract description 2
- 238000010586 diagram Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical compound [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 230000001678 irradiating effect Effects 0.000 description 2
- 239000002253 acid Substances 0.000 description 1
- 229910052787 antimony Inorganic materials 0.000 description 1
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
- 229910052792 caesium Inorganic materials 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000012777 electrically insulating material Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 230000003472 neutralizing effect Effects 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61149136A JPS636737A (ja) | 1986-06-25 | 1986-06-25 | 電子線照射装置における帯電防止装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61149136A JPS636737A (ja) | 1986-06-25 | 1986-06-25 | 電子線照射装置における帯電防止装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS636737A true JPS636737A (ja) | 1988-01-12 |
| JPH0584628B2 JPH0584628B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-12-02 |
Family
ID=15468533
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61149136A Granted JPS636737A (ja) | 1986-06-25 | 1986-06-25 | 電子線照射装置における帯電防止装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS636737A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002001596A1 (en) * | 2000-06-27 | 2002-01-03 | Ebara Corporation | Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus |
| WO2002013227A1 (fr) * | 2000-07-27 | 2002-02-14 | Ebara Corporation | Appareil d'analyse a faisceau plan |
| JP2006338881A (ja) * | 2005-05-31 | 2006-12-14 | Hitachi High-Technologies Corp | 電子顕微鏡応用装置および試料検査方法 |
| JP2006344444A (ja) * | 2005-06-08 | 2006-12-21 | Horon:Kk | 荷電粒子線装置および荷電粒子線像生成方法 |
| WO2008029696A1 (fr) * | 2006-09-05 | 2008-03-13 | Advantest Corporation | Dispositif de mesure de dimensions par faisceau d'électrons et procédé de mesure de dimensions par faisceau d'électrons |
-
1986
- 1986-06-25 JP JP61149136A patent/JPS636737A/ja active Granted
Cited By (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7411191B2 (en) | 2000-06-27 | 2008-08-12 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
| KR100875230B1 (ko) * | 2000-06-27 | 2008-12-19 | 가부시키가이샤 에바라 세이사꾸쇼 | 하전입자선에 의한 검사장치 및 그 검사장치를 사용한장치제조방법 |
| US8803103B2 (en) | 2000-06-27 | 2014-08-12 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
| US8053726B2 (en) | 2000-06-27 | 2011-11-08 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
| WO2002001596A1 (en) * | 2000-06-27 | 2002-01-03 | Ebara Corporation | Charged particle beam inspection apparatus and method for fabricating device using that inspection apparatus |
| US9368314B2 (en) | 2000-06-27 | 2016-06-14 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
| US8368031B2 (en) | 2000-06-27 | 2013-02-05 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
| US7241993B2 (en) | 2000-06-27 | 2007-07-10 | Ebara Corporation | Inspection system by charged particle beam and method of manufacturing devices using the system |
| WO2002013227A1 (fr) * | 2000-07-27 | 2002-02-14 | Ebara Corporation | Appareil d'analyse a faisceau plan |
| US7109484B2 (en) | 2000-07-27 | 2006-09-19 | Ebara Corporation | Sheet beam-type inspection apparatus |
| US7417236B2 (en) | 2000-07-27 | 2008-08-26 | Ebara Corporation | Sheet beam-type testing apparatus |
| KR100873447B1 (ko) * | 2000-07-27 | 2008-12-11 | 가부시키가이샤 에바라 세이사꾸쇼 | 시트빔식 검사장치 |
| US7049585B2 (en) | 2000-07-27 | 2006-05-23 | Ebara Corporation | Sheet beam-type testing apparatus |
| US7829871B2 (en) | 2000-07-27 | 2010-11-09 | Ebara Corporation | Sheet beam-type testing apparatus |
| JP2006338881A (ja) * | 2005-05-31 | 2006-12-14 | Hitachi High-Technologies Corp | 電子顕微鏡応用装置および試料検査方法 |
| JP2006344444A (ja) * | 2005-06-08 | 2006-12-21 | Horon:Kk | 荷電粒子線装置および荷電粒子線像生成方法 |
| JP2008064505A (ja) * | 2006-09-05 | 2008-03-21 | Advantest Corp | 電子ビーム寸法測定装置及び電子ビーム寸法測定方法 |
| US8530836B2 (en) | 2006-09-05 | 2013-09-10 | Advantest Corp. | Electron-beam dimension measuring apparatus and electron-beam dimension measuring method |
| WO2008029696A1 (fr) * | 2006-09-05 | 2008-03-13 | Advantest Corporation | Dispositif de mesure de dimensions par faisceau d'électrons et procédé de mesure de dimensions par faisceau d'électrons |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0584628B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1993-12-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |